GB1234544A - - Google Patents
Info
- Publication number
- GB1234544A GB1234544A GB1234544DA GB1234544A GB 1234544 A GB1234544 A GB 1234544A GB 1234544D A GB1234544D A GB 1234544DA GB 1234544 A GB1234544 A GB 1234544A
- Authority
- GB
- United Kingdom
- Prior art keywords
- forming
- apertures
- foil
- semi
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
- H10P95/90—Thermal treatments, e.g. annealing or sintering
Landscapes
- Bipolar Transistors (AREA)
- Cold Cathode And The Manufacture (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19681800212 DE1800212A1 (de) | 1968-10-01 | 1968-10-01 | Verfahren zum Herstellen einer Halbleiteranordnung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1234544A true GB1234544A (enExample) | 1971-06-03 |
Family
ID=5709157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1234544D Expired GB1234544A (enExample) | 1968-10-01 | 1969-10-01 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3629017A (enExample) |
| DE (1) | DE1800212A1 (enExample) |
| GB (1) | GB1234544A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4307131A (en) | 1976-01-30 | 1981-12-22 | Thomson-Csf | Method of manufacturing metal-semiconductor contacts exhibiting high injected current density |
| US4525733A (en) * | 1982-03-03 | 1985-06-25 | Eastman Kodak Company | Patterning method for reducing hillock density in thin metal films and a structure produced thereby |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3895977A (en) * | 1973-12-20 | 1975-07-22 | Harris Corp | Method of fabricating a bipolar transistor |
| GB1604004A (en) * | 1977-10-11 | 1981-12-02 | Fujitsu Ltd | Method and apparatus for processing semi-conductor wafers |
| US4364778A (en) * | 1980-05-30 | 1982-12-21 | Bell Telephone Laboratories, Incorporated | Formation of multilayer dopant distributions in a semiconductor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1527116A (fr) * | 1967-04-18 | 1968-05-31 | Cit Alcatel | Procédé de fabrication des diodes par impulsions électriques |
-
1968
- 1968-10-01 DE DE19681800212 patent/DE1800212A1/de active Pending
-
1969
- 1969-10-01 GB GB1234544D patent/GB1234544A/en not_active Expired
- 1969-10-01 US US862776A patent/US3629017A/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4307131A (en) | 1976-01-30 | 1981-12-22 | Thomson-Csf | Method of manufacturing metal-semiconductor contacts exhibiting high injected current density |
| US4525733A (en) * | 1982-03-03 | 1985-06-25 | Eastman Kodak Company | Patterning method for reducing hillock density in thin metal films and a structure produced thereby |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1800212A1 (de) | 1970-05-06 |
| US3629017A (en) | 1971-12-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |