CH492033A - Device for uniform evaporation and application of high-melting materials in a high vacuum and a method for operating the same - Google Patents

Device for uniform evaporation and application of high-melting materials in a high vacuum and a method for operating the same

Info

Publication number
CH492033A
CH492033A CH505867A CH505867A CH492033A CH 492033 A CH492033 A CH 492033A CH 505867 A CH505867 A CH 505867A CH 505867 A CH505867 A CH 505867A CH 492033 A CH492033 A CH 492033A
Authority
CH
Switzerland
Prior art keywords
operating
application
same
melting materials
uniform evaporation
Prior art date
Application number
CH505867A
Other languages
German (de)
Inventor
Karl Dipl Phys Dietzel
Original Assignee
Bayer Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer Ag filed Critical Bayer Ag
Publication of CH492033A publication Critical patent/CH492033A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/241—High voltage power supply or regulation circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
CH505867A 1966-05-03 1967-04-11 Device for uniform evaporation and application of high-melting materials in a high vacuum and a method for operating the same CH492033A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEF0049092 1966-05-03

Publications (1)

Publication Number Publication Date
CH492033A true CH492033A (en) 1970-06-15

Family

ID=7102723

Family Applications (1)

Application Number Title Priority Date Filing Date
CH505867A CH492033A (en) 1966-05-03 1967-04-11 Device for uniform evaporation and application of high-melting materials in a high vacuum and a method for operating the same

Country Status (5)

Country Link
US (1) US3488426A (en)
BE (1) BE697974A (en)
CH (1) CH492033A (en)
DE (1) DE1521251B2 (en)
GB (1) GB1151818A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3756193A (en) * 1972-05-01 1973-09-04 Battelle Memorial Institute Coating apparatus
DE3706495A1 (en) * 1987-04-29 1988-09-15 Vtu Angel Kancev POWER SUPPLY CIRCUIT FOR ELECTRON BEAM EVAPORATOR
US4978094A (en) * 1989-11-15 1990-12-18 Cooper Industries, Inc. Bracket for curtain rods
US5905753A (en) * 1997-06-23 1999-05-18 The Boc Group, Inc. Free-standing rotational rod-fed source

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2994801A (en) * 1959-06-05 1961-08-01 Stauffer Chemical Co Electron beam generation
DE1156522B (en) * 1962-09-25 1963-10-31 Heraeus Gmbh W C Electron lens assembly for electron beam melting or evaporation systems
DE1199097B (en) * 1962-09-25 1965-08-19 Heraeus Gmbh W C Device for vacuum evaporation of wide strips, especially with metals, by heating the material to be evaporated by means of electron beams
FR1351419A (en) * 1962-09-29 1964-02-07 Centre Nat Rech Scient Method and devices for heating substances using plasma and high irradiance radiation
US3347701A (en) * 1963-02-05 1967-10-17 Fujitsu Ltd Method and apparatus for vapor deposition employing an electron beam
US3277865A (en) * 1963-04-01 1966-10-11 United States Steel Corp Metal-vapor source with heated reflecting shield
US3276902A (en) * 1963-10-01 1966-10-04 Itt Method of vapor deposition employing an electron beam
US3328672A (en) * 1964-02-06 1967-06-27 Temescal Metallurgical Corp Constant current supply

Also Published As

Publication number Publication date
GB1151818A (en) 1969-05-14
US3488426A (en) 1970-01-06
DE1521251B2 (en) 1970-03-26
DE1521251A1 (en) 1969-05-08
BE697974A (en) 1967-10-16

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Legal Events

Date Code Title Description
PL Patent ceased