GB1251345A - - Google Patents
Info
- Publication number
- GB1251345A GB1251345A GB1251345DA GB1251345A GB 1251345 A GB1251345 A GB 1251345A GB 1251345D A GB1251345D A GB 1251345DA GB 1251345 A GB1251345 A GB 1251345A
- Authority
- GB
- United Kingdom
- Prior art keywords
- polymers
- sulphonyl
- nov
- polymer
- sensitive film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F26/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US68463667A | 1967-11-21 | 1967-11-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1251345A true GB1251345A (fr) | 1971-10-27 |
Family
ID=24748898
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1251345D Expired GB1251345A (fr) | 1967-11-21 | 1968-11-21 |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS4934681B1 (fr) |
BE (1) | BE723556A (fr) |
BR (1) | BR6804157D0 (fr) |
CH (1) | CH494415A (fr) |
DE (1) | DE1807644A1 (fr) |
FR (1) | FR1592375A (fr) |
GB (1) | GB1251345A (fr) |
SU (1) | SU379110A3 (fr) |
Cited By (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4938701A (fr) * | 1972-08-18 | 1974-04-11 | ||
US4038469A (en) | 1973-07-31 | 1977-07-26 | Glaxo Laboratories Limited | Aqueous insoluble polymers containing a plurality of diazomethylene groups |
US4123279A (en) * | 1974-03-25 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinonediazide containing planographic printing plate |
EP0565006A2 (fr) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Méthode pour la préparation d'une plaque présensibilisée |
EP0713143A2 (fr) | 1994-11-18 | 1996-05-22 | Fuji Photo Film Co., Ltd. | Plaque photosensible pour l'impression planographique |
EP0780730A2 (fr) | 1995-12-22 | 1997-06-25 | Fuji Photo Film Co., Ltd. | Plaque d' impression photosensible de type positif |
EP1640173A1 (fr) | 2004-09-27 | 2006-03-29 | Fuji Photo Film Co., Ltd. | Précurseur de plaque d'impression planographique |
EP1690685A2 (fr) | 2005-02-09 | 2006-08-16 | Fuji Photo Film Co., Ltd. | Précurseur de plaque d'impression planographique |
EP1705004A1 (fr) | 2005-03-22 | 2006-09-27 | Fuji Photo Film Co., Ltd. | Précurseur de plaque d'impression planographique |
EP1925447A1 (fr) | 2002-09-17 | 2008-05-28 | FUJIFILM Corporation | Matériau pour l'enregistrement d'images |
EP2036721A1 (fr) | 2000-11-30 | 2009-03-18 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique |
EP2042340A2 (fr) | 2007-09-27 | 2009-04-01 | Fujifilm Corporation | Plaque d'impression lithographique, agent de protection de surface et procédé de clichage pour une plaque d'impression lithographique |
EP2042310A2 (fr) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique |
EP2042308A2 (fr) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique |
EP2042306A2 (fr) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique et procédé de production d'un copolymère utilisé avec celui-ci |
EP2042305A2 (fr) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique |
WO2009063824A1 (fr) | 2007-11-14 | 2009-05-22 | Fujifilm Corporation | Procédé de séchage de film de revêtement et procédé pour produire un précurseur de plaque d'impression lithographique |
EP2105690A2 (fr) | 2008-03-26 | 2009-09-30 | Fujifilm Corporation | Procédé et appareil de séchage |
EP2106907A2 (fr) | 2008-04-02 | 2009-10-07 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique |
EP2161129A2 (fr) | 2008-09-09 | 2010-03-10 | Fujifilm Corporation | Précurseur de plaque d'impression lithographique photosensible pour laser à infrarouges |
EP2236293A2 (fr) | 2009-03-31 | 2010-10-06 | FUJIFILM Corporation | Précurseur de plaque d'impression lithographique |
WO2011037005A1 (fr) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | Plaque originale d'impression lithographique |
EP2381312A2 (fr) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Développeur liquide alcalin pour plaque d'impression lithographique et procédé de préparation d' une plaque d'impression lithographique |
EP2641738A2 (fr) | 2012-03-23 | 2013-09-25 | Fujifilm Corporation | Procédé de production de plaque dýimpression planographique et plaque dýimpression planographique |
EP2644379A1 (fr) | 2012-03-30 | 2013-10-02 | FUJIFILM Corporation | Procédé de fabrication de plaque dýimpression planographique |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
JP2623309B2 (ja) * | 1988-02-22 | 1997-06-25 | ユーシービー ソシエテ アノニム | レジストパターンを得る方法 |
-
1968
- 1968-11-07 DE DE19681807644 patent/DE1807644A1/de not_active Withdrawn
- 1968-11-07 BE BE723556D patent/BE723556A/xx unknown
- 1968-11-20 BR BR20415768A patent/BR6804157D0/pt unknown
- 1968-11-20 FR FR1592375D patent/FR1592375A/fr not_active Expired
- 1968-11-20 SU SU1284438A patent/SU379110A3/ru active
- 1968-11-21 JP JP43084909A patent/JPS4934681B1/ja active Pending
- 1968-11-21 GB GB1251345D patent/GB1251345A/en not_active Expired
- 1968-11-21 CH CH1736868A patent/CH494415A/fr not_active IP Right Cessation
Cited By (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4938701A (fr) * | 1972-08-18 | 1974-04-11 | ||
JPS51483B2 (fr) * | 1972-08-18 | 1976-01-08 | ||
US4038469A (en) | 1973-07-31 | 1977-07-26 | Glaxo Laboratories Limited | Aqueous insoluble polymers containing a plurality of diazomethylene groups |
US4123279A (en) * | 1974-03-25 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinonediazide containing planographic printing plate |
EP0565006A2 (fr) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Méthode pour la préparation d'une plaque présensibilisée |
EP0713143A2 (fr) | 1994-11-18 | 1996-05-22 | Fuji Photo Film Co., Ltd. | Plaque photosensible pour l'impression planographique |
EP0780730A2 (fr) | 1995-12-22 | 1997-06-25 | Fuji Photo Film Co., Ltd. | Plaque d' impression photosensible de type positif |
EP2381312A2 (fr) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Développeur liquide alcalin pour plaque d'impression lithographique et procédé de préparation d' une plaque d'impression lithographique |
EP2036721A1 (fr) | 2000-11-30 | 2009-03-18 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique |
EP1925447A1 (fr) | 2002-09-17 | 2008-05-28 | FUJIFILM Corporation | Matériau pour l'enregistrement d'images |
EP1640173A1 (fr) | 2004-09-27 | 2006-03-29 | Fuji Photo Film Co., Ltd. | Précurseur de plaque d'impression planographique |
EP1690685A2 (fr) | 2005-02-09 | 2006-08-16 | Fuji Photo Film Co., Ltd. | Précurseur de plaque d'impression planographique |
EP1705004A1 (fr) | 2005-03-22 | 2006-09-27 | Fuji Photo Film Co., Ltd. | Précurseur de plaque d'impression planographique |
EP2042340A2 (fr) | 2007-09-27 | 2009-04-01 | Fujifilm Corporation | Plaque d'impression lithographique, agent de protection de surface et procédé de clichage pour une plaque d'impression lithographique |
EP2042308A2 (fr) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique |
EP2042310A2 (fr) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique |
EP2042306A2 (fr) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique et procédé de production d'un copolymère utilisé avec celui-ci |
EP2042305A2 (fr) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique |
WO2009063824A1 (fr) | 2007-11-14 | 2009-05-22 | Fujifilm Corporation | Procédé de séchage de film de revêtement et procédé pour produire un précurseur de plaque d'impression lithographique |
EP2105690A2 (fr) | 2008-03-26 | 2009-09-30 | Fujifilm Corporation | Procédé et appareil de séchage |
EP2106907A2 (fr) | 2008-04-02 | 2009-10-07 | FUJIFILM Corporation | Précurseur de plaque d'impression planographique |
EP2161129A2 (fr) | 2008-09-09 | 2010-03-10 | Fujifilm Corporation | Précurseur de plaque d'impression lithographique photosensible pour laser à infrarouges |
EP2236293A2 (fr) | 2009-03-31 | 2010-10-06 | FUJIFILM Corporation | Précurseur de plaque d'impression lithographique |
WO2011037005A1 (fr) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | Plaque originale d'impression lithographique |
EP2641738A2 (fr) | 2012-03-23 | 2013-09-25 | Fujifilm Corporation | Procédé de production de plaque dýimpression planographique et plaque dýimpression planographique |
EP2644379A1 (fr) | 2012-03-30 | 2013-10-02 | FUJIFILM Corporation | Procédé de fabrication de plaque dýimpression planographique |
Also Published As
Publication number | Publication date |
---|---|
FR1592375A (fr) | 1970-05-11 |
DE1807644A1 (de) | 1969-08-28 |
CH494415A (fr) | 1970-07-31 |
BE723556A (fr) | 1969-04-16 |
JPS4934681B1 (fr) | 1974-09-17 |
BR6804157D0 (pt) | 1973-01-11 |
SU379110A3 (fr) | 1973-04-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |