GB1340671A - Process for epitaxially growing semiconductor crystals of predetermined conductivity type - Google Patents

Process for epitaxially growing semiconductor crystals of predetermined conductivity type

Info

Publication number
GB1340671A
GB1340671A GB5957170A GB5957170A GB1340671A GB 1340671 A GB1340671 A GB 1340671A GB 5957170 A GB5957170 A GB 5957170A GB 5957170 A GB5957170 A GB 5957170A GB 1340671 A GB1340671 A GB 1340671A
Authority
GB
United Kingdom
Prior art keywords
elements
bath
conductivity type
proportion
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5957170A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of GB1340671A publication Critical patent/GB1340671A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02417Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • H01L21/02485Other chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02568Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/0257Doping during depositing
    • H01L21/02573Conductivity type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/02623Liquid deposition
    • H01L21/02628Liquid deposition using solutions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/063Gp II-IV-VI compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Led Devices (AREA)
  • Light Receiving Elements (AREA)
GB5957170A 1969-12-17 1970-12-15 Process for epitaxially growing semiconductor crystals of predetermined conductivity type Expired GB1340671A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR6943698A FR2071085A5 (enrdf_load_stackoverflow) 1969-12-17 1969-12-17

Publications (1)

Publication Number Publication Date
GB1340671A true GB1340671A (en) 1973-12-12

Family

ID=9044715

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5957170A Expired GB1340671A (en) 1969-12-17 1970-12-15 Process for epitaxially growing semiconductor crystals of predetermined conductivity type

Country Status (7)

Country Link
US (1) US3718511A (enrdf_load_stackoverflow)
BE (1) BE760375A (enrdf_load_stackoverflow)
DE (1) DE2062041C3 (enrdf_load_stackoverflow)
FR (1) FR2071085A5 (enrdf_load_stackoverflow)
GB (1) GB1340671A (enrdf_load_stackoverflow)
LU (1) LU62262A1 (enrdf_load_stackoverflow)
NL (1) NL7018330A (enrdf_load_stackoverflow)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3925147A (en) * 1971-08-30 1975-12-09 Hughes Aircraft Co Preparation of monocrystalline lead tin telluride
US3770565A (en) * 1972-01-05 1973-11-06 Us Navy Plastic mounting of epitaxially grown iv-vi compound semiconducting films
US3902924A (en) * 1973-08-30 1975-09-02 Honeywell Inc Growth of mercury cadmium telluride by liquid phase epitaxy and the product thereof
US4075043A (en) * 1976-09-01 1978-02-21 Rockwell International Corporation Liquid phase epitaxy method of growing a junction between two semiconductive materials utilizing an interrupted growth technique
US4273596A (en) * 1978-10-03 1981-06-16 The United States Of America As Represented By The Secretary Of The Army Method of preparing a monolithic intrinsic infrared focal plane charge coupled device imager
US4315477A (en) * 1980-03-24 1982-02-16 Rockwell International Corporation Semi-open liquid phase epitaxial growth system
US4263065A (en) * 1980-03-24 1981-04-21 Rockwell International Corporation Semi-open liquid phase epitaxial growth system
JPS575325A (en) * 1980-06-12 1982-01-12 Junichi Nishizawa Semicondoctor p-n junction device and manufacture thereof
US4401487A (en) * 1980-11-14 1983-08-30 Hughes Aircraft Company Liquid phase epitaxy of mercury cadmium telluride layer
US4376663A (en) * 1980-11-18 1983-03-15 The United States Of America As Represented By The Secretary Of The Army Method for growing an epitaxial layer of CdTe on an epitaxial layer of HgCdTe grown on a CdTe substrate
US4357620A (en) * 1980-11-18 1982-11-02 The United States Of America As Represented By The Secretary Of The Army Liquid-phase epitaxial growth of cdTe on HgCdTe
DE3722881C2 (de) * 1987-07-10 1995-02-16 Kernforschungsz Karlsruhe Schaltermatrix mit optisch nichtlinearen, z.B. bistabilen, Elementen und Verfahren zur Herstellung derselben
EP1039291A1 (en) * 1999-03-26 2000-09-27 Sony International (Europe) GmbH Optochemical sensor and method for its construction
EP1535309B1 (en) * 2002-06-10 2008-11-12 II-VI Incorporated Radiation detector
JP7518785B2 (ja) * 2021-03-08 2024-07-18 株式会社東芝 光電変換素子及びその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1043530A (en) * 1961-12-26 1966-09-21 Minnesota Mining & Mfg Improvements in or relating to thermoelectric devices

Also Published As

Publication number Publication date
US3718511A (en) 1973-02-27
DE2062041B2 (enrdf_load_stackoverflow) 1979-06-21
DE2062041A1 (de) 1971-06-24
FR2071085A5 (enrdf_load_stackoverflow) 1971-09-17
LU62262A1 (enrdf_load_stackoverflow) 1971-05-14
BE760375A (fr) 1971-05-17
DE2062041C3 (de) 1980-02-21
NL7018330A (enrdf_load_stackoverflow) 1971-06-21

Similar Documents

Publication Publication Date Title
GB1340671A (en) Process for epitaxially growing semiconductor crystals of predetermined conductivity type
US3149395A (en) Method of making a varactor diode by epitaxial growth and diffusion
US3752713A (en) Method of manufacturing semiconductor elements by liquid phase epitaxial growing method
US2762730A (en) Method of making barriers in semiconductors
US3676228A (en) Method of making a p-n junction device
US3092591A (en) Method of making degeneratively doped group iii-v compound semiconductor material
GB1336672A (en) Methods of epitaxially depositing a semiconductor compound
GB1183247A (en) Gallium Arsenide
GB1473485A (en) Method for growing crystals of iii-v compound semicon ductors
US3823043A (en) Method of manufacturing semiconductor body
US3266952A (en) Compound semiconductor devices
US3084078A (en) High frequency germanium transistor
GB1149109A (en) Preparation of semiconductor compounds
US2785096A (en) Manufacture of junction-containing silicon crystals
US2997410A (en) Single crystalline alloys
JPS5289070A (en) Semiconductor device
US3198671A (en) Method of manufacturing monocrystalline bodies of semi-conductive material
US2993818A (en) Method for growing semiconductor crystals
GB1526898A (en) Production of epitaxial layers on monocrystalline substrates
SU639358A1 (ru) Способ получени р-п структур
GB1279538A (en) A manufacturing method of a monocrystal of a compound semiconductor
JPS57178394A (en) Manufacture of semiconductor light emitting device
GB861196A (en) Electrically asymmetrically conductive systems with at least one p-n junction and methods of producing such systems
Goodman The regrown-diffused transistor
GB1332348A (en) Silicon carbide junction diode

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee