JPS5432316B1 - - Google Patents

Info

Publication number
JPS5432316B1
JPS5432316B1 JP7332471A JP7332471A JPS5432316B1 JP S5432316 B1 JPS5432316 B1 JP S5432316B1 JP 7332471 A JP7332471 A JP 7332471A JP 7332471 A JP7332471 A JP 7332471A JP S5432316 B1 JPS5432316 B1 JP S5432316B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7332471A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5432316B1 publication Critical patent/JPS5432316B1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP7332471A 1970-09-21 1971-09-20 Pending JPS5432316B1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4493570 1970-09-21

Publications (1)

Publication Number Publication Date
JPS5432316B1 true JPS5432316B1 (https=) 1979-10-13

Family

ID=10435289

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7332471A Pending JPS5432316B1 (https=) 1970-09-21 1971-09-20

Country Status (3)

Country Link
US (1) US3855023A (https=)
JP (1) JPS5432316B1 (https=)
GB (1) GB1330502A (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4393312A (en) * 1976-02-05 1983-07-12 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
US4085330A (en) * 1976-07-08 1978-04-18 Burroughs Corporation Focused ion beam mask maker
US4131472A (en) * 1976-09-15 1978-12-26 Align-Rite Corporation Method for increasing the yield of batch processed microcircuit semiconductor devices
US4475037A (en) * 1982-05-11 1984-10-02 International Business Machines Corporation Method of inspecting a mask using an electron beam vector scan system
US4587184A (en) * 1983-07-27 1986-05-06 Siemens Aktiengesellschaft Method for manufacturing accurate structures with a high aspect ratio and particularly for manufacturing X-ray absorber masks
FR2783971B1 (fr) * 1998-09-30 2002-08-23 St Microelectronics Sa Circuit semi-conducteur comprenant des motifs en surface et procede de reglage d'un outil par rapport a cette surface
JP4062956B2 (ja) * 2002-04-24 2008-03-19 ソニー株式会社 検出装置、検出方法および電子ビーム照射装置
JP2011034681A (ja) * 2009-07-29 2011-02-17 Hitachi Displays Ltd 金属加工方法、金属マスク製造方法及び有機el表示装置製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3535137A (en) * 1967-01-13 1970-10-20 Ibm Method of fabricating etch resistant masks
US3679497A (en) * 1969-10-24 1972-07-25 Westinghouse Electric Corp Electron beam fabrication system and process for use thereof

Also Published As

Publication number Publication date
GB1330502A (en) 1973-09-19
US3855023A (en) 1974-12-17

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