GB1411966A - Photosensitive polyamide compositions - Google Patents
Photosensitive polyamide compositionsInfo
- Publication number
- GB1411966A GB1411966A GB5819672A GB5819672A GB1411966A GB 1411966 A GB1411966 A GB 1411966A GB 5819672 A GB5819672 A GB 5819672A GB 5819672 A GB5819672 A GB 5819672A GB 1411966 A GB1411966 A GB 1411966A
- Authority
- GB
- United Kingdom
- Prior art keywords
- sulphonate
- meth
- polyamide
- derivatives
- groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004952 Polyamide Substances 0.000 title abstract 5
- 229920002647 polyamide Polymers 0.000 title abstract 5
- 239000000203 mixture Substances 0.000 title abstract 3
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 abstract 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 4
- 150000001875 compounds Chemical class 0.000 abstract 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 abstract 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 abstract 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 abstract 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 abstract 2
- 239000000376 reactant Substances 0.000 abstract 2
- -1 triazine compound Chemical class 0.000 abstract 2
- IAHOUQOWMXVMEH-UHFFFAOYSA-N 2,4,6-trinitroaniline Chemical compound NC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O IAHOUQOWMXVMEH-UHFFFAOYSA-N 0.000 abstract 1
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 abstract 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 abstract 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- 239000004342 Benzoyl peroxide Substances 0.000 abstract 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 abstract 1
- 229920002292 Nylon 6 Polymers 0.000 abstract 1
- 229920002302 Nylon 6,6 Polymers 0.000 abstract 1
- 244000028419 Styrax benzoin Species 0.000 abstract 1
- 235000000126 Styrax benzoin Nutrition 0.000 abstract 1
- 235000008411 Sumatra benzointree Nutrition 0.000 abstract 1
- 239000007983 Tris buffer Substances 0.000 abstract 1
- 229910052783 alkali metal Inorganic materials 0.000 abstract 1
- 150000001340 alkali metals Chemical class 0.000 abstract 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 abstract 1
- 150000004056 anthraquinones Chemical class 0.000 abstract 1
- 150000008378 aryl ethers Chemical class 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- JXLHNMVSKXFWAO-UHFFFAOYSA-N azane;7-fluoro-2,1,3-benzoxadiazole-4-sulfonic acid Chemical compound N.OS(=O)(=O)C1=CC=C(F)C2=NON=C12 JXLHNMVSKXFWAO-UHFFFAOYSA-N 0.000 abstract 1
- DMKGSUIMVRYBCS-UHFFFAOYSA-N benzhydryl(methyl)diazene Chemical compound C=1C=CC=CC=1C(N=NC)C1=CC=CC=C1 DMKGSUIMVRYBCS-UHFFFAOYSA-N 0.000 abstract 1
- 229960002130 benzoin Drugs 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 235000019400 benzoyl peroxide Nutrition 0.000 abstract 1
- 150000001768 cations Chemical class 0.000 abstract 1
- 125000000524 functional group Chemical group 0.000 abstract 1
- 235000019382 gum benzoic Nutrition 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 125000001453 quaternary ammonium group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
- C08G69/42—Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polyamides (AREA)
- Graft Or Block Polymers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB5190974A GB1463900A (en) | 1971-12-15 | 1974-11-29 | Photosensitive polyamide composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46101680A JPS516562B2 (enrdf_load_stackoverflow) | 1971-12-15 | 1971-12-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1411966A true GB1411966A (en) | 1975-10-29 |
Family
ID=14307047
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5819672A Expired GB1411966A (en) | 1971-12-15 | 1972-12-15 | Photosensitive polyamide compositions |
