DD107313A1 - - Google Patents

Info

Publication number
DD107313A1
DD107313A1 DD16948573A DD16948573A DD107313A1 DD 107313 A1 DD107313 A1 DD 107313A1 DD 16948573 A DD16948573 A DD 16948573A DD 16948573 A DD16948573 A DD 16948573A DD 107313 A1 DD107313 A1 DD 107313A1
Authority
DD
German Democratic Republic
Application number
DD16948573A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to DD16948573A priority Critical patent/DD107313A1/xx
Priority to DE19732354435 priority patent/DE2354435A1/de
Priority to CS842773A priority patent/CS167686B1/cs
Priority to GB115774A priority patent/GB1406020A/en
Priority to FR7405974A priority patent/FR2220596B3/fr
Publication of DD107313A1 publication Critical patent/DD107313A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45519—Inert gas curtains
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DD16948573A 1973-03-08 1973-03-08 DD107313A1 (da)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DD16948573A DD107313A1 (da) 1973-03-08 1973-03-08
DE19732354435 DE2354435A1 (de) 1973-03-08 1973-10-31 Verfahren zur herstellung duenner schichten auf unterlagen
CS842773A CS167686B1 (en) 1973-03-08 1973-12-06 Method of thin layers forming on base material
GB115774A GB1406020A (en) 1973-03-08 1974-01-10 Method of producing thin coating film on substrates
FR7405974A FR2220596B3 (da) 1973-03-08 1974-02-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD16948573A DD107313A1 (da) 1973-03-08 1973-03-08

Publications (1)

Publication Number Publication Date
DD107313A1 true DD107313A1 (da) 1974-07-20

Family

ID=5490450

Family Applications (1)

Application Number Title Priority Date Filing Date
DD16948573A DD107313A1 (da) 1973-03-08 1973-03-08

Country Status (5)

Country Link
CS (1) CS167686B1 (da)
DD (1) DD107313A1 (da)
DE (1) DE2354435A1 (da)
FR (1) FR2220596B3 (da)
GB (1) GB1406020A (da)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4435445A (en) * 1982-05-13 1984-03-06 Energy Conversion Devices, Inc. Photo-assisted CVD
US6124427A (en) * 1997-03-31 2000-09-26 North Dakota State University Organometallic single source precursors for inorganic films coatings and powders
DE19830842C1 (de) * 1998-07-09 1999-10-07 Siemens Ag Vorrichtung zum Abscheiden von Substanzen

Also Published As

Publication number Publication date
FR2220596B3 (da) 1976-12-03
GB1406020A (en) 1975-09-10
DE2354435A1 (de) 1974-09-12
CS167686B1 (en) 1976-04-29
FR2220596A1 (da) 1974-10-04

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