GB1257342A - - Google Patents
Info
- Publication number
- GB1257342A GB1257342A GB1257342DA GB1257342A GB 1257342 A GB1257342 A GB 1257342A GB 1257342D A GB1257342D A GB 1257342DA GB 1257342 A GB1257342 A GB 1257342A
- Authority
- GB
- United Kingdom
- Prior art keywords
- mask
- jan
- sputtering apparatus
- rotatable
- substrate carriers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 abstract 3
- 239000000969 carrier Substances 0.000 abstract 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- 238000001816 cooling Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR135568 | 1968-01-11 | ||
FR06009034 | 1968-02-21 | ||
FR161082A FR94900E (fr) | 1968-01-11 | 1968-07-30 | Appareil de pulvérisation cathodique a grande capacité. |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1257342A true GB1257342A (enrdf_load_stackoverflow) | 1971-12-15 |
Family
ID=27244767
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1257342D Expired GB1257342A (enrdf_load_stackoverflow) | 1968-01-11 | 1969-01-07 |
Country Status (4)
Country | Link |
---|---|
BE (1) | BE726267A (enrdf_load_stackoverflow) |
DE (1) | DE1901211A1 (enrdf_load_stackoverflow) |
FR (1) | FR94900E (enrdf_load_stackoverflow) |
GB (1) | GB1257342A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114720048A (zh) * | 2022-06-09 | 2022-07-08 | 季华实验室 | 一种电容薄膜真空计及neg薄膜制备方法 |
-
1968
- 1968-07-30 FR FR161082A patent/FR94900E/fr not_active Expired
- 1968-12-30 BE BE726267D patent/BE726267A/xx unknown
-
1969
- 1969-01-07 GB GB1257342D patent/GB1257342A/en not_active Expired
- 1969-01-10 DE DE19691901211 patent/DE1901211A1/de active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114720048A (zh) * | 2022-06-09 | 2022-07-08 | 季华实验室 | 一种电容薄膜真空计及neg薄膜制备方法 |
CN114720048B (zh) * | 2022-06-09 | 2022-09-02 | 季华实验室 | 一种电容薄膜真空计及neg薄膜制备方法 |
Also Published As
Publication number | Publication date |
---|---|
BE726267A (enrdf_load_stackoverflow) | 1969-05-29 |
DE1901211A1 (de) | 1970-09-24 |
FR94900E (fr) | 1970-01-16 |
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GB1257342A (enrdf_load_stackoverflow) | ||
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |