GB1341273A - Silicon transistors and methods of making them - Google Patents

Silicon transistors and methods of making them

Info

Publication number
GB1341273A
GB1341273A GB2403071*A GB2403071A GB1341273A GB 1341273 A GB1341273 A GB 1341273A GB 2403071 A GB2403071 A GB 2403071A GB 1341273 A GB1341273 A GB 1341273A
Authority
GB
United Kingdom
Prior art keywords
silicide
contact
emitter
region
implantation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2403071*A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1341273A publication Critical patent/GB1341273A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/14—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
    • H10P32/1408—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers
    • H10P32/1414—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers the applied layer being silicon, silicide or SIPOS, e.g. polysilicon or porous silicon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
    • H10P32/171—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material

Landscapes

  • Bipolar Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
GB2403071*A 1970-03-17 1971-04-19 Silicon transistors and methods of making them Expired GB1341273A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US2030870A 1970-03-17 1970-03-17

Publications (1)

Publication Number Publication Date
GB1341273A true GB1341273A (en) 1973-12-19

Family

ID=21797887

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2403071*A Expired GB1341273A (en) 1970-03-17 1971-04-19 Silicon transistors and methods of making them

Country Status (8)

Country Link
US (1) US3604986A (https=)
JP (1) JPS5128389B1 (https=)
BE (1) BE764261A (https=)
DE (1) DE2112114C3 (https=)
FR (1) FR2083349B1 (https=)
GB (1) GB1341273A (https=)
NL (1) NL7103420A (https=)
SE (1) SE357099B (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1355806A (en) * 1970-12-09 1974-06-05 Mullard Ltd Methods of manufacturing a semiconductor device
US3753774A (en) * 1971-04-05 1973-08-21 Rca Corp Method for making an intermetallic contact to a semiconductor device
US3700979A (en) * 1971-04-07 1972-10-24 Rca Corp Schottky barrier diode and method of making the same
US3900344A (en) * 1973-03-23 1975-08-19 Ibm Novel integratable schottky barrier structure and method for the fabrication thereof
US4408216A (en) * 1978-06-02 1983-10-04 International Rectifier Corporation Schottky device and method of manufacture using palladium and platinum intermetallic alloys and titanium barrier for low reverse leakage over wide temperature range
US4243435A (en) * 1979-06-22 1981-01-06 International Business Machines Corporation Bipolar transistor fabrication process with an ion implanted emitter
JPS57159055A (en) * 1981-03-25 1982-10-01 Toshiba Corp Manufacture of semiconductor device
US5198372A (en) * 1986-01-30 1993-03-30 Texas Instruments Incorporated Method for making a shallow junction bipolar transistor and transistor formed thereby

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1356197A (fr) * 1962-06-29 1964-03-20 Western Electric Co Contact de semiconducteur
FR1381871A (fr) * 1963-02-08 1964-12-14 Int Standard Electric Corp Méthode de fabrication de semi-conducteurs
USB421061I5 (https=) * 1964-12-24
FR1484390A (fr) * 1965-06-23 1967-06-09 Ion Physics Corp Procédé de fabrication de dispositifs semi-conducteurs
GB1093136A (en) * 1965-08-27 1967-11-29 Johnson Matthey Co Ltd Improvements in and relating to the bonding together of metals or alloys
DE1564704A1 (de) * 1966-09-12 1969-12-11 Siemens Ag Hochfrequenztransistor
US3558352A (en) * 1966-10-27 1971-01-26 Ibm Metallization process
US3472712A (en) * 1966-10-27 1969-10-14 Hughes Aircraft Co Field-effect device with insulated gate
US3458778A (en) * 1967-05-29 1969-07-29 Microwave Ass Silicon semiconductor with metal-silicide heterojunction
DE1932164B2 (de) * 1968-07-15 1972-04-06 International Business Machines Corp , Armonk, NY (V St A ) Verfahren zum einlegieren von metall in teilbereiche eines insbesondere aus halbleitermaterial bestehenden substrats
US3601888A (en) * 1969-04-25 1971-08-31 Gen Electric Semiconductor fabrication technique and devices formed thereby utilizing a doped metal conductor

Also Published As

Publication number Publication date
DE2112114B2 (de) 1973-04-05
FR2083349B1 (https=) 1974-02-15
BE764261A (fr) 1971-08-02
DE2112114C3 (de) 1980-01-31
NL7103420A (https=) 1971-09-21
JPS5128389B1 (https=) 1976-08-18
FR2083349A1 (https=) 1971-12-17
DE2112114A1 (de) 1971-10-07
SE357099B (https=) 1973-06-12
US3604986A (en) 1971-09-14

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee