GB1406020A - Method of producing thin coating film on substrates - Google Patents

Method of producing thin coating film on substrates

Info

Publication number
GB1406020A
GB1406020A GB115774A GB115774A GB1406020A GB 1406020 A GB1406020 A GB 1406020A GB 115774 A GB115774 A GB 115774A GB 115774 A GB115774 A GB 115774A GB 1406020 A GB1406020 A GB 1406020A
Authority
GB
United Kingdom
Prior art keywords
reactor
substrates
coating film
thin coating
producing thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB115774A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Elektromat VEB
Original Assignee
Elektromat VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elektromat VEB filed Critical Elektromat VEB
Publication of GB1406020A publication Critical patent/GB1406020A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45519—Inert gas curtains
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
GB115774A 1973-03-08 1974-01-10 Method of producing thin coating film on substrates Expired GB1406020A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD16948573A DD107313A1 (da) 1973-03-08 1973-03-08

Publications (1)

Publication Number Publication Date
GB1406020A true GB1406020A (en) 1975-09-10

Family

ID=5490450

Family Applications (1)

Application Number Title Priority Date Filing Date
GB115774A Expired GB1406020A (en) 1973-03-08 1974-01-10 Method of producing thin coating film on substrates

Country Status (5)

Country Link
CS (1) CS167686B1 (da)
DD (1) DD107313A1 (da)
DE (1) DE2354435A1 (da)
FR (1) FR2220596B3 (da)
GB (1) GB1406020A (da)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0869103A1 (en) * 1997-03-31 1998-10-07 David Allan Atwood Organometallic single source precursors for inorganic films coatings and powders

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4435445A (en) * 1982-05-13 1984-03-06 Energy Conversion Devices, Inc. Photo-assisted CVD
DE19830842C1 (de) * 1998-07-09 1999-10-07 Siemens Ag Vorrichtung zum Abscheiden von Substanzen

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0869103A1 (en) * 1997-03-31 1998-10-07 David Allan Atwood Organometallic single source precursors for inorganic films coatings and powders

Also Published As

Publication number Publication date
DE2354435A1 (de) 1974-09-12
DD107313A1 (da) 1974-07-20
CS167686B1 (en) 1976-04-29
FR2220596A1 (da) 1974-10-04
FR2220596B3 (da) 1976-12-03

Similar Documents

Publication Publication Date Title
ES457595A1 (es) Procedimiento para la formacion de recubrimientos metalicos o de compuesto metalico sobre una cara de un sustrato de vidrio.
GB1448848A (en) Method for increasing rate of coating using vaporized reactants
MY107107A (en) Method for preparing vaporized reactants for chemical vapor deposition.
MY107421A (en) Gas feeding device and deposition film forming apparatus employing the same.
ES455227A1 (es) Procedimiento de recubrimiento de subtratos por deposicion de plasma.
US3107180A (en) Process for deposition of pyrolytic graphite
GB1406020A (en) Method of producing thin coating film on substrates
GB1151746A (en) A method for the Deposition of Silica Films
JPS57158370A (en) Formation of metallic thin film
GB2001947A (en) Pulverulent coating material
GB1387023A (en) Vapour deposition
GB1202689A (en) Bearings
GB1105870A (en) Manufacture of silicon carbide ribbons
GB1193739A (en) Process for the Production of Alkoxy Silanes
JPS5351187A (en) Gas phase chemical evaporation apparatus
JPS5575945A (en) Optical fiber coating method
GB934673A (en) Improvements in or relating to the production of semi-conductor materials
GB908860A (en) Improvements in and relating to the production of boron nitride coatings
JPS57123969A (en) Formation of zinc oxide film by vapor phase method using plasma
GB1451643A (da)
JPS55164072A (en) Coating
FR2114105A5 (en) Epitaxial radiation heated reactor - including a quartz reaction chamber
GB1120650A (en) Improvements in or relating to methods of producing coatings on substrates
JPS53126867A (en) Cvd apparatus
GB1424990A (en) Carbon filaments coated with silicon carbide and method of obtaining these filaments

Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee