GB1280013A - Improvements in or relating to apparatus bombarding a target with ions - Google Patents
Improvements in or relating to apparatus bombarding a target with ionsInfo
- Publication number
- GB1280013A GB1280013A GB44171/69A GB4417169A GB1280013A GB 1280013 A GB1280013 A GB 1280013A GB 44171/69 A GB44171/69 A GB 44171/69A GB 4417169 A GB4417169 A GB 4417169A GB 1280013 A GB1280013 A GB 1280013A
- Authority
- GB
- United Kingdom
- Prior art keywords
- target
- ion beam
- window
- holder
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D59/00—Separation of different isotopes of the same chemical element
- B01D59/44—Separation by mass spectrography
- B01D59/48—Separation by mass spectrography using electrostatic and magnetic fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/022—Circuit arrangements, e.g. for generating deviation currents or voltages ; Components associated with high voltage supply
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/025—Detectors specially adapted to particle spectrometers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/961—Ion beam source and generation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
Abstract
1280013 Ion-beam apparatus UNITED KINGDOM ATOMIC ENERGY AUTHORITY 21 Aug 1970 [5 Sept 1969] 44171/69 Heading H1D [Also in Division G3] Apparatus for bombarding a target 89 with ions comprises an ion beam source, a magnet for deflecting the ion beam 91 towards a window, means for stabilizing the ion beam to maintain substantially constant the ion beam current passing through the window, a holder 87 for a target 89 behind the window, and drive means for imparting controlled movement to the target holder to scan the target through the ion beam according to a predetermined scan pattern. A cylindrical enclosure 81 with a pipe 82 for connection to a vacuum pump has a tubular extension 83 housing a lens assembly with a window or mass-defining slit of width equal to that of the target. Target holder 87 is secured to a lead screw 84 driven by a motor 85 controlled by a programmer 86. Rotation of the target holder is prevented by a torque resisting tube 88, but it is free to slide up and down as indicated by arrow B. The holder supports a plurality of racks filled with wafers 89. After implantation of one row of wafers the holder is indexed one step by fingers 92 and 93 engaging cam surfaces 94 and 95 fixed to the enclosure 81. The wafers may be heated by radiation or may be cooled by plates cooled with liquid nitrogen. An alternative embodiment (Figs. 2 to 5, not shown) comprises a magnetic separator as described in Specification 6,280,011, an ion source as described in Specification 6,280,012, and a target chamber in which means are provided for loading and unloading wafers to and from a carrier which is mounted on an X-Y drive mechanism which may be automatically programmed. The ion beam is swept over the window by superimposing an alternating voltage from a sweep generator on the stabilized D.C. supply to an accelerating electrode of the ion gun. The beam stabilizing means may comprise a probe (Fig. 1, not shown-see Division G3) which samples the ion beam at the window and passes a signal through an amplifier to a sweep control which controls the amplitude of the sweep in such a way as to tend to reduce variations in the ion beam intensity.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB44171/69A GB1280013A (en) | 1969-09-05 | 1969-09-05 | Improvements in or relating to apparatus bombarding a target with ions |
US65941A US3689766A (en) | 1969-09-05 | 1970-08-21 | Apparatus for bombarding a target with ions |
FR7032232A FR2060966A5 (en) | 1969-09-05 | 1970-09-04 | |
DE7032987U DE7032987U (en) | 1969-09-05 | 1970-09-04 | DEVICE FOR ION Bombardment. |
DE2043865A DE2043865C2 (en) | 1969-09-05 | 1970-09-04 | Device for bombarding a target with ions |
NLAANVRAGE7013146,A NL172805C (en) | 1969-09-05 | 1970-09-04 | DEVICE FOR BOMBARDING A TARGET WITH IONS. |
JP45078145A JPS521159B1 (en) | 1969-09-05 | 1970-09-05 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB44171/69A GB1280013A (en) | 1969-09-05 | 1969-09-05 | Improvements in or relating to apparatus bombarding a target with ions |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1280013A true GB1280013A (en) | 1972-07-05 |
