GB1273199A - A method for manufacturing a semiconductor device having diffusion junctions - Google Patents
A method for manufacturing a semiconductor device having diffusion junctionsInfo
- Publication number
- GB1273199A GB1273199A GB5123969A GB5123969A GB1273199A GB 1273199 A GB1273199 A GB 1273199A GB 5123969 A GB5123969 A GB 5123969A GB 5123969 A GB5123969 A GB 5123969A GB 1273199 A GB1273199 A GB 1273199A
- Authority
- GB
- United Kingdom
- Prior art keywords
- region
- type
- substrate
- diffusion
- oct
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000009792 diffusion process Methods 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
- 239000012535 impurity Substances 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 2
- 229910052698 phosphorus Inorganic materials 0.000 abstract 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 230000000873 masking effect Effects 0.000 abstract 1
- 239000012299 nitrogen atmosphere Substances 0.000 abstract 1
- 239000011574 phosphorus Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2251—Diffusion into or out of group IV semiconductors
- H01L21/2252—Diffusion into or out of group IV semiconductors using predeposition of impurities into the semiconductor surface, e.g. from a gaseous phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Bipolar Transistors (AREA)
Abstract
1,273,199. Semi-conductor devices. HITACHI Ltd. 17 Oct., 1969 [21 Oct., 1968 (2)], No. 51239/69. Heading H1K. A method of manufacturing transistors comprises preparing a high resistivity, e.g. 10 # cm., N-type, silicon substrate 11, and diffusing into it, either from the gas phase or from a coating on the surface, an N-type impurity, e.g. phosphorus, to form a shallow, heavily doped region; a drive in step at 1200‹ C. in a nitrogen atmosphere follows to form an N<SP>+</SP> region 13 with an impurity concentration of 10<SP>20</SP> atoms/c.c.; the other surface is exposed and a diffusion of a P- type impurity, e.g. boron, takes place to form a base region 14; another N-type diffusion follows to form a plurality of emitter regions 15; contact is made to the regions, the collector region comprising a part of the original substrate 11, and the region 13; and the substrate is divided up by slots 19 to form a plurality of transistors. Grown oxide layers may be used as masking material. A substrate of P or I type material alternatively may be used.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7608268 | 1968-10-21 | ||
JP7608168 | 1968-10-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1273199A true GB1273199A (en) | 1972-05-03 |
Family
ID=26417236
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5123969A Expired GB1273199A (en) | 1968-10-21 | 1969-10-17 | A method for manufacturing a semiconductor device having diffusion junctions |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE1952795B2 (en) |
FR (1) | FR2021133A1 (en) |
GB (1) | GB1273199A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5799736A (en) * | 1980-12-12 | 1982-06-21 | Toshiba Corp | Fabrication of semiconductor substrate |
-
1969
- 1969-10-17 GB GB5123969A patent/GB1273199A/en not_active Expired
- 1969-10-17 FR FR6935664A patent/FR2021133A1/fr not_active Withdrawn
- 1969-10-20 DE DE19691952795 patent/DE1952795B2/en active Pending
Also Published As
Publication number | Publication date |
---|---|
DE1952795B2 (en) | 1972-11-16 |
FR2021133A1 (en) | 1970-07-17 |
DE1952795A1 (en) | 1970-09-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |