GB1140065A - Improvements relating to vacuum deposition processes - Google Patents
Improvements relating to vacuum deposition processesInfo
- Publication number
- GB1140065A GB1140065A GB36083/65A GB3608365A GB1140065A GB 1140065 A GB1140065 A GB 1140065A GB 36083/65 A GB36083/65 A GB 36083/65A GB 3608365 A GB3608365 A GB 3608365A GB 1140065 A GB1140065 A GB 1140065A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- areas
- radiation
- resistivity
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
- H05K3/146—By vapour deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
1,140,065. Resistors; printed circuit assemblies. ELECTRICAL RESEARCH ASSOCIATION. 23 May, 1967 [23 Feb., 1966], No. 36083/65. Headings H1R and H1S. [Also in Division C7] In a vacuum deposition process of coating an insulating substrate such as glass or plastics with a thin metal film of e.g. Au., Cu or Ag, selected areas of the film are irradiated with electromagnetic radiation during the deposition so as to increase the electrical resistivity of these areas. Intermediate levels of resistivity may be included to serve as resistors. The resistivity of the "insulating" areas should be at least 10<SP>5</SP> times greater than that of the conducting areas. The metal film has a thickness of 200-100 and the radiation is effected at an intensity greater than 300 lumens/ft<SP>2</SP> with radiation having a continuous wavelength distribution over the range 0À6-1À1Á. The plastics substrate may be polyethylene terephthalate or a polyamide film. As shown in Fig. 1, an Au source 7 is evaporated under a vacuum of 10<SP>-5</SP> Torr while substrate 6 is maintained at 20 C. A shutter is then opened and a parallel beam of radiation 2 is projected by reflector 3 through a mask 4 and irradiates the substrate in the required pattern. Micro electronic circuits and medium current circuits may be so produced and two complementary films each on its respective substrate can be sandwiched together.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB36083/65A GB1140065A (en) | 1966-02-23 | 1966-02-23 | Improvements relating to vacuum deposition processes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB36083/65A GB1140065A (en) | 1966-02-23 | 1966-02-23 | Improvements relating to vacuum deposition processes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1140065A true GB1140065A (en) | 1969-01-15 |
Family
ID=10384759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB36083/65A Expired GB1140065A (en) | 1966-02-23 | 1966-02-23 | Improvements relating to vacuum deposition processes |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB1140065A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2212519A (en) * | 1987-11-13 | 1989-07-26 | Vg Instr Group | Vacuum evaporation and deposition |
-
1966
- 1966-02-23 GB GB36083/65A patent/GB1140065A/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2212519A (en) * | 1987-11-13 | 1989-07-26 | Vg Instr Group | Vacuum evaporation and deposition |
| GB2212519B (en) * | 1987-11-13 | 1992-05-20 | Vg Instr Group | Vacuum evaporation and deposition |
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