FR2183020A1 - - Google Patents

Info

Publication number
FR2183020A1
FR2183020A1 FR7314988A FR7314988A FR2183020A1 FR 2183020 A1 FR2183020 A1 FR 2183020A1 FR 7314988 A FR7314988 A FR 7314988A FR 7314988 A FR7314988 A FR 7314988A FR 2183020 A1 FR2183020 A1 FR 2183020A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7314988A
Other languages
French (fr)
Other versions
FR2183020B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of FR2183020A1 publication Critical patent/FR2183020A1/fr
Application granted granted Critical
Publication of FR2183020B1 publication Critical patent/FR2183020B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Electron Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR7314988A 1972-05-01 1973-04-25 Expired FR2183020B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24930872A 1972-05-01 1972-05-01

Publications (2)

Publication Number Publication Date
FR2183020A1 true FR2183020A1 (enrdf_load_stackoverflow) 1973-12-14
FR2183020B1 FR2183020B1 (enrdf_load_stackoverflow) 1976-11-12

Family

ID=22942915

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7314988A Expired FR2183020B1 (enrdf_load_stackoverflow) 1972-05-01 1973-04-25

Country Status (8)

Country Link
JP (1) JPS512375B2 (enrdf_load_stackoverflow)
BE (1) BE798860A (enrdf_load_stackoverflow)
DE (1) DE2321684C3 (enrdf_load_stackoverflow)
FR (1) FR2183020B1 (enrdf_load_stackoverflow)
GB (1) GB1403834A (enrdf_load_stackoverflow)
IT (1) IT980926B (enrdf_load_stackoverflow)
NL (1) NL154015B (enrdf_load_stackoverflow)
SE (1) SE391405B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2436422A1 (fr) * 1973-09-27 1980-04-11 Rca Corp Milieu d'enregistrement d'informations et procede d'enregistrement mettant en oeuvre un tel milieu

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1421805A (en) * 1972-11-13 1976-01-21 Ibm Method of forming a positive resist
US4289845A (en) * 1978-05-22 1981-09-15 Bell Telephone Laboratories, Inc. Fabrication based on radiation sensitive resists and related products
JPS59222928A (ja) * 1983-06-02 1984-12-14 Matsushita Electronics Corp マスク製作方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2436422A1 (fr) * 1973-09-27 1980-04-11 Rca Corp Milieu d'enregistrement d'informations et procede d'enregistrement mettant en oeuvre un tel milieu

Also Published As

Publication number Publication date
FR2183020B1 (enrdf_load_stackoverflow) 1976-11-12
IT980926B (it) 1974-10-10
NL154015B (nl) 1977-07-15
SE391405B (sv) 1977-02-14
DE2321684B1 (de) 1974-01-31
JPS512375B2 (enrdf_load_stackoverflow) 1976-01-26
DE2321684C3 (de) 1979-07-26
NL7305933A (enrdf_load_stackoverflow) 1973-11-05
BE798860A (fr) 1973-08-16
GB1403834A (en) 1975-08-28
DE2321684A1 (de) 1973-11-15
JPS4942352A (enrdf_load_stackoverflow) 1974-04-20

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