GB1330502A - Manufacture of masks - Google Patents

Manufacture of masks

Info

Publication number
GB1330502A
GB1330502A GB4493570A GB1330502DA GB1330502A GB 1330502 A GB1330502 A GB 1330502A GB 4493570 A GB4493570 A GB 4493570A GB 1330502D A GB1330502D A GB 1330502DA GB 1330502 A GB1330502 A GB 1330502A
Authority
GB
United Kingdom
Prior art keywords
metal
resist
mask
computer
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4493570A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Ltd
Original Assignee
Texas Instruments Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Ltd filed Critical Texas Instruments Ltd
Publication of GB1330502A publication Critical patent/GB1330502A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB4493570A 1970-09-21 1970-09-21 Manufacture of masks Expired GB1330502A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4493570 1970-09-21

Publications (1)

Publication Number Publication Date
GB1330502A true GB1330502A (en) 1973-09-19

Family

ID=10435289

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4493570A Expired GB1330502A (en) 1970-09-21 1970-09-21 Manufacture of masks

Country Status (3)

Country Link
US (1) US3855023A (https=)
JP (1) JPS5432316B1 (https=)
GB (1) GB1330502A (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4393312A (en) * 1976-02-05 1983-07-12 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
US4085330A (en) * 1976-07-08 1978-04-18 Burroughs Corporation Focused ion beam mask maker
US4131472A (en) * 1976-09-15 1978-12-26 Align-Rite Corporation Method for increasing the yield of batch processed microcircuit semiconductor devices
US4475037A (en) * 1982-05-11 1984-10-02 International Business Machines Corporation Method of inspecting a mask using an electron beam vector scan system
US4587184A (en) * 1983-07-27 1986-05-06 Siemens Aktiengesellschaft Method for manufacturing accurate structures with a high aspect ratio and particularly for manufacturing X-ray absorber masks
FR2783971B1 (fr) * 1998-09-30 2002-08-23 St Microelectronics Sa Circuit semi-conducteur comprenant des motifs en surface et procede de reglage d'un outil par rapport a cette surface
JP4062956B2 (ja) * 2002-04-24 2008-03-19 ソニー株式会社 検出装置、検出方法および電子ビーム照射装置
JP2011034681A (ja) * 2009-07-29 2011-02-17 Hitachi Displays Ltd 金属加工方法、金属マスク製造方法及び有機ｅｌ表示装置製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3535137A (en) * 1967-01-13 1970-10-20 Ibm Method of fabricating etch resistant masks
US3679497A (en) * 1969-10-24 1972-07-25 Westinghouse Electric Corp Electron beam fabrication system and process for use thereof

Also Published As

Publication number Publication date
US3855023A (en) 1974-12-17
JPS5432316B1 (https=) 1979-10-13

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PE20 Patent expired after termination of 20 years