GB1113585A - Improvements in and relating to electroless deposition - Google Patents

Improvements in and relating to electroless deposition

Info

Publication number
GB1113585A
GB1113585A GB28386/66A GB2838666A GB1113585A GB 1113585 A GB1113585 A GB 1113585A GB 28386/66 A GB28386/66 A GB 28386/66A GB 2838666 A GB2838666 A GB 2838666A GB 1113585 A GB1113585 A GB 1113585A
Authority
GB
United Kingdom
Prior art keywords
ions
chloride
solution
palladium
relating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB28386/66A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1113585A publication Critical patent/GB1113585A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/48—Coating with alloys
    • C23C18/50—Coating with alloys with alloys based on iron, cobalt or nickel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/24—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemically Coating (AREA)

Abstract

An electroless plating solution of pH at least 8 comprises a water soluble cobalt salt e.g. sulphate, acetate, chloride or sulphamate, hypophosphite ions, ammonia, and an unsubstituted short chain aliphatic dicarboxylic acid anion, e.g. malonate or succinate. The molar ratio of cobalt ions to hypophosphite ions is from 0.15 to 2.0 and the ratio of cobalt ions to carboxylic acid is 1. If the substrate is copper, it is first dipped in hydrochloric acid, and then palladium chloride, and when it is plastics, ceramic or glass it is roughened, etched, immersed in stannous chloride and then in a palladium solution. The temperature of the solution may be 70 to 80 DEG C.
GB28386/66A 1965-06-30 1966-06-24 Improvements in and relating to electroless deposition Expired GB1113585A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46835765A 1965-06-30 1965-06-30

Publications (1)

Publication Number Publication Date
GB1113585A true GB1113585A (en) 1968-05-15

Family

ID=23859480

Family Applications (1)

Application Number Title Priority Date Filing Date
GB28386/66A Expired GB1113585A (en) 1965-06-30 1966-06-24 Improvements in and relating to electroless deposition

Country Status (3)

Country Link
US (1) US3423214A (en)
DE (1) DE1521333A1 (en)
GB (1) GB1113585A (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3523823A (en) * 1967-10-20 1970-08-11 Honeywell Inc Electroless plating with low controlled coercivity
US3869356A (en) * 1973-07-05 1975-03-04 Nico Magnetics Inc Method of making a thin, flexible magnetic memory layer
US5298092A (en) * 1990-05-17 1994-03-29 The Boeing Company Non-chromated oxide coating for aluminum substrates
US5551994A (en) * 1990-05-17 1996-09-03 The Boeing Company Non-chromated oxide coating for aluminum substrates
CA2087473C (en) * 1990-05-17 2001-10-16 Matthias P. Schriever Non-chromated oxide coating for aluminum substrates
US5411606A (en) * 1990-05-17 1995-05-02 The Boeing Company Non-chromated oxide coating for aluminum substrates
US5472524A (en) * 1990-05-17 1995-12-05 The Boeing Company Non-chromated cobalt conversion coating method and coated articles
US5468307A (en) * 1990-05-17 1995-11-21 Schriever; Matthias P. Non-chromated oxide coating for aluminum substrates
US5873953A (en) * 1996-12-26 1999-02-23 The Boeing Company Non-chromated oxide coating for aluminum substrates
US6432225B1 (en) 1999-11-02 2002-08-13 The Boeing Company Non-chromated oxide coating for aluminum substrates
US9476124B2 (en) * 2015-01-05 2016-10-25 Lam Research Corporation Selective deposition and co-deposition processes for ferromagnetic thin films

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2942990A (en) * 1959-01-26 1960-06-28 Metal Hydrides Inc Metal plating by chemical reduction with borohydrides
US3138479A (en) * 1961-12-20 1964-06-23 Burroughs Corp Method for the electroless deposition of high coercive magnetic film
US3238061A (en) * 1962-05-25 1966-03-01 Ibm Process for producing magnetic films
US3245826A (en) * 1963-06-12 1966-04-12 Clevite Corp Magnetic recording medium and method of manufacture
US3269854A (en) * 1963-05-16 1966-08-30 Minnesota Mining & Mfg Process of rendering substrates catalytic to electroless cobalt deposition and article produced

Also Published As

Publication number Publication date
DE1521333A1 (en) 1969-07-31
US3423214A (en) 1969-01-21

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