Family
ID=10432104
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB44171/69A Expired GB1280013A (en) | 1969-09-05 | 1969-09-05 | Improvements in or relating to apparatus bombarding a target with ions |
Country Status (6)
Country | Link |
---|---|
US (1) | US3689766A (en) |
JP (1) | JPS521159B1 (en) |
DE (2) | DE2043865C2 (en) |
FR (1) | FR2060966A5 (en) |
GB (1) | GB1280013A (en) |
NL (1) | NL172805C (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4361762A (en) * | 1980-07-30 | 1982-11-30 | Rca Corporation | Apparatus and method for neutralizing the beam in an ion implanter |
CN112361892A (en) * | 2020-11-04 | 2021-02-12 | 山东战勤特种装备有限公司 | Shooting intelligent confrontation automatic target scoring training method and device |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3983397A (en) * | 1972-05-08 | 1976-09-28 | Albert Richard D | Selectable wavelength X-ray source |
US3778626A (en) * | 1972-07-28 | 1973-12-11 | Western Electric Co | Mechanical scan system for ion implantation |
US4021675A (en) * | 1973-02-20 | 1977-05-03 | Hughes Aircraft Company | System for controlling ion implantation dosage in electronic materials |
US3993909A (en) * | 1973-03-16 | 1976-11-23 | U.S. Philips Corporation | Substrate holder for etching thin films |
DE2326279A1 (en) * | 1973-05-23 | 1974-12-19 | Siemens Ag | ION BEAM HIGH-SPEED CIRCUIT TO ACHIEVE DEFINED SOLID DOCUMENTS THROUGH ION IMPLANTATION |
US4033904A (en) * | 1974-03-22 | 1977-07-05 | Varian Associates, Inc. | Interchangeable specimen trays and apparatus for a vacuum type testing system |
JPS515961A (en) * | 1974-07-03 | 1976-01-19 | Dan Kagaku Kk | KONSEISOSASOCHI |
US4017403A (en) * | 1974-07-31 | 1977-04-12 | United Kingdom Atomic Energy Authority | Ion beam separators |
US4013262A (en) * | 1974-12-13 | 1977-03-22 | Varian Associates | Rotary apparatus for moving workpieces through treatment beam with controlled angle of orientation and ion implanter incorporating such apparatus |
US4024399A (en) * | 1975-01-06 | 1977-05-17 | Jersey Nuclear-Avco Isotopes, Inc. | Method and apparatus for measuring vapor flow in isotope separation |
FR2298880A1 (en) * | 1975-01-22 | 1976-08-20 | Commissariat Energie Atomique | IONIC IMPLANTATION METHOD AND DEVICE |
US4000426A (en) * | 1975-05-15 | 1976-12-28 | Aita Konstantinovna Zaitseva | Apparatus for feeding parts in ion-beam machining |
US4011449A (en) * | 1975-11-05 | 1977-03-08 | Ibm Corporation | Apparatus for measuring the beam current of charged particle beam |
DE2557685A1 (en) * | 1975-12-20 | 1977-06-30 | Ibm Deutschland | PROCESS FOR PRODUCING A SCREENED PHOTOCONDUCTOR LAYER |
CH607836A5 (en) * | 1976-12-27 | 1978-11-15 | Balzers Hochvakuum | |
US4234797A (en) * | 1979-05-23 | 1980-11-18 | Nova Associates, Inc. | Treating workpieces with beams |
US4258266A (en) * | 1979-07-30 | 1981-03-24 | Hughes Aircraft Company | Ion implantation system |
US4514636A (en) * | 1979-09-14 | 1985-04-30 | Eaton Corporation | Ion treatment apparatus |
JPS56126918A (en) * | 1980-03-11 | 1981-10-05 | Hitachi Ltd | Injecting device for ion |
JPS58164134A (en) * | 1982-03-24 | 1983-09-29 | Hitachi Ltd | Manufacturing method of semiconductor unit |
US4517465A (en) * | 1983-03-29 | 1985-05-14 | Veeco/Ai, Inc. | Ion implantation control system |
US4587433A (en) * | 1984-06-27 | 1986-05-06 | Eaton Corporation | Dose control apparatus |
EP0237165A3 (en) * | 1986-01-29 | 1991-04-17 | Eaton Corporation | Treating work pieces with electro-magnetically scanned ion beams |
WO1987006391A1 (en) * | 1986-04-09 | 1987-10-22 | Eclipse Ion Technology, Inc. | Ion beam scanning method and apparatus |
US4922106A (en) * | 1986-04-09 | 1990-05-01 | Varian Associates, Inc. | Ion beam scanning method and apparatus |
US4980562A (en) * | 1986-04-09 | 1990-12-25 | Varian Associates, Inc. | Method and apparatus for high efficiency scanning in an ion implanter |
US4751393A (en) * | 1986-05-16 | 1988-06-14 | Varian Associates, Inc. | Dose measurement and uniformity monitoring system for ion implantation |
US4745281A (en) * | 1986-08-25 | 1988-05-17 | Eclipse Ion Technology, Inc. | Ion beam fast parallel scanning having dipole magnetic lens with nonuniform field |
