GB1298697A - Triode sputtering apparatus - Google Patents

Triode sputtering apparatus

Info

Publication number
GB1298697A
GB1298697A GB1851070A GB1851070A GB1298697A GB 1298697 A GB1298697 A GB 1298697A GB 1851070 A GB1851070 A GB 1851070A GB 1851070 A GB1851070 A GB 1851070A GB 1298697 A GB1298697 A GB 1298697A
Authority
GB
United Kingdom
Prior art keywords
substrate
plasma
planar
cathode
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1851070A
Inventor
Bertalan Joseph Vegh
Alfred Eugene Coates
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of GB1298697A publication Critical patent/GB1298697A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1298697 Sputtering apparatus EASTMAN KODAK CO 17 April 1970 [21 April 1969] 18510/70 Heading C7F A triode sputtering apparatus comprises an anode 68 and cathode 41 for establishing a gaseous ion plasma in enclosure 14, means for mounting a planar substrate 98 facing said ion plasma, and a target comprising two spaced substantially planar sputtering surfaces 95 formed of the coating material, which may be electrically biased differentially, on the other side of the plasma and facing said substrate at an acute angle thereto, one surface 95 converging with the substrate toward the anode and the other toward the cathode. Targets 94 may each have two mutually inclined planar surfaces as shown, or may each be planar, and may be of stainless steel coated with a Cr target material. The plasma is caused to extend coplanar to the substrate by use of an elongated anode 68 and a "fish tail" funnel 33 for electrons from cathode 41; argon may be the plasma gas. Substrate 98 may be of glass; coatings mentioned are Cr, Au, Ta, Al, W, Si and Ge.
GB1851070A 1969-04-21 1970-04-17 Triode sputtering apparatus Expired GB1298697A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81763569A 1969-04-21 1969-04-21

Publications (1)

Publication Number Publication Date
GB1298697A true GB1298697A (en) 1972-12-06

Family

ID=25223517

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1851070A Expired GB1298697A (en) 1969-04-21 1970-04-17 Triode sputtering apparatus

Country Status (5)

Country Link
BE (1) BE749222A (en)
CA (1) CA928249A (en)
DE (1) DE2018750C3 (en)
FR (1) FR2063853A5 (en)
GB (1) GB1298697A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4250009A (en) * 1979-05-18 1981-02-10 International Business Machines Corporation Energetic particle beam deposition system
DE2950997C2 (en) * 1979-12-18 1986-10-09 Nihon Shinku Gijutsu K.K., Chigasaki, Kanagawa Device for coating

Also Published As

Publication number Publication date
DE2018750C3 (en) 1973-09-20
DE2018750B2 (en) 1973-03-01
FR2063853A5 (en) 1971-07-09
BE749222A (en) 1970-10-01
CA928249A (en) 1973-06-12
DE2018750A1 (en) 1970-11-12

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees