GB1451375A - Method of coating an oxide surface with a positive photorestist - Google Patents

Method of coating an oxide surface with a positive photorestist

Info

Publication number
GB1451375A
GB1451375A GB5705373A GB5705373A GB1451375A GB 1451375 A GB1451375 A GB 1451375A GB 5705373 A GB5705373 A GB 5705373A GB 5705373 A GB5705373 A GB 5705373A GB 1451375 A GB1451375 A GB 1451375A
Authority
GB
United Kingdom
Prior art keywords
photo
resist
positive
alkylimidazoline
dec
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5705373A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1451375A publication Critical patent/GB1451375A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
GB5705373A 1972-12-11 1973-12-10 Method of coating an oxide surface with a positive photorestist Expired GB1451375A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00314050A US3827908A (en) 1972-12-11 1972-12-11 Method for improving photoresist adherence

Publications (1)

Publication Number Publication Date
GB1451375A true GB1451375A (en) 1976-09-29

Family

ID=23218346

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5705373A Expired GB1451375A (en) 1972-12-11 1973-12-10 Method of coating an oxide surface with a positive photorestist

Country Status (8)

Country Link
US (1) US3827908A (cg-RX-API-DMAC7.html)
JP (1) JPS5147574B2 (cg-RX-API-DMAC7.html)
CA (1) CA1002820A (cg-RX-API-DMAC7.html)
CH (1) CH585919A5 (cg-RX-API-DMAC7.html)
FR (1) FR2210013B1 (cg-RX-API-DMAC7.html)
GB (1) GB1451375A (cg-RX-API-DMAC7.html)
IT (1) IT1001747B (cg-RX-API-DMAC7.html)
NL (1) NL7314991A (cg-RX-API-DMAC7.html)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4497889A (en) * 1972-03-16 1985-02-05 E. I. Du Pont De Nemours And Company Release compound in negative acting photopolymerizable element
US4259430A (en) * 1974-05-01 1981-03-31 International Business Machines Corporation Photoresist O-quinone diazide containing composition and resist mask formation process
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
DE2547905C2 (de) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
DE2626419C2 (de) * 1976-06-12 1982-10-21 Ibm Deutschland Gmbh, 7000 Stuttgart Lichtempfindliches Gemisch
US4173470A (en) * 1977-11-09 1979-11-06 Bell Telephone Laboratories, Incorporated Novolak photoresist composition and preparation thereof
US4212935A (en) * 1978-02-24 1980-07-15 International Business Machines Corporation Method of modifying the development profile of photoresists
US4485167A (en) * 1980-10-06 1984-11-27 E. I. Du Pont De Nemours And Company Aqueous developable photopolymerizable elements
US4517281A (en) * 1980-10-06 1985-05-14 E. I. Du Pont De Nemours And Company Development process for aqueous developable photopolymerizable elements
DE3277343D1 (en) * 1982-06-14 1987-10-22 Ibm Deutschland Method of adjusting the edge angle in polysilicon
US4431685A (en) * 1982-07-02 1984-02-14 International Business Machines Corporation Decreasing plated metal defects
US4608281A (en) * 1982-09-28 1986-08-26 Exxon Research And Engineering Co. Improvements in sensitivity of a positive polymer resist having a glass transition temperature through control of a molecular weight distribution and prebaked temperature
US4604305A (en) * 1982-09-28 1986-08-05 Exxon Research And Engineering Co. Improvements in contrast of a positive polymer resist having a glass transition temperature through control of the molecular weight distribution and prebaked temperature
NL8203980A (nl) * 1982-10-15 1984-05-01 Philips Nv Werkwijze voor de fotolithografische behandeling van een substraat.
US4464458A (en) * 1982-12-30 1984-08-07 International Business Machines Corporation Process for forming resist masks utilizing O-quinone diazide and pyrene
US4564584A (en) * 1983-12-30 1986-01-14 Ibm Corporation Photoresist lift-off process for fabricating semiconductor devices
US4732858A (en) * 1986-09-17 1988-03-22 Brewer Science, Inc. Adhesion promoting product and process for treating an integrated circuit substrate
JPH07120914A (ja) * 1993-10-21 1995-05-12 Hoechst Japan Ltd ポジ型ホトレジスト組成物

Also Published As

Publication number Publication date
JPS5147574B2 (cg-RX-API-DMAC7.html) 1976-12-15
CH585919A5 (cg-RX-API-DMAC7.html) 1977-03-15
JPS4990082A (cg-RX-API-DMAC7.html) 1974-08-28
DE2361436B2 (de) 1977-05-05
FR2210013B1 (cg-RX-API-DMAC7.html) 1977-09-09
NL7314991A (cg-RX-API-DMAC7.html) 1974-06-13
CA1002820A (en) 1977-01-04
FR2210013A1 (cg-RX-API-DMAC7.html) 1974-07-05
DE2361436A1 (de) 1974-06-12
IT1001747B (it) 1976-04-30
US3827908A (en) 1974-08-06

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee