GB1039259A - Photoconductive layer and method of making the same - Google Patents
Photoconductive layer and method of making the sameInfo
- Publication number
- GB1039259A GB1039259A GB2256765A GB2256765A GB1039259A GB 1039259 A GB1039259 A GB 1039259A GB 2256765 A GB2256765 A GB 2256765A GB 2256765 A GB2256765 A GB 2256765A GB 1039259 A GB1039259 A GB 1039259A
- Authority
- GB
- United Kingdom
- Prior art keywords
- base
- layer
- photoconductive
- making
- same
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
- C23C14/226—Oblique incidence of vaporised material on substrate in order to form films with columnar structure
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
- H01J9/233—Manufacture of photoelectric screens or charge-storage screens
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
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- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
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- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249978—Voids specified as micro
- Y10T428/24998—Composite has more than two layers
Abstract
1,039,259. Photoconductive devices; television pick-up tubes. SONY CORPORATION. May 27, 1965, No. 22567/65. Headings H1D and H1K. A target for a television camera comprises a transparent base carrying a transparent electrode layer and a layer of continuous photoconductive material having minute cavities distributed therethrough; the photoconductive layer is deposited by a process in which the base is rotated about an axis substantially perpendicular to the face to which the layer is to be applied and evaporated photoconductive material (such as an oxysulphide of antimony) is projected at the base at an acute angle to the axis. Deposition takes place under substantially vacuum conditions and the base is preheated to a temperature between 50‹ and 200‹ C.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US45863665 US3391022A (en) | 1965-05-25 | 1965-05-25 | Photoconductive layer and method of making the same |
DES0097485 | 1965-06-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1039259A true GB1039259A (en) | 1966-08-17 |
Family
ID=25998111
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2256765A Expired GB1039259A (en) | 1965-05-25 | 1965-05-27 | Photoconductive layer and method of making the same |
Country Status (3)
Country | Link |
---|---|
US (1) | US3391022A (en) |
DE (1) | DE1514472A1 (en) |
GB (1) | GB1039259A (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3857708A (en) * | 1968-04-26 | 1974-12-31 | Agfa Gevaert | Zinc oxide-binder medium containing microscopic cavities |
US3620829A (en) * | 1968-05-06 | 1971-11-16 | Gen Motors Corp | Coatings for germanium semiconductor devices |
US4165923A (en) * | 1972-04-10 | 1979-08-28 | Ncr Corporation | Liquid crystal alignment structure |
CA991735A (en) * | 1972-04-10 | 1976-06-22 | Ncr Corporation | Alignment film for a liquid crystal display cell and method of making same |
US3964158A (en) * | 1973-08-07 | 1976-06-22 | Janning John L | Method of making a liquid crystal display cell |
US3908263A (en) * | 1974-11-14 | 1975-09-30 | Rca Corp | Separate interdigital electrodes without using any special photolithographic techniques |
JPS5160529A (en) * | 1974-11-22 | 1976-05-26 | Konishiroku Photo Ind | Denshishashinkankozairyo |
JPS5527323B2 (en) * | 1975-01-30 | 1980-07-19 | ||
US4587191A (en) * | 1984-01-05 | 1986-05-06 | Futures C, Inc. | Collapsible photoreceptive sheet including a high concentration of voids |
DE3447876C1 (en) * | 1984-12-31 | 1986-03-13 | Deutsche Forschungs- und Versuchsanstalt für Luft- und Raumfahrt e.V., 5300 Bonn | Semiconductor layer having a laminar structure, and process for producing it |
US4664935A (en) * | 1985-09-24 | 1987-05-12 | Machine Technology, Inc. | Thin film deposition apparatus and method |
US4921773A (en) * | 1988-12-30 | 1990-05-01 | Xerox Corporation | Process for preparing an electrophotographic imaging member |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2759861A (en) * | 1954-09-22 | 1956-08-21 | Bell Telephone Labor Inc | Process of making photoconductive compounds |
-
1965
- 1965-05-25 US US45863665 patent/US3391022A/en not_active Expired - Lifetime
- 1965-05-27 GB GB2256765A patent/GB1039259A/en not_active Expired
- 1965-06-04 DE DE19651514472 patent/DE1514472A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
US3391022A (en) | 1968-07-02 |
DE1514472A1 (en) | 1969-05-08 |
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