GB1392236A - Photosensitive compositions - Google Patents
Photosensitive compositionsInfo
- Publication number
- GB1392236A GB1392236A GB2899772A GB2899772A GB1392236A GB 1392236 A GB1392236 A GB 1392236A GB 2899772 A GB2899772 A GB 2899772A GB 2899772 A GB2899772 A GB 2899772A GB 1392236 A GB1392236 A GB 1392236A
- Authority
- GB
- United Kingdom
- Prior art keywords
- photo
- june
- solvent
- azidobenzal
- trichloroethylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 5
- 239000002904 solvent Substances 0.000 abstract 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 abstract 2
- 239000005062 Polybutadiene Substances 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000003431 cross linking reagent Substances 0.000 abstract 2
- 239000003504 photosensitizing agent Substances 0.000 abstract 2
- 229920002857 polybutadiene Polymers 0.000 abstract 2
- 238000007363 ring formation reaction Methods 0.000 abstract 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 abstract 2
- 239000008096 xylene Substances 0.000 abstract 2
- SGNFOELGBSFXQB-UHFFFAOYSA-N (2-azidophenyl)-phenylmethanone Chemical compound [N-]=[N+]=NC1=CC=CC=C1C(=O)C1=CC=CC=C1 SGNFOELGBSFXQB-UHFFFAOYSA-N 0.000 abstract 1
- QNQQYPDQLGLSQA-UHFFFAOYSA-N 1-azido-2-(2-phenylethenyl)benzene Chemical compound [N-]=[N+]=NC1=CC=CC=C1C=CC1=CC=CC=C1 QNQQYPDQLGLSQA-UHFFFAOYSA-N 0.000 abstract 1
- MLIWQXBKMZNZNF-UHFFFAOYSA-N 2,6-bis[(4-azidophenyl)methylidene]-4-methylcyclohexan-1-one Chemical compound O=C1C(=CC=2C=CC(=CC=2)N=[N+]=[N-])CC(C)CC1=CC1=CC=C(N=[N+]=[N-])C=C1 MLIWQXBKMZNZNF-UHFFFAOYSA-N 0.000 abstract 1
- UZNOMHUYXSAUPB-UHFFFAOYSA-N 2,6-bis[(4-azidophenyl)methylidene]cyclohexan-1-one Chemical group C1=CC(N=[N+]=[N-])=CC=C1C=C(CCC1)C(=O)C1=CC1=CC=C(N=[N+]=[N-])C=C1 UZNOMHUYXSAUPB-UHFFFAOYSA-N 0.000 abstract 1
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical group C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 abstract 1
- HUKPVYBUJRAUAG-UHFFFAOYSA-N 7-benzo[a]phenalenone Chemical compound C1=CC(C(=O)C=2C3=CC=CC=2)=C2C3=CC=CC2=C1 HUKPVYBUJRAUAG-UHFFFAOYSA-N 0.000 abstract 1
- SYLQWQKIHIIROP-UHFFFAOYSA-N ClC=C(Cl)Cl.ClCC(Cl)(Cl)Cl Chemical compound ClC=C(Cl)Cl.ClCC(Cl)(Cl)Cl SYLQWQKIHIIROP-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- CTRLRINCMYICJO-UHFFFAOYSA-N phenyl azide Chemical compound [N-]=[N+]=NC1=CC=CC=C1 CTRLRINCMYICJO-UHFFFAOYSA-N 0.000 abstract 1
- 229920002587 poly(1,3-butadiene) polymer Polymers 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
- 229920003051 synthetic elastomer Polymers 0.000 abstract 1
- 239000005061 synthetic rubber Substances 0.000 abstract 1
- 125000003944 tolyl group Chemical group 0.000 abstract 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
- C08C19/00—Chemical modification of rubber
- C08C19/10—Isomerisation; Cyclisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46044731A JPS5011284B1 (https=) | 1971-06-21 | 1971-06-21 | |
| JP46044991A JPS5011285B1 (https=) | 1971-06-22 | 1971-06-22 | |
| JP7685771A JPS5010725B2 (https=) | 1971-10-01 | 1971-10-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1392236A true GB1392236A (en) | 1975-04-30 |
Family
ID=27292010
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2899772A Expired GB1392236A (en) | 1971-06-21 | 1972-06-21 | Photosensitive compositions |
Country Status (6)
| Country | Link |
|---|---|
| CH (1) | CH571730A5 (https=) |
| DE (1) | DE2230969C3 (https=) |
| FR (1) | FR2143224B1 (https=) |
| GB (1) | GB1392236A (https=) |
| IT (1) | IT958468B (https=) |
| NL (1) | NL169234C (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6057584B2 (ja) * | 1979-04-24 | 1985-12-16 | ジェイエスアール株式会社 | ホトレジスト組成物 |
-
1972
- 1972-06-21 NL NL7208520A patent/NL169234C/xx not_active IP Right Cessation
- 1972-06-21 DE DE19722230969 patent/DE2230969C3/de not_active Expired
- 1972-06-21 CH CH929072A patent/CH571730A5/xx not_active IP Right Cessation
- 1972-06-21 GB GB2899772A patent/GB1392236A/en not_active Expired
- 1972-06-21 IT IT5104372A patent/IT958468B/it active
- 1972-06-21 FR FR7222420A patent/FR2143224B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CH571730A5 (https=) | 1976-01-15 |
| FR2143224A1 (https=) | 1973-02-02 |
| DE2230969B2 (de) | 1975-02-13 |
| DE2230969C3 (de) | 1975-09-25 |
| NL169234B (nl) | 1982-01-18 |
| NL169234C (nl) | 1982-06-16 |
| FR2143224B1 (https=) | 1978-03-03 |
| DE2230969A1 (de) | 1972-12-28 |
| IT958468B (it) | 1973-10-20 |
| NL7208520A (https=) | 1972-12-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PE20 | Patent expired after termination of 20 years |