IT1000552B - COMPOSITION BY RESERVE AND BY PHOTOLITHOGRAPHY - Google Patents

COMPOSITION BY RESERVE AND BY PHOTOLITHOGRAPHY

Info

Publication number
IT1000552B
IT1000552B IT7076573A IT7076573A IT1000552B IT 1000552 B IT1000552 B IT 1000552B IT 7076573 A IT7076573 A IT 7076573A IT 7076573 A IT7076573 A IT 7076573A IT 1000552 B IT1000552 B IT 1000552B
Authority
IT
Italy
Prior art keywords
photolithography
reserve
composition
Prior art date
Application number
IT7076573A
Other languages
Italian (it)
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of IT1000552B publication Critical patent/IT1000552B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
IT7076573A 1972-12-22 1973-12-20 COMPOSITION BY RESERVE AND BY PHOTOLITHOGRAPHY IT1000552B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31758572A 1972-12-22 1972-12-22

Publications (1)

Publication Number Publication Date
IT1000552B true IT1000552B (en) 1976-04-10

Family

ID=23234356

Family Applications (1)

Application Number Title Priority Date Filing Date
IT7076573A IT1000552B (en) 1972-12-22 1973-12-20 COMPOSITION BY RESERVE AND BY PHOTOLITHOGRAPHY

Country Status (6)

Country Link
JP (1) JPS5630849B2 (en)
BE (1) BE809031A (en)
CA (1) CA1005673A (en)
FR (1) FR2211677B1 (en)
GB (1) GB1442797A (en)
IT (1) IT1000552B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPS61206293A (en) * 1985-03-08 1986-09-12 日本ペイント株式会社 Manufacture of circuit board
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
EP0287212B1 (en) * 1987-03-12 1994-12-28 Mitsubishi Chemical Corporation Positive photosensitive planographic printing plate
DE3731439A1 (en) * 1987-09-18 1989-03-30 Hoechst Ag RADIATION SENSITIVE MIXTURE AND COPIER MATERIAL PRODUCED THEREOF
JPH07119374B2 (en) * 1987-11-06 1995-12-20 関西ペイント株式会社 Positive type photosensitive cationic electrodeposition coating composition

Also Published As

Publication number Publication date
FR2211677B1 (en) 1977-08-12
JPS49126403A (en) 1974-12-04
BE809031A (en) 1974-06-21
FR2211677A1 (en) 1974-07-19
GB1442797A (en) 1976-07-14
JPS5630849B2 (en) 1981-07-17
DE2364178B2 (en) 1976-01-15
DE2364178A1 (en) 1974-07-11
CA1005673A (en) 1977-02-22

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