GB1411966A - Photosensitive polyamide compositions - Google Patents

Photosensitive polyamide compositions

Info

Publication number
GB1411966A
GB1411966A GB5819672A GB5819672A GB1411966A GB 1411966 A GB1411966 A GB 1411966A GB 5819672 A GB5819672 A GB 5819672A GB 5819672 A GB5819672 A GB 5819672A GB 1411966 A GB1411966 A GB 1411966A
Authority
GB
United Kingdom
Prior art keywords
sulphonate
meth
polyamide
derivatives
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5819672A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Priority to GB5190974A priority Critical patent/GB1463900A/en
Publication of GB1411966A publication Critical patent/GB1411966A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/42—Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyamides (AREA)
  • Graft Or Block Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

1411966 Photopolymerizable compositions containing polyamides UNITIKA Ltd 15 Dec 1972 [15 Dec 1971] 58196/72 Headings C3P and C3R [Also in Divisions G2 and C2] Photosensitive compositions useful in the production of printing plates comprise one or more polyamides having pendant sulphonate salt groups, one or more unsaturated compounds having at least two polymerizable ethylenic double bonds, and one or more photoinitiators. The polyamide sulphonate can be prepared by reacting a polyamide-forming reactant with a polyfunctional compound having a sulphonate salt group, e.g. a triazine compound containing aromatic ether (and optionally also hydroxyl group) and sulphonate substituents; or by reacting a polyamide-forming reactant with an aromatic or aliphatic sulphonate salt having two amide-forming functional groups. Preferred polyamides into which the sulphonate groups are introduced are copolyamides of nylon 6, nylon 66 and poly-(hexamethylene-(5-sodiumsulpho)-isophthalamide). The cation of the sulphonate salt groups is preferably alkali metal ammonium, or quaternary ammonium. Suitable unsaturated compounds include bis-(alk)-acrylamides, glycol di - (meth) - acrylates, tris - N- (meth) - acryloyl - hexahydrotriazine, pentaerythritol tetra-(meth)-acrylate, glycerol tri-(meth)- acrylate and O,N - diacryloyl - m - aminophenol. Examples of photoinitiators are benzoyl peroxide, azobisisobutyronitrile, diphenylazomethane, benzophenone and derivatives, benzoin and derivatives, anthraquinone, p-nitro aniline and picramide. Optional components include polymerization inhibitors, compounds containing only one polymerizable ethylenic double bond, e.g. acrylamide and its derivatives and glycol mono-(meth)-acrylates.
GB5819672A 1971-12-15 1972-12-15 Photosensitive polyamide compositions Expired GB1411966A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB5190974A GB1463900A (en) 1971-12-15 1974-11-29 Photosensitive polyamide composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46101680A JPS516562B2 (en) 1971-12-15 1971-12-15

Publications (1)

Publication Number Publication Date
GB1411966A true GB1411966A (en) 1975-10-29

Family

ID=14307047

Family Applications (2)

Application Number Title Priority Date Filing Date
GB5819672A Expired GB1411966A (en) 1971-12-15 1972-12-15 Photosensitive polyamide compositions
GB5190974A Expired GB1463900A (en) 1971-12-15 1974-11-29 Photosensitive polyamide composition

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB5190974A Expired GB1463900A (en) 1971-12-15 1974-11-29 Photosensitive polyamide composition

Country Status (4)

Country Link
JP (1) JPS516562B2 (en)
DE (1) DE2261494C2 (en)
FR (1) FR2163703B1 (en)
GB (2) GB1411966A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0775773A1 (en) * 1994-08-09 1997-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Adhesive padding cloth, method of manufacturing the same and bonding agent for adhesive cloths

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49127708A (en) * 1973-04-16 1974-12-06
JPS5092996A (en) * 1973-12-22 1975-07-24
JPS50105126A (en) * 1974-01-26 1975-08-19
JPS50108003A (en) * 1974-02-01 1975-08-26
JPS5149803A (en) * 1974-10-28 1976-04-30 Unitika Ltd KANKOSEIJUSHISOSEIBUTSUNO NENCHAKUSEIBOSHIHOHO
CA1149985A (en) * 1980-04-26 1983-07-12 Takashi Okamoto Resin composition comprising water-soluble polyamide and vinyl alcohol-based polymer
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
JPS5967258U (en) * 1982-10-27 1984-05-07 東レ株式会社 stamp
JPS59163872U (en) * 1983-04-20 1984-11-02 三菱重工業株式会社 Refrigeration equipment
JPS6030965U (en) * 1983-08-05 1985-03-02 三菱重工業株式会社 Refrigeration equipment
GB2235927B (en) * 1989-09-14 1992-10-21 Asahi Chemical Ind A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
AU681664B2 (en) * 1993-07-20 1997-09-04 Toray Industries, Inc. Photosensitive polymer composition
US6010821A (en) * 1997-05-23 2000-01-04 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
US6569602B1 (en) 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
US6890701B2 (en) 2001-09-11 2005-05-10 Fuji Photo Film Co., Ltd. Photopolymerizable composition
KR20070104656A (en) * 2005-02-10 2007-10-26 보체토 게엠베하 Cross-linkable hot-melt adhesive blend
DE102006017346B4 (en) * 2006-04-11 2011-01-27 Cpp Creative - Polymers - Produktions Gmbh Migration-stable masterbatch with improved crosslinking properties, process for its preparation and use thereof
JP2008273453A (en) * 2007-05-02 2008-11-13 Hinomoto Osaka:Kk Wheel for bag
US9828467B2 (en) 2016-02-05 2017-11-28 International Business Machines Corporation Photoresponsive hexahydrotriazine polymers

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0775773A1 (en) * 1994-08-09 1997-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Adhesive padding cloth, method of manufacturing the same and bonding agent for adhesive cloths
EP0775773A4 (en) * 1994-08-09 1998-08-26 Asahi Chemical Ind Adhesive padding cloth, method of manufacturing the same and bonding agent for adhesive cloths

Also Published As

Publication number Publication date
DE2261494A1 (en) 1973-07-05
FR2163703B1 (en) 1981-06-26
GB1463900A (en) 1977-02-09
JPS516562B2 (en) 1976-02-28
FR2163703A1 (en) 1973-07-27
JPS4868302A (en) 1973-09-18
DE2261494C2 (en) 1982-03-04

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee