GB1298697A - Triode sputtering apparatus - Google Patents
Triode sputtering apparatusInfo
- Publication number
- GB1298697A GB1298697A GB1851070A GB1851070A GB1298697A GB 1298697 A GB1298697 A GB 1298697A GB 1851070 A GB1851070 A GB 1851070A GB 1851070 A GB1851070 A GB 1851070A GB 1298697 A GB1298697 A GB 1298697A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- plasma
- planar
- cathode
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating By Spraying Or Casting (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1298697 Sputtering apparatus EASTMAN KODAK CO 17 April 1970 [21 April 1969] 18510/70 Heading C7F A triode sputtering apparatus comprises an anode 68 and cathode 41 for establishing a gaseous ion plasma in enclosure 14, means for mounting a planar substrate 98 facing said ion plasma, and a target comprising two spaced substantially planar sputtering surfaces 95 formed of the coating material, which may be electrically biased differentially, on the other side of the plasma and facing said substrate at an acute angle thereto, one surface 95 converging with the substrate toward the anode and the other toward the cathode. Targets 94 may each have two mutually inclined planar surfaces as shown, or may each be planar, and may be of stainless steel coated with a Cr target material. The plasma is caused to extend coplanar to the substrate by use of an elongated anode 68 and a "fish tail" funnel 33 for electrons from cathode 41; argon may be the plasma gas. Substrate 98 may be of glass; coatings mentioned are Cr, Au, Ta, Al, W, Si and Ge.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US81763569A | 1969-04-21 | 1969-04-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1298697A true GB1298697A (en) | 1972-12-06 |
Family
ID=25223517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1851070A Expired GB1298697A (en) | 1969-04-21 | 1970-04-17 | Triode sputtering apparatus |
Country Status (5)
Country | Link |
---|---|
BE (1) | BE749222A (en) |
CA (1) | CA928249A (en) |
DE (1) | DE2018750C3 (en) |
FR (1) | FR2063853A5 (en) |
GB (1) | GB1298697A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4250009A (en) * | 1979-05-18 | 1981-02-10 | International Business Machines Corporation | Energetic particle beam deposition system |
DE2950997C2 (en) * | 1979-12-18 | 1986-10-09 | Nihon Shinku Gijutsu K.K., Chigasaki, Kanagawa | Device for coating |
-
1970
- 1970-03-05 CA CA076561A patent/CA928249A/en not_active Expired
- 1970-04-17 GB GB1851070A patent/GB1298697A/en not_active Expired
- 1970-04-18 DE DE19702018750 patent/DE2018750C3/en not_active Expired
- 1970-04-20 BE BE749222D patent/BE749222A/en unknown
- 1970-04-20 FR FR7014234A patent/FR2063853A5/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE2018750C3 (en) | 1973-09-20 |
DE2018750B2 (en) | 1973-03-01 |
FR2063853A5 (en) | 1971-07-09 |
BE749222A (en) | 1970-10-01 |
CA928249A (en) | 1973-06-12 |
DE2018750A1 (en) | 1970-11-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |