GB1331038A - Sputter deposition of magnetic coatings - Google Patents

Sputter deposition of magnetic coatings

Info

Publication number
GB1331038A
GB1331038A GB1886272A GB1886272A GB1331038A GB 1331038 A GB1331038 A GB 1331038A GB 1886272 A GB1886272 A GB 1886272A GB 1886272 A GB1886272 A GB 1886272A GB 1331038 A GB1331038 A GB 1331038A
Authority
GB
United Kingdom
Prior art keywords
oxide
sputtering
deposited
layers
oxygen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1886272A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1331038A publication Critical patent/GB1331038A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/26—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers
    • H01F10/265—Magnetic multilayers non exchange-coupled

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)
GB1886272A 1971-05-29 1972-04-24 Sputter deposition of magnetic coatings Expired GB1331038A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712126887 DE2126887C3 (de) 1971-05-29 1971-05-29 Niederschlagen magnetisierbarer Schichten durch Kathodenzerstäubung

Publications (1)

Publication Number Publication Date
GB1331038A true GB1331038A (en) 1973-09-19

Family

ID=5809356

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1886272A Expired GB1331038A (en) 1971-05-29 1972-04-24 Sputter deposition of magnetic coatings

Country Status (6)

Country Link
JP (1) JPS5328631B1 (enExample)
CA (1) CA984334A (enExample)
DE (1) DE2126887C3 (enExample)
FR (1) FR2139841B1 (enExample)
GB (1) GB1331038A (enExample)
IT (1) IT947677B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2153391A (en) * 1983-12-27 1985-08-21 Sharp Kk Protective coating for cobalt-chromium alloy magnetic recording layer

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5155995A (en) * 1974-11-12 1976-05-17 Nippon Telegraph & Telephone Sankabutsujiseihakumakuno seizohoho
CH595458A5 (enExample) * 1975-03-07 1978-02-15 Balzers Patent Beteilig Ag
US4481999A (en) * 1982-02-23 1984-11-13 The United States Of America As Represented By The United States Department Of Energy Method of forming a thin unbacked metal foil
JPS6115941A (ja) * 1984-06-30 1986-01-24 Res Dev Corp Of Japan 酸素を含む強磁性非晶質合金およびその製造法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3400066A (en) * 1965-11-15 1968-09-03 Ibm Sputtering processes for depositing thin films of controlled thickness
DE1955716A1 (de) * 1969-11-05 1971-05-13 Siemens Ag Verfahren zum Herstellen gut haftender Metallkontaktschichten insbesondere fuer Halbleiterbauelemente in Beam-Lead-Technik

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2153391A (en) * 1983-12-27 1985-08-21 Sharp Kk Protective coating for cobalt-chromium alloy magnetic recording layer

Also Published As

Publication number Publication date
JPS5328631B1 (enExample) 1978-08-16
DE2126887C3 (de) 1981-11-19
DE2126887B2 (de) 1981-01-08
CA984334A (en) 1976-02-24
DE2126887A1 (de) 1972-11-30
FR2139841A1 (enExample) 1973-01-12
IT947677B (it) 1973-05-30
FR2139841B1 (enExample) 1978-03-03

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee