GB1298896A - Photosensitive aluminium plate and process for preparing the same - Google Patents
Photosensitive aluminium plate and process for preparing the sameInfo
- Publication number
- GB1298896A GB1298896A GB41631/70A GB4163170A GB1298896A GB 1298896 A GB1298896 A GB 1298896A GB 41631/70 A GB41631/70 A GB 41631/70A GB 4163170 A GB4163170 A GB 4163170A GB 1298896 A GB1298896 A GB 1298896A
- Authority
- GB
- United Kingdom
- Prior art keywords
- photo
- sensitive material
- compound
- pores
- oxide layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004411 aluminium Substances 0.000 title abstract 7
- 229910052782 aluminium Inorganic materials 0.000 title abstract 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title abstract 7
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000463 material Substances 0.000 abstract 7
- 239000011148 porous material Substances 0.000 abstract 4
- -1 silver halide Chemical class 0.000 abstract 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 abstract 3
- 239000007864 aqueous solution Substances 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 3
- 229910052802 copper Inorganic materials 0.000 abstract 3
- 239000010949 copper Substances 0.000 abstract 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 2
- 229910052783 alkali metal Inorganic materials 0.000 abstract 2
- 239000002585 base Substances 0.000 abstract 2
- YLZSIUVOIFJGQZ-UHFFFAOYSA-N bis[4-(dimethylamino)phenyl]methanol Chemical compound C1=CC(N(C)C)=CC=C1C(O)C1=CC=C(N(C)C)C=C1 YLZSIUVOIFJGQZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 abstract 2
- 239000007800 oxidant agent Substances 0.000 abstract 2
- 229910052709 silver Inorganic materials 0.000 abstract 2
- 239000004332 silver Substances 0.000 abstract 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 abstract 2
- 239000000243 solution Substances 0.000 abstract 2
- HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 abstract 2
- YRNWIFYIFSBPAU-UHFFFAOYSA-N 4-[4-(dimethylamino)phenyl]-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=CC=C(N(C)C)C=C1 YRNWIFYIFSBPAU-UHFFFAOYSA-N 0.000 abstract 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical class [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 abstract 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 abstract 1
- 239000001828 Gelatine Substances 0.000 abstract 1
- QPJVMBTYPHYUOC-UHFFFAOYSA-N Methyl benzoate Natural products COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 abstract 1
- 235000010724 Wisteria floribunda Nutrition 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 229910001508 alkali metal halide Inorganic materials 0.000 abstract 1
- 150000008045 alkali metal halides Chemical class 0.000 abstract 1
- 238000002048 anodisation reaction Methods 0.000 abstract 1
- PLKYGPRDCKGEJH-UHFFFAOYSA-N azane;2-hydroxypropane-1,2,3-tricarboxylic acid;iron Chemical compound N.[Fe].OC(=O)CC(O)(C(O)=O)CC(O)=O PLKYGPRDCKGEJH-UHFFFAOYSA-N 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 abstract 1
- 239000000084 colloidal system Substances 0.000 abstract 1
- 150000008049 diazo compounds Chemical class 0.000 abstract 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 abstract 1
- 239000003792 electrolyte Substances 0.000 abstract 1
- 229920000159 gelatin Polymers 0.000 abstract 1
- 235000019322 gelatine Nutrition 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 238000011065 in-situ storage Methods 0.000 abstract 1
- 150000002596 lactones Chemical class 0.000 abstract 1
- 229940095102 methyl benzoate Drugs 0.000 abstract 1
- 150000002896 organic halogen compounds Chemical class 0.000 abstract 1
- 235000006408 oxalic acid Nutrition 0.000 abstract 1
- 229910001961 silver nitrate Inorganic materials 0.000 abstract 1
- BYGOPQKDHGXNCD-UHFFFAOYSA-N tripotassium;iron(3+);hexacyanide Chemical compound [K+].[K+].[K+].[Fe+3].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] BYGOPQKDHGXNCD-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/77—Photosensitive materials characterised by the base or auxiliary layers the base being of metal
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Electrochemical Coating By Surface Reaction (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP44068410A JPS499977B1 (enrdf_load_stackoverflow) | 1969-08-29 | 1969-08-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1298896A true GB1298896A (en) | 1972-12-06 |
Family
ID=13372862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB41631/70A Expired GB1298896A (en) | 1969-08-29 | 1970-08-28 | Photosensitive aluminium plate and process for preparing the same |
Country Status (5)
Country | Link |
---|---|
US (1) | US3811894A (enrdf_load_stackoverflow) |
JP (1) | JPS499977B1 (enrdf_load_stackoverflow) |
DE (1) | DE2042834C3 (enrdf_load_stackoverflow) |
FR (1) | FR2059365A5 (enrdf_load_stackoverflow) |
GB (1) | GB1298896A (enrdf_load_stackoverflow) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4092169A (en) * | 1971-03-01 | 1978-05-30 | Fuji Photo Film Co., Ltd. | Anodized aluminum photographic plates with silver bromide in pores of oxide layer, and process of manufacture thereof |
JPS5086336A (enrdf_load_stackoverflow) * | 1973-11-29 | 1975-07-11 | ||
JPS5129877A (enrdf_load_stackoverflow) * | 1974-09-06 | 1976-03-13 | Fuji Photo Film Co Ltd | |
JPS5177099A (en) * | 1974-12-27 | 1976-07-03 | Fuji Photo Film Co Ltd | Kankoseineemu pureetozairyo |
US4047956A (en) * | 1975-11-17 | 1977-09-13 | E. I. Du Pont De Nemours And Company | Low coating weight silver halide element and process |
CA1160880A (en) * | 1979-02-02 | 1984-01-24 | Keith E. Whitmore | Imaging with nonplanar support elements |
CH645409A5 (de) * | 1980-09-08 | 1984-09-28 | Schenk & Co | Verfahren zum faerben von oxydschichten von aluminium oder aluminiumlegierungen mit organischen verbindungen. |
US4387156A (en) * | 1981-02-04 | 1983-06-07 | Minnesota Mining And Manufacturing Company | Imageable film containing a metal oxide opacifying layer |
US4426437A (en) | 1981-06-29 | 1984-01-17 | Minnesota Mining And Manufacturing Company | Imageable material with radiation absorbing microstructured layers overcoated with photoresist layer |
DE3425860A1 (de) * | 1984-07-13 | 1986-01-16 | Hoechst Ag, 6230 Frankfurt | Traegermaterial fuer druckplatten aus einer aluminiumlegierung und druckplatte aus diesem material |
CN106191957B (zh) * | 2016-08-29 | 2019-01-04 | 深圳天珑无线科技有限公司 | 一种铝合金表面处理方法及该方法得到的感光变色铝合金 |
CN108396354A (zh) * | 2018-03-18 | 2018-08-14 | 天津孚信阳光科技有限公司 | 一种适于阳极氧化技术的光致变色染色液及染色工艺 |
CN109487319A (zh) * | 2019-01-03 | 2019-03-19 | 江苏兴甬铝业科技有限公司 | 一种铝合金的感光表面处理方法及铝合金工件 |
-
1969
- 1969-08-29 JP JP44068410A patent/JPS499977B1/ja active Pending
-
1970
- 1970-08-28 GB GB41631/70A patent/GB1298896A/en not_active Expired
- 1970-08-28 FR FR7031460A patent/FR2059365A5/fr not_active Expired
- 1970-08-28 DE DE2042834A patent/DE2042834C3/de not_active Expired
- 1970-08-31 US US00068091A patent/US3811894A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE2042834C3 (de) | 1978-05-24 |
JPS499977B1 (enrdf_load_stackoverflow) | 1974-03-07 |
FR2059365A5 (enrdf_load_stackoverflow) | 1971-05-28 |
DE2042834B2 (de) | 1977-09-15 |
DE2042834A1 (de) | 1971-03-25 |
US3811894A (en) | 1974-05-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |