GB1442797A - Radiation-sensitive copolymer - Google Patents

Radiation-sensitive copolymer

Info

Publication number
GB1442797A
GB1442797A GB5941673A GB5941673A GB1442797A GB 1442797 A GB1442797 A GB 1442797A GB 5941673 A GB5941673 A GB 5941673A GB 5941673 A GB5941673 A GB 5941673A GB 1442797 A GB1442797 A GB 1442797A
Authority
GB
United Kingdom
Prior art keywords
units
group
formula
methyl
chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5941673A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of GB1442797A publication Critical patent/GB1442797A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1442797 Radiation - sensitive copolymers EASTMAN KODAK CO 21 Dec 1973 [22 Dec 1972] 59416/73 Heading C3P [Also in Division G2] Radiation-sensitive copolymers contain, on a molar basis, (A) 75-87% of units of formula wherein R<SP>1</SP> is hydrogen or methyl and R<SP>2</SP> is a C 1-6 alkyl or cycloalkyl group; (B) 10-22% of units of formula wherein R<SP>1</SP> is hydrogen or methyl, R<SP>3</SP> is a C 2-6 alkylene group, X is a carbonyl or sulphonyl group, and D is a quinone diazide group; (C) 1-7 % of units of formula wherein R<SP>1</SP> is hydrogen or methyl, R<SP>3</SP> is a C 2-6 alkylene group, and R<SP>4</SP> is a hydrocarbon or halohydrocarbon group having up to 20 carbon atoms; and optionally (D) 0-4% of units of formula wherein R<SP>1</SP> and R<SP>3</SP> are as above. The copolymers may be prepared by introducing units (B) and (C) into a copolymer of (A) and (B) by esterification of hydroxyl groups in (B). Exemplified copolymers are prepared by copolymerizing methyl methacrylate with 2-hydroxyethyl acrylate or methacrylate and then reacting the hydroxyl groups partially or completely with a mixture of 1,2-naphthoquinone-2-diazide-5-sulphonyl chloride and one of benzoyl chloride, p-bromo-benzoyl chloride, acetyl chloride and myristyl chloride.
GB5941673A 1972-12-22 1973-12-21 Radiation-sensitive copolymer Expired GB1442797A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31758572A 1972-12-22 1972-12-22

Publications (1)

Publication Number Publication Date
GB1442797A true GB1442797A (en) 1976-07-14

Family

ID=23234356

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5941673A Expired GB1442797A (en) 1972-12-22 1973-12-21 Radiation-sensitive copolymer

Country Status (6)

Country Link
JP (1) JPS5630849B2 (en)
BE (1) BE809031A (en)
CA (1) CA1005673A (en)
FR (1) FR2211677B1 (en)
GB (1) GB1442797A (en)
IT (1) IT1000552B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPS61206293A (en) * 1985-03-08 1986-09-12 日本ペイント株式会社 Manufacture of circuit board
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
DE3852559T2 (en) * 1987-03-12 1995-05-24 Konishiroku Photo Ind Photosensitive positive planographic printing plate.
DE3731439A1 (en) * 1987-09-18 1989-03-30 Hoechst Ag RADIATION SENSITIVE MIXTURE AND COPIER MATERIAL PRODUCED THEREOF
JPH07119374B2 (en) * 1987-11-06 1995-12-20 関西ペイント株式会社 Positive type photosensitive cationic electrodeposition coating composition

Also Published As

Publication number Publication date
DE2364178A1 (en) 1974-07-11
BE809031A (en) 1974-06-21
DE2364178B2 (en) 1976-01-15
IT1000552B (en) 1976-04-10
JPS5630849B2 (en) 1981-07-17
JPS49126403A (en) 1974-12-04
CA1005673A (en) 1977-02-22
FR2211677B1 (en) 1977-08-12
FR2211677A1 (en) 1974-07-19

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19921221