GB1354756A - Method for increasing the photographic speed of an oxygen-sensitive photoresist - Google Patents
Method for increasing the photographic speed of an oxygen-sensitive photoresistInfo
- Publication number
- GB1354756A GB1354756A GB4086971A GB4086971A GB1354756A GB 1354756 A GB1354756 A GB 1354756A GB 4086971 A GB4086971 A GB 4086971A GB 4086971 A GB4086971 A GB 4086971A GB 1354756 A GB1354756 A GB 1354756A
- Authority
- GB
- United Kingdom
- Prior art keywords
- resist
- photo
- layer
- coated
- increasing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000001301 oxygen Substances 0.000 title abstract 2
- 229910052760 oxygen Inorganic materials 0.000 title abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 title 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 3
- 239000010410 layer Substances 0.000 abstract 3
- 239000001828 Gelatine Substances 0.000 abstract 2
- 238000001035 drying Methods 0.000 abstract 2
- 229920000159 gelatin Polymers 0.000 abstract 2
- 235000019322 gelatine Nutrition 0.000 abstract 2
- 239000011521 glass Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
- 239000005708 Sodium hypochlorite Substances 0.000 abstract 1
- 150000001540 azides Chemical class 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 239000012954 diazonium Substances 0.000 abstract 1
- 150000001989 diazonium salts Chemical class 0.000 abstract 1
- UPBDXRPQPOWRKR-UHFFFAOYSA-N furan-2,5-dione;methoxyethene Chemical compound COC=C.O=C1OC(=O)C=C1 UPBDXRPQPOWRKR-UHFFFAOYSA-N 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- ZPWSKXDJLWXYSL-UHFFFAOYSA-L zinc;4-diazo-n,n-dimethylcyclohexa-1,5-dien-1-amine;dichloride Chemical compound [Cl-].[Cl-].[Zn+2].CN(C)C1=CCC(=[N+]=[N-])C=C1 ZPWSKXDJLWXYSL-UHFFFAOYSA-L 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10043770A | 1970-12-21 | 1970-12-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1354756A true GB1354756A (en) | 1974-06-05 |
Family
ID=22279771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4086971A Expired GB1354756A (en) | 1970-12-21 | 1971-09-02 | Method for increasing the photographic speed of an oxygen-sensitive photoresist |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3669667A (cg-RX-API-DMAC10.html) |
| DE (1) | DE2163178A1 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2119316A5 (cg-RX-API-DMAC10.html) |
| GB (1) | GB1354756A (cg-RX-API-DMAC10.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4784936A (en) * | 1985-10-24 | 1988-11-15 | General Electric Company | Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer |
| US6541183B2 (en) * | 2001-06-04 | 2003-04-01 | Gary Ganghui Teng | Negative lithographic printing plates having a semisolid radiation-sensitive layer |
| US8708703B2 (en) * | 2005-08-15 | 2014-04-29 | Matthew Earl Fluster | Method and apparatus for teaching mathematics |
-
1970
- 1970-12-21 US US100437A patent/US3669667A/en not_active Expired - Lifetime
-
1971
- 1971-09-02 GB GB4086971A patent/GB1354756A/en not_active Expired
- 1971-10-12 FR FR7137580A patent/FR2119316A5/fr not_active Expired
- 1971-12-20 DE DE19712163178 patent/DE2163178A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US3669667A (en) | 1972-06-13 |
| FR2119316A5 (cg-RX-API-DMAC10.html) | 1972-08-04 |
| DE2163178A1 (de) | 1972-07-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |