JPS5328631B1 - - Google Patents
Info
- Publication number
- JPS5328631B1 JPS5328631B1 JP2907172A JP2907172A JPS5328631B1 JP S5328631 B1 JPS5328631 B1 JP S5328631B1 JP 2907172 A JP2907172 A JP 2907172A JP 2907172 A JP2907172 A JP 2907172A JP S5328631 B1 JPS5328631 B1 JP S5328631B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/26—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers
- H01F10/265—Magnetic multilayers non exchange-coupled
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712126887 DE2126887C3 (de) | 1971-05-29 | 1971-05-29 | Niederschlagen magnetisierbarer Schichten durch Kathodenzerstäubung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5328631B1 true JPS5328631B1 (enExample) | 1978-08-16 |
Family
ID=5809356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2907172A Pending JPS5328631B1 (enExample) | 1971-05-29 | 1972-03-24 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5328631B1 (enExample) |
| CA (1) | CA984334A (enExample) |
| DE (1) | DE2126887C3 (enExample) |
| FR (1) | FR2139841B1 (enExample) |
| GB (1) | GB1331038A (enExample) |
| IT (1) | IT947677B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5155995A (en) * | 1974-11-12 | 1976-05-17 | Nippon Telegraph & Telephone | Sankabutsujiseihakumakuno seizohoho |
| CH595458A5 (enExample) * | 1975-03-07 | 1978-02-15 | Balzers Patent Beteilig Ag | |
| US4481999A (en) * | 1982-02-23 | 1984-11-13 | The United States Of America As Represented By The United States Department Of Energy | Method of forming a thin unbacked metal foil |
| JPS60138720A (ja) * | 1983-12-27 | 1985-07-23 | Sharp Corp | 垂直磁気記録媒体 |
| JPS6115941A (ja) * | 1984-06-30 | 1986-01-24 | Res Dev Corp Of Japan | 酸素を含む強磁性非晶質合金およびその製造法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3400066A (en) * | 1965-11-15 | 1968-09-03 | Ibm | Sputtering processes for depositing thin films of controlled thickness |
| DE1955716A1 (de) * | 1969-11-05 | 1971-05-13 | Siemens Ag | Verfahren zum Herstellen gut haftender Metallkontaktschichten insbesondere fuer Halbleiterbauelemente in Beam-Lead-Technik |
-
1971
- 1971-05-29 DE DE19712126887 patent/DE2126887C3/de not_active Expired
-
1972
- 1972-02-18 IT IT2071672A patent/IT947677B/it active
- 1972-03-24 JP JP2907172A patent/JPS5328631B1/ja active Pending
- 1972-04-18 FR FR7214368A patent/FR2139841B1/fr not_active Expired
- 1972-04-24 GB GB1886272A patent/GB1331038A/en not_active Expired
- 1972-05-24 CA CA143,242A patent/CA984334A/en not_active Expired
Non-Patent Citations (1)
| Title |
|---|
| IEEE TRANSACTIONS ON MAGNETICS#N3=1966 * |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2126887C3 (de) | 1981-11-19 |
| DE2126887B2 (de) | 1981-01-08 |
| GB1331038A (en) | 1973-09-19 |
| CA984334A (en) | 1976-02-24 |
| DE2126887A1 (de) | 1972-11-30 |
| FR2139841A1 (enExample) | 1973-01-12 |
| IT947677B (it) | 1973-05-30 |
| FR2139841B1 (enExample) | 1978-03-03 |