GB1149370A - Improvements relating to the radio frequency sputtering of materials - Google Patents
Improvements relating to the radio frequency sputtering of materialsInfo
- Publication number
- GB1149370A GB1149370A GB16013/68A GB1601368A GB1149370A GB 1149370 A GB1149370 A GB 1149370A GB 16013/68 A GB16013/68 A GB 16013/68A GB 1601368 A GB1601368 A GB 1601368A GB 1149370 A GB1149370 A GB 1149370A
- Authority
- GB
- United Kingdom
- Prior art keywords
- materials
- radio frequency
- april
- improvements relating
- frequency sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US62966067A | 1967-04-10 | 1967-04-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1149370A true GB1149370A (en) | 1969-04-23 |
Family
ID=24523936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB16013/68A Expired GB1149370A (en) | 1967-04-10 | 1968-04-03 | Improvements relating to the radio frequency sputtering of materials |
Country Status (4)
Country | Link |
---|---|
US (1) | US3471396A (de) |
DE (1) | DE1765127B2 (de) |
FR (1) | FR1560694A (de) |
GB (1) | GB1149370A (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2127439A (en) * | 1982-09-27 | 1984-04-11 | Konishiroku Photo Ind | Vacuum depositing compound semi conductors in activated hydrogen |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3860507A (en) * | 1972-11-29 | 1975-01-14 | Rca Corp | Rf sputtering apparatus and method |
US4076575A (en) * | 1976-06-30 | 1978-02-28 | International Business Machines Corporation | Integrated fabrication method of forming connectors through insulative layers |
DE3167761D1 (en) * | 1980-01-16 | 1985-01-31 | Nat Res Dev | Method and apparatus for depositing coatings in a glow discharge |
US4374391A (en) * | 1980-09-24 | 1983-02-15 | Bell Telephone Laboratories, Incorporated | Device fabrication procedure |
JPS5842126B2 (ja) * | 1980-10-31 | 1983-09-17 | 鐘淵化学工業株式会社 | アモルファスシリコンの製造方法 |
JPS5816078A (ja) * | 1981-07-17 | 1983-01-29 | Toshiba Corp | プラズマエツチング装置 |
US4664890A (en) * | 1984-06-22 | 1987-05-12 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Glow-discharge decomposition apparatus |
DE3512196A1 (de) * | 1985-04-03 | 1986-10-16 | Hartmann & Braun Ag, 6000 Frankfurt | Verfahren zum aufbringen duenner schichten auf einem substrat |
US4915917A (en) * | 1987-02-19 | 1990-04-10 | The Johns Hopkins University | Glow discharge unit |
AU2003195A (en) * | 1994-06-21 | 1996-01-04 | Boc Group, Inc., The | Improved power distribution for multiple electrode plasma systems using quarter wavelength transmission lines |
EP1812949B1 (de) * | 2004-11-12 | 2010-07-07 | Oerlikon Trading AG, Trübbach | Impedanzanpassung eines kapazitiv gekoppelten hf-plasmareaktors mit eignung für grossflächige substrate |
AT13602U3 (de) * | 2013-10-29 | 2014-08-15 | Plansee Se | Sputtering Target und Verfahren zur Herstellung |
US9677008B2 (en) | 2014-12-04 | 2017-06-13 | Harris Corporation | Hydrocarbon emulsion separator system and related methods |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA596342A (en) * | 1960-04-19 | Megatron Limited | Production of thin layers by cathode sputtering | |
US3391071A (en) * | 1963-07-22 | 1968-07-02 | Bell Telephone Labor Inc | Method of sputtering highly pure refractory metals in an anodically biased chamber |
-
1967
- 1967-04-10 US US629660A patent/US3471396A/en not_active Expired - Lifetime
-
1968
- 1968-02-23 FR FR1560694D patent/FR1560694A/fr not_active Expired
- 1968-04-03 GB GB16013/68A patent/GB1149370A/en not_active Expired
- 1968-04-06 DE DE1765127A patent/DE1765127B2/de not_active Ceased
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2127439A (en) * | 1982-09-27 | 1984-04-11 | Konishiroku Photo Ind | Vacuum depositing compound semi conductors in activated hydrogen |
Also Published As
Publication number | Publication date |
---|---|
US3471396A (en) | 1969-10-07 |
DE1765127B2 (de) | 1979-01-18 |
FR1560694A (de) | 1969-03-21 |
DE1765127A1 (de) | 1972-04-06 |
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