GB1403834A - Positive electron resist materials - Google Patents

Positive electron resist materials

Info

Publication number
GB1403834A
GB1403834A GB2036473A GB2036473A GB1403834A GB 1403834 A GB1403834 A GB 1403834A GB 2036473 A GB2036473 A GB 2036473A GB 2036473 A GB2036473 A GB 2036473A GB 1403834 A GB1403834 A GB 1403834A
Authority
GB
United Kingdom
Prior art keywords
positive electron
electron resist
resist materials
butene
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2036473A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1403834A publication Critical patent/GB1403834A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Electron Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
GB2036473A 1972-05-01 1973-04-30 Positive electron resist materials Expired GB1403834A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24930872A 1972-05-01 1972-05-01

Publications (1)

Publication Number Publication Date
GB1403834A true GB1403834A (en) 1975-08-28

Family

ID=22942915

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2036473A Expired GB1403834A (en) 1972-05-01 1973-04-30 Positive electron resist materials

Country Status (8)

Country Link
JP (1) JPS512375B2 (enrdf_load_stackoverflow)
BE (1) BE798860A (enrdf_load_stackoverflow)
DE (1) DE2321684C3 (enrdf_load_stackoverflow)
FR (1) FR2183020B1 (enrdf_load_stackoverflow)
GB (1) GB1403834A (enrdf_load_stackoverflow)
IT (1) IT980926B (enrdf_load_stackoverflow)
NL (1) NL154015B (enrdf_load_stackoverflow)
SE (1) SE391405B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0005775A1 (en) * 1978-05-22 1979-12-12 Western Electric Company, Incorporated Article comprising a substrate and an overlying processing layer of actinic radiation-sensitive material and process for fabrication of the article

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1421805A (en) * 1972-11-13 1976-01-21 Ibm Method of forming a positive resist
US3893127A (en) * 1973-09-27 1975-07-01 Rca Corp Electron beam recording media
JPS59222928A (ja) * 1983-06-02 1984-12-14 Matsushita Electronics Corp マスク製作方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0005775A1 (en) * 1978-05-22 1979-12-12 Western Electric Company, Incorporated Article comprising a substrate and an overlying processing layer of actinic radiation-sensitive material and process for fabrication of the article

Also Published As

Publication number Publication date
FR2183020B1 (enrdf_load_stackoverflow) 1976-11-12
IT980926B (it) 1974-10-10
NL154015B (nl) 1977-07-15
FR2183020A1 (enrdf_load_stackoverflow) 1973-12-14
SE391405B (sv) 1977-02-14
DE2321684B1 (de) 1974-01-31
JPS512375B2 (enrdf_load_stackoverflow) 1976-01-26
DE2321684C3 (de) 1979-07-26
NL7305933A (enrdf_load_stackoverflow) 1973-11-05
BE798860A (fr) 1973-08-16
DE2321684A1 (de) 1973-11-15
JPS4942352A (enrdf_load_stackoverflow) 1974-04-20

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19930429