US4804852A (en) * | 1987-01-29 | 1989-02-14 | Eaton Corporation | Treating work pieces with electro-magnetically scanned ion beams |
US4816693A (en) * | 1987-08-21 | 1989-03-28 | National Electrostatics Corp. | Apparatus and method for uniform ion dose control |
US5309064A (en) * | 1993-03-22 | 1994-05-03 | Armini Anthony J | Ion source generator auxiliary device |
US5981961A (en) * | 1996-03-15 | 1999-11-09 | Applied Materials, Inc. | Apparatus and method for improved scanning efficiency in an ion implanter |
US5852345A (en) * | 1996-11-01 | 1998-12-22 | Implant Sciences Corp. | Ion source generator auxiliary device for phosphorus and arsenic beams |
US5808416A (en) * | 1996-11-01 | 1998-09-15 | Implant Sciences Corp. | Ion source generator auxiliary device |
US6060715A (en) * | 1997-10-31 | 2000-05-09 | Applied Materials, Inc. | Method and apparatus for ion beam scanning in an ion implanter |
US6084241A (en) * | 1998-06-01 | 2000-07-04 | Motorola, Inc. | Method of manufacturing semiconductor devices and apparatus therefor |
US6677599B2 (en) * | 2000-03-27 | 2004-01-13 | Applied Materials, Inc. | System and method for uniformly implanting a wafer with an ion beam |
AU2001270133A1 (en) | 2000-06-22 | 2002-01-02 | Proteros, Llc | Ion implantation uniformity correction using beam current control |
US7547460B2 (en) | 2000-09-15 | 2009-06-16 | Varian Semiconductor Equipment Associates, Inc. | Ion implanter optimizer scan waveform retention and recovery |
CN100338720C (en) * | 2000-11-22 | 2007-09-19 | 瓦里安半导体设备联合公司 | Hybrid scanning system and methods for ion implantation |
US6710359B2 (en) | 2001-03-23 | 2004-03-23 | Varian Semiconductor Equipment Associates, Inc. | Methods and apparatus for scanned beam uniformity adjustment in ion implanters |
US20130114773A1 (en) * | 2011-11-08 | 2013-05-09 | Alexander R. Vaucher | Superconducting neutron source |
CN112516797B (en) * | 2020-12-01 | 2022-09-16 | 中国科学院近代物理研究所 | Electrostatic focusing and accelerating system and method for isotope separation system |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE426347A (en) * | 1937-02-18 | |||
US2348031A (en) * | 1941-04-30 | 1944-05-02 | Rca Corp | Method of focusing electron microscopes |
NL270945A (en) * | 1961-03-02 | |||
NL276412A (en) * | 1961-03-30 | |||
US3131300A (en) * | 1962-11-16 | 1964-04-28 | Thomas R Jeter | Apparatus for reducing energy variations of a van de graaff ion beam |
US3326176A (en) * | 1964-10-27 | 1967-06-20 | Nat Res Corp | Work-registration device including ionic beam probe |
US3358239A (en) * | 1965-07-27 | 1967-12-12 | Transformatoren & Roentgenwerk | Equipment for controlling and monitoring the electron beam of a horizontaltype particle accelerator |
US3434894A (en) * | 1965-10-06 | 1969-03-25 | Ion Physics Corp | Fabricating solid state devices by ion implantation |
US3547074A (en) * | 1967-04-13 | 1970-12-15 | Block Engineering | Apparatus for forming microelements |
-
1969
- 1969-09-05 GB GB44171/69A patent/GB1280013A/en not_active Expired
-
1970
- 1970-08-21 US US65941A patent/US3689766A/en not_active Expired - Lifetime
- 1970-09-04 NL NLAANVRAGE7013146,A patent/NL172805C/en not_active IP Right Cessation
- 1970-09-04 DE DE2043865A patent/DE2043865C2/en not_active Expired
- 1970-09-04 DE DE7032987U patent/DE7032987U/en not_active Expired
- 1970-09-04 FR FR7032232A patent/FR2060966A5/fr not_active Expired
- 1970-09-05 JP JP45078145A patent/JPS521159B1/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4361762A (en) * | 1980-07-30 | 1982-11-30 | Rca Corporation | Apparatus and method for neutralizing the beam in an ion implanter |
CN112361892A (en) * | 2020-11-04 | 2021-02-12 | 山东战勤特种装备有限公司 | Shooting intelligent confrontation automatic target scoring training method and device |
Also Published As
Publication number | Publication date |
---|---|
US3689766A (en) | 1972-09-05 |
DE2043865A1 (en) | 1971-03-11 |
NL7013146A (en) | 1971-03-09 |
JPS521159B1 (en) | 1977-01-12 |
FR2060966A5 (en) | 1971-06-18 |
DE2043865C2 (en) | 1983-08-04 |
DE7032987U (en) | 1971-02-18 |
NL172805C (en) | 1983-10-17 |
NL172805B (en) | 1983-05-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |