GB1000311A - Electrodeposition of nickel - Google Patents
Electrodeposition of nickelInfo
- Publication number
- GB1000311A GB1000311A GB40384/62A GB4038462A GB1000311A GB 1000311 A GB1000311 A GB 1000311A GB 40384/62 A GB40384/62 A GB 40384/62A GB 4038462 A GB4038462 A GB 4038462A GB 1000311 A GB1000311 A GB 1000311A
- Authority
- GB
- United Kingdom
- Prior art keywords
- nickel
- bath
- gms
- added
- sulphate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title abstract 10
- 229910052759 nickel Inorganic materials 0.000 title abstract 5
- 238000004070 electrodeposition Methods 0.000 title abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 abstract 2
- 150000003839 salts Chemical class 0.000 abstract 2
- 229910052712 strontium Inorganic materials 0.000 abstract 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 abstract 2
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical class C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 abstract 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- 229910001369 Brass Inorganic materials 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 abstract 1
- 229910002651 NO3 Inorganic materials 0.000 abstract 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 abstract 1
- 229910000831 Steel Inorganic materials 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical class OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract 1
- 229910001297 Zn alloy Inorganic materials 0.000 abstract 1
- DOIXGGGORNAJAT-UHFFFAOYSA-M [NH4+].[Ni+].[O-]S([O-])(=O)=O Chemical compound [NH4+].[Ni+].[O-]S([O-])(=O)=O DOIXGGGORNAJAT-UHFFFAOYSA-M 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 238000013019 agitation Methods 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000000129 anionic group Chemical group 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 abstract 1
- 239000004327 boric acid Substances 0.000 abstract 1
- 239000010951 brass Substances 0.000 abstract 1
- 238000005282 brightening Methods 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000011651 chromium Substances 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 229960000956 coumarin Drugs 0.000 abstract 1
- 235000001671 coumarin Nutrition 0.000 abstract 1
- 238000004512 die casting Methods 0.000 abstract 1
- 239000003792 electrolyte Substances 0.000 abstract 1
- NIAGBSSWEZDNMT-UHFFFAOYSA-N hydroxidotrioxidosulfur(.) Chemical compound [O]S(O)(=O)=O NIAGBSSWEZDNMT-UHFFFAOYSA-N 0.000 abstract 1
- 229910052749 magnesium Inorganic materials 0.000 abstract 1
- 239000011777 magnesium Substances 0.000 abstract 1
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 abstract 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 abstract 1
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 abstract 1
- 229940081974 saccharin Drugs 0.000 abstract 1
- 235000019204 saccharin Nutrition 0.000 abstract 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 abstract 1
- 229910052708 sodium Inorganic materials 0.000 abstract 1
- 239000011734 sodium Substances 0.000 abstract 1
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 abstract 1
- 239000010959 steel Substances 0.000 abstract 1
- 150000003456 sulfonamides Chemical class 0.000 abstract 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 abstract 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 abstract 1
- 235000011149 sulphuric acid Nutrition 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 239000011701 zinc Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Abstract
To provide an electrolyte for the electrodeposition of satin nickel, there is added to an acid aqueous solution of nickel sulphate and a levelling agent 0.01 - 1 g./l. of strontium as a salt which is water-soluble to at least the concentration added. Preferably the levelling agent does not have appreciable brightening effect and is coumarin a substituted coumarin, o-benzaldehyde sulphonic acid or a water-soluble salt thereof. To relieve stress in the deposit, sulpho-oxygen carrier brighteners such as aromatic or unsaturated aliphatic sulphonic acids, sulphonamides or sulphonimides, including saccharin, may be included in the bath which may also contain up to 5 g./l. of anionic or non-ionic surface active agents. Typically the bath contains per litre 200-450 gms. nickel sulphate hexahydrate, 30-60 gms. nickel chloride hexahydrate and 30-50 gms. boric acid, although reference is made to baths with a nickel concentration of 16-400 g./l. In specific examples strontium is added as the nitrate or chloride. Plating is effected at a current density of at least 10 A.S.F. with agitation of the bath which is used at 30-60 DEG C. and pH 2.7-4.5. Chromium may be plated over the nickel deposit which may be applied to a zinc alloy diecasting which may be plated with copper, or to brass or steel. Reference is made to the inclusion in the nickel bath of ammonium or nickel ammonium sulphate, sulphates of sodium, magnesium or zinc, sodium thiocyanate, or acetic, sulphamic, hydrochloric, fluoboric or sulphuric acids.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB40384/62A GB1000311A (en) | 1962-10-25 | 1962-10-25 | Electrodeposition of nickel |
US318109A US3312604A (en) | 1962-10-25 | 1963-10-22 | Electrodeposition of nickel |
FR951711A FR1372361A (en) | 1962-10-25 | 1963-10-24 | New aqueous electrolyte for nickel deposition and process for its implementation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB40384/62A GB1000311A (en) | 1962-10-25 | 1962-10-25 | Electrodeposition of nickel |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1000311A true GB1000311A (en) | 1965-08-04 |
Family
ID=10414625
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB40384/62A Expired GB1000311A (en) | 1962-10-25 | 1962-10-25 | Electrodeposition of nickel |
Country Status (2)
Country | Link |
---|---|
US (1) | US3312604A (en) |
GB (1) | GB1000311A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111876797A (en) * | 2020-07-08 | 2020-11-03 | 佛山亚特表面技术材料有限公司 | High-corrosion-resistance neutral nickel plating solution and neutral nickel priming process |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3360445A (en) * | 1965-01-04 | 1967-12-26 | Du Pont | Electrodeposition of nickel from the sulfamate bath |
US3645857A (en) * | 1969-05-28 | 1972-02-29 | Ferroxcube Corp | Method of making plated wire memory element |
US3661731A (en) * | 1970-03-16 | 1972-05-09 | Allied Chem | Electrodeposition of bright nickel |
JPH03153896A (en) * | 1989-11-09 | 1991-07-01 | Kanto Kasei Kogyo Kk | Nickel plating solution, bright copper-nickel-chromium electroplating method using this solution and ensuring superior corrosion resistance and plating film obtained by this method |
CA2236933A1 (en) * | 1997-06-18 | 1998-12-18 | Atotech Deutschland Gmbh | Electroplating of low-stress nickel |
CN107254699A (en) * | 2017-06-08 | 2017-10-17 | 合锋卫浴(厦门)有限公司 | A kind of method of plating on aluminium alloy dust cloud nickel composite deposite |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL285768A (en) * | 1961-11-21 |
-
1962
- 1962-10-25 GB GB40384/62A patent/GB1000311A/en not_active Expired
-
1963
- 1963-10-22 US US318109A patent/US3312604A/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111876797A (en) * | 2020-07-08 | 2020-11-03 | 佛山亚特表面技术材料有限公司 | High-corrosion-resistance neutral nickel plating solution and neutral nickel priming process |
CN111876797B (en) * | 2020-07-08 | 2021-10-15 | 佛山亚特表面技术材料有限公司 | High-corrosion-resistance neutral nickel plating solution and neutral nickel priming process |
Also Published As
Publication number | Publication date |
---|---|
US3312604A (en) | 1967-04-04 |
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