| GB5190974A Expired GB1463900A (en) | 1971-12-15 | 1974-11-29 | Photosensitive polyamide composition |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5190974A Expired GB1463900A (en) | 1971-12-15 | 1974-11-29 | Photosensitive polyamide composition |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS516562B2 (enrdf_load_stackoverflow) |
| DE (1) | DE2261494C2 (enrdf_load_stackoverflow) |
| FR (1) | FR2163703B1 (enrdf_load_stackoverflow) |
| GB (2) | GB1411966A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0775773A4 (en) * | 1994-08-09 | 1998-08-26 | Asahi Chemical Ind | ADHESIVE UPHOLSTERY MATERIAL, METHOD FOR THE PRODUCTION THEREOF AND BINDING AGENT FOR UPHOLSTERY |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49127708A (enrdf_load_stackoverflow) * | 1973-04-16 | 1974-12-06 | ||
| JPS5092996A (enrdf_load_stackoverflow) * | 1973-12-22 | 1975-07-24 | ||
| JPS50105126A (enrdf_load_stackoverflow) * | 1974-01-26 | 1975-08-19 | ||
| JPS50108003A (enrdf_load_stackoverflow) * | 1974-02-01 | 1975-08-26 | ||
| JPS5149803A (ja) * | 1974-10-28 | 1976-04-30 | Unitika Ltd | Kankoseijushisoseibutsuno nenchakuseiboshihoho |
| CA1149985A (en) * | 1980-04-26 | 1983-07-12 | Takashi Okamoto | Resin composition comprising water-soluble polyamide and vinyl alcohol-based polymer |
| GB2092164B (en) * | 1980-12-17 | 1984-12-05 | Hitachi Ltd | Loght or radiation-sensitive polymer composition |
| JPS5967258U (ja) * | 1982-10-27 | 1984-05-07 | 東レ株式会社 | スタンプ |
| JPS6030965U (ja) * | 1983-08-05 | 1985-03-02 | 三菱重工業株式会社 | 冷凍装置 |
| GB2235927B (en) * | 1989-09-14 | 1992-10-21 | Asahi Chemical Ind | A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same |
| DE69413762T2 (de) * | 1993-07-20 | 1999-03-04 | Toray Industries, Inc., Tokio/Tokyo | Fotoempfindliche Polymer-Zusammensetzung |
| US6010821A (en) | 1997-05-23 | 2000-01-04 | Minnesota Mining And Manufacturing Company | Aqueous developable color proofing elements |
| US6569602B1 (en) | 1998-10-05 | 2003-05-27 | E. I. Du Pont De Nemours And Company | Ionization radiation imageable photopolymer compositions |
| US6890701B2 (en) | 2001-09-11 | 2005-05-10 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
| WO2006084887A1 (de) * | 2005-02-10 | 2006-08-17 | Bozzetto Gmbh | Vernetzbare schmelzklebermischung |
| DE102006017346B4 (de) * | 2006-04-11 | 2011-01-27 | Cpp Creative - Polymers - Produktions Gmbh | Migrationsstabiler Masterbatch mit verbesserten Vernetzungseigenschaften, Verfahren zu dessen Herstellung und Verwendung desselben |
| JP2008273453A (ja) * | 2007-05-02 | 2008-11-13 | Hinomoto Osaka:Kk | 鞄用車輪 |
| US9828467B2 (en) | 2016-02-05 | 2017-11-28 | International Business Machines Corporation | Photoresponsive hexahydrotriazine polymers |
-
1971
- 1971-12-15 JP JP46101680A patent/JPS516562B2/ja not_active Expired
-
1972
- 1972-12-15 FR FR7244824A patent/FR2163703B1/fr not_active Expired
- 1972-12-15 GB GB5819672A patent/GB1411966A/en not_active Expired
- 1972-12-15 DE DE19722261494 patent/DE2261494C2/de not_active Expired
-
1974
- 1974-11-29 GB GB5190974A patent/GB1463900A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0775773A4 (en) * | 1994-08-09 | 1998-08-26 | Asahi Chemical Ind | ADHESIVE UPHOLSTERY MATERIAL, METHOD FOR THE PRODUCTION THEREOF AND BINDING AGENT FOR UPHOLSTERY |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2163703B1 (enrdf_load_stackoverflow) | 1981-06-26 |
| FR2163703A1 (enrdf_load_stackoverflow) | 1973-07-27 |
| GB1463900A (en) | 1977-02-09 |
| JPS4868302A (enrdf_load_stackoverflow) | 1973-09-18 |
| DE2261494A1 (de) | 1973-07-05 |
| DE2261494C2 (de) | 1982-03-04 |
| JPS516562B2 (enrdf_load_stackoverflow) | 1976-02-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |