GB1151818A - Vaporisation of High Melting Point Materials in Electron Beam Apparatus. - Google Patents

Vaporisation of High Melting Point Materials in Electron Beam Apparatus.

Info

Publication number
GB1151818A
GB1151818A GB19726/67A GB1972667A GB1151818A GB 1151818 A GB1151818 A GB 1151818A GB 19726/67 A GB19726/67 A GB 19726/67A GB 1972667 A GB1972667 A GB 1972667A GB 1151818 A GB1151818 A GB 1151818A
Authority
GB
United Kingdom
Prior art keywords
rod
electron beam
melting point
high melting
quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB19726/67A
Inventor
Karl Dietzel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bayer AG
Original Assignee
Bayer AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer AG filed Critical Bayer AG
Publication of GB1151818A publication Critical patent/GB1151818A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/241—High voltage power supply or regulation circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching

Abstract

1,151,818. Electron beam furnaces. FARBENFABRIKEN BAYER A.G. 28 April, 1967 [3 May, 1966], No. 19726/67. Heading H1D. [Also in Division C7] In an electron beam furnace for vaporizing high melting point material such as quartz in which the beam 17 is magnetically focused and deflected on to the quartz rod 18, as shown by permanent magnet 16, the beam voltage is automatically maintained constant and the support 19 for the quartz rod 18 is continuously rotated and displaced axially to maintain the surface of the rod at the beam focus. Preferably the diameter of the beam focus is equal to the radius of the rod and extends from the centre of the rod to the edge. The high voltage supply is preferably rich in ripple voltages resulting, it is stated, in a more uniform rate of vaporization.
GB19726/67A 1966-05-03 1967-04-28 Vaporisation of High Melting Point Materials in Electron Beam Apparatus. Expired GB1151818A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEF0049092 1966-05-03

Publications (1)

Publication Number Publication Date
GB1151818A true GB1151818A (en) 1969-05-14

Family

ID=7102723

Family Applications (1)

Application Number Title Priority Date Filing Date
GB19726/67A Expired GB1151818A (en) 1966-05-03 1967-04-28 Vaporisation of High Melting Point Materials in Electron Beam Apparatus.

Country Status (5)

Country Link
US (1) US3488426A (en)
BE (1) BE697974A (en)
CH (1) CH492033A (en)
DE (1) DE1521251B2 (en)
GB (1) GB1151818A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0887435A1 (en) * 1997-06-23 1998-12-30 The Boc Group, Inc. Free-standing rotating evaporation source

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3756193A (en) * 1972-05-01 1973-09-04 Battelle Memorial Institute Coating apparatus
DE3706495A1 (en) * 1987-04-29 1988-09-15 Vtu Angel Kancev POWER SUPPLY CIRCUIT FOR ELECTRON BEAM EVAPORATOR
US4978094A (en) * 1989-11-15 1990-12-18 Cooper Industries, Inc. Bracket for curtain rods

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2994801A (en) * 1959-06-05 1961-08-01 Stauffer Chemical Co Electron beam generation
DE1156522B (en) * 1962-09-25 1963-10-31 Heraeus Gmbh W C Electron lens assembly for electron beam melting or evaporation systems
DE1199097B (en) * 1962-09-25 1965-08-19 Heraeus Gmbh W C Device for vacuum evaporation of wide strips, especially with metals, by heating the material to be evaporated by means of electron beams
FR1351419A (en) * 1962-09-29 1964-02-07 Centre Nat Rech Scient Method and devices for heating substances using plasma and high irradiance radiation
US3347701A (en) * 1963-02-05 1967-10-17 Fujitsu Ltd Method and apparatus for vapor deposition employing an electron beam
US3277865A (en) * 1963-04-01 1966-10-11 United States Steel Corp Metal-vapor source with heated reflecting shield
US3276902A (en) * 1963-10-01 1966-10-04 Itt Method of vapor deposition employing an electron beam
US3328672A (en) * 1964-02-06 1967-06-27 Temescal Metallurgical Corp Constant current supply

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0887435A1 (en) * 1997-06-23 1998-12-30 The Boc Group, Inc. Free-standing rotating evaporation source

Also Published As

Publication number Publication date
CH492033A (en) 1970-06-15
US3488426A (en) 1970-01-06
DE1521251B2 (en) 1970-03-26
DE1521251A1 (en) 1969-05-08
BE697974A (en) 1967-10-16

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLE Entries relating assignments, transmissions, licences in the register of patents
PCNP Patent ceased through non-payment of renewal fee