GB1463900A - Photosensitive polyamide composition - Google Patents

Photosensitive polyamide composition

Info

Publication number
GB1463900A
GB1463900A GB5190974A GB5190974A GB1463900A GB 1463900 A GB1463900 A GB 1463900A GB 5190974 A GB5190974 A GB 5190974A GB 5190974 A GB5190974 A GB 5190974A GB 1463900 A GB1463900 A GB 1463900A
Authority
GB
United Kingdom
Prior art keywords
polyamide
bis
sulpho
ester
methacrylamide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5190974A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Publication of GB1463900A publication Critical patent/GB1463900A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/42—Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
  • Graft Or Block Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

1463900 Water-developable photopolymerizable compositions UNITIKA Ltd 29 Nov 1974 51909/74 Addition to 1411966 Headings C3P and C3R [Also in Division G2] Water-developable, photopolymerizable compositions comprise a polyamide, an unsaturated compound having at least one ethylenic double bond, and a photoinitiator, the polyamide containing isophthaloyl groups in an amount of at least 0À5 moles/1000 g. and (5-sodium sulpho)- and/or (5-potassium sulpho)-isophthaloyl groups in an amount of at least 0À2 mole/1000 g. The unsaturated compound may be for example, a bis-acrylamide, a bis-methacrylamide, an O,N-bis-(a-alkyl)acryloyl compound of an amino alcohol or aminophenol, a poly (α-alkyl)acrylate ester of a polyhydric alcohol or phenol, a tri-N-(meth)acryloyl compound, acrylamide or methacrylamide or a derivative thereof, or a hydroxy-(meth)acrylate ester. Useful photoinitiators include benzophenone, benzoic or anthraquinone and derivatives thereof, and nitro compounds such as pnitroaniline or picramide. Optional components include polymerization inhibitors and colourants. The compositions are useful for producing printing plates for relief, offset, dry offset, silk screen and multicolour printing; as well as for producing electronic components, for ornamenting metal articles, and for aqueous paints. The polyamide component can be prepared by polymerizing (a) isophthalic acid or a suitable derivative thereof, e.g. the acid dichloride or dimethyl or diethyl ester, (b) 5-sodium (or potassium) sulpho-isophthalic acid or a suitable derivative thereof, e.g. the dimethyl ester, and (c) other polyamide-forming components, e.g. # - caprolactam, hexamethylene diammonium adipate and hexamethylenediamine (see the examples).
GB5190974A 1971-12-15 1974-11-29 Photosensitive polyamide composition Expired GB1463900A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP46101680A JPS516562B2 (en) 1971-12-15 1971-12-15
GB5819672A GB1411966A (en) 1971-12-15 1972-12-15 Photosensitive polyamide compositions

Publications (1)

Publication Number Publication Date
GB1463900A true GB1463900A (en) 1977-02-09

Family

ID=14307047

Family Applications (2)

Application Number Title Priority Date Filing Date
GB5819672A Expired GB1411966A (en) 1971-12-15 1972-12-15 Photosensitive polyamide compositions
GB5190974A Expired GB1463900A (en) 1971-12-15 1974-11-29 Photosensitive polyamide composition

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB5819672A Expired GB1411966A (en) 1971-12-15 1972-12-15 Photosensitive polyamide compositions

Country Status (4)

Country Link
JP (1) JPS516562B2 (en)
DE (1) DE2261494C2 (en)
FR (1) FR2163703B1 (en)
GB (2) GB1411966A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0039226A2 (en) * 1980-04-26 1981-11-04 Unitika Ltd. Resin composition comprising water-soluble polyamide and vinyl alcohol-based polymer
EP0775773A1 (en) * 1994-08-09 1997-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Adhesive padding cloth, method of manufacturing the same and bonding agent for adhesive cloths
US6010821A (en) * 1997-05-23 2000-01-04 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
US6569602B1 (en) * 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
EP1291718A3 (en) * 2001-09-11 2003-10-15 Fuji Photo Film Co., Ltd. Photopolymerizable composition
WO2006084887A1 (en) * 2005-02-10 2006-08-17 Bozzetto Gmbh Cross-linkable hot-melt adhesive blend
DE102006017346B4 (en) * 2006-04-11 2011-01-27 Cpp Creative - Polymers - Produktions Gmbh Migration-stable masterbatch with improved crosslinking properties, process for its preparation and use thereof
US9828467B2 (en) 2016-02-05 2017-11-28 International Business Machines Corporation Photoresponsive hexahydrotriazine polymers

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49127708A (en) * 1973-04-16 1974-12-06
JPS5092996A (en) * 1973-12-22 1975-07-24
JPS50105126A (en) * 1974-01-26 1975-08-19
JPS50108003A (en) * 1974-02-01 1975-08-26
JPS5149803A (en) * 1974-10-28 1976-04-30 Unitika Ltd KANKOSEIJUSHISOSEIBUTSUNO NENCHAKUSEIBOSHIHOHO
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
JPS5967258U (en) * 1982-10-27 1984-05-07 東レ株式会社 stamp
JPS59163872U (en) * 1983-04-20 1984-11-02 三菱重工業株式会社 Refrigeration equipment
JPS6030965U (en) * 1983-08-05 1985-03-02 三菱重工業株式会社 Refrigeration equipment
GB2235927B (en) * 1989-09-14 1992-10-21 Asahi Chemical Ind A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
DE69413762T2 (en) * 1993-07-20 1999-03-04 Toray Industries, Inc., Tokio/Tokyo Photosensitive polymer composition
JP2008273453A (en) * 2007-05-02 2008-11-13 Hinomoto Osaka:Kk Wheel for bag

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0039226A2 (en) * 1980-04-26 1981-11-04 Unitika Ltd. Resin composition comprising water-soluble polyamide and vinyl alcohol-based polymer
EP0039226A3 (en) * 1980-04-26 1982-08-18 Unitika Ltd. Resin composition comprising water-soluble polyamide and vinyl alcohol-based polymer
EP0775773A1 (en) * 1994-08-09 1997-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Adhesive padding cloth, method of manufacturing the same and bonding agent for adhesive cloths
EP0775773A4 (en) * 1994-08-09 1998-08-26 Asahi Chemical Ind Adhesive padding cloth, method of manufacturing the same and bonding agent for adhesive cloths
US6010821A (en) * 1997-05-23 2000-01-04 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
US6194123B1 (en) 1997-05-23 2001-02-27 Minnesota Mining And Manufacturing Company Manufacturing method for color proofing elements
US6569602B1 (en) * 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
US6916598B2 (en) 1998-10-05 2005-07-12 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
EP1291718A3 (en) * 2001-09-11 2003-10-15 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US6890701B2 (en) 2001-09-11 2005-05-10 Fuji Photo Film Co., Ltd. Photopolymerizable composition
WO2006084887A1 (en) * 2005-02-10 2006-08-17 Bozzetto Gmbh Cross-linkable hot-melt adhesive blend
DE102006017346B4 (en) * 2006-04-11 2011-01-27 Cpp Creative - Polymers - Produktions Gmbh Migration-stable masterbatch with improved crosslinking properties, process for its preparation and use thereof
US9828467B2 (en) 2016-02-05 2017-11-28 International Business Machines Corporation Photoresponsive hexahydrotriazine polymers
US10301429B2 (en) 2016-02-05 2019-05-28 International Business Machines Corporation Photoresponsive hexahydrotriazine polymers
US11066519B2 (en) 2016-02-05 2021-07-20 International Business Machines Corporation Photoresponsive hexahydrotriazine polymers

Also Published As

Publication number Publication date
GB1411966A (en) 1975-10-29
FR2163703A1 (en) 1973-07-27
JPS516562B2 (en) 1976-02-28
DE2261494A1 (en) 1973-07-05
JPS4868302A (en) 1973-09-18
FR2163703B1 (en) 1981-06-26
DE2261494C2 (en) 1982-03-04

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee