GB1334197A - Cathode sputtering electrode assemblies - Google Patents

Cathode sputtering electrode assemblies

Info

Publication number
GB1334197A
GB1334197A GB392672A GB392672A GB1334197A GB 1334197 A GB1334197 A GB 1334197A GB 392672 A GB392672 A GB 392672A GB 392672 A GB392672 A GB 392672A GB 1334197 A GB1334197 A GB 1334197A
Authority
GB
United Kingdom
Prior art keywords
wall
cathode body
flange
sputtering electrode
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB392672A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ion Equipment Corp
Original Assignee
Ion Equipment Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ion Equipment Corp filed Critical Ion Equipment Corp
Publication of GB1334197A publication Critical patent/GB1334197A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1334197 Sputtering electrode assembly ION EQUIPMENT CORP 27 Jan 1972 [4 Feb 1971] 3926/72 Heading C7F A sputtering electrode assembly 40 adapted for removable mounting in a port 43 in a horizontal wall portion 41 of a vacuum chamber comprises a cathode body 51 having a peripheral flange 54, an insulating collar 66, vacuum-tight and removably mounted between the under surface of flange 54 and the exterior surface of wall 41 and an insulating collar removably mounted between the upper surface of flange 54 and a mounting plate 75, said mounting plate 75 having outwardly extending ears 76 for removably mounting the cathode body in vacuum-tight fashion to wall 41, e.g. as by screws 78. A target back-up electrode 52 may be mounted on cathode body 51, e.g. by a screw thread to a connector 82 which bears current conductor 85; there may be a passage 62 provided between 51 and 52 such that coolant liquid can circulate through pipes 94 and 95 and space 62 as shown; a dark space shield 53 may be attached to wall 41.
GB392672A 1971-02-04 1972-01-27 Cathode sputtering electrode assemblies Expired GB1334197A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11269571A 1971-02-04 1971-02-04

Publications (1)

Publication Number Publication Date
GB1334197A true GB1334197A (en) 1973-10-17

Family

ID=22345365

Family Applications (1)

Application Number Title Priority Date Filing Date
GB392672A Expired GB1334197A (en) 1971-02-04 1972-01-27 Cathode sputtering electrode assemblies

Country Status (5)

Country Link
US (1) US3714019A (en)
JP (1) JPS5112029B1 (en)
DE (1) DE2204740A1 (en)
GB (1) GB1334197A (en)
NL (1) NL7201389A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2161837A (en) * 1984-07-20 1986-01-22 Balzers Hochvakuum Target plate for cathodic sputter coating

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4802968A (en) * 1988-01-29 1989-02-07 International Business Machines Corporation RF plasma processing apparatus
US6689254B1 (en) * 1990-10-31 2004-02-10 Tokyo Electron Limited Sputtering apparatus with isolated coolant and sputtering target therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2161837A (en) * 1984-07-20 1986-01-22 Balzers Hochvakuum Target plate for cathodic sputter coating

Also Published As

Publication number Publication date
US3714019A (en) 1973-01-30
JPS5112029B1 (en) 1976-04-15
NL7201389A (en) 1972-08-08
DE2204740A1 (en) 1972-08-24

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees