GB0416600D0 - A process for manufacturing micro- and nano-devices - Google Patents

A process for manufacturing micro- and nano-devices

Info

Publication number
GB0416600D0
GB0416600D0 GBGB0416600.5A GB0416600A GB0416600D0 GB 0416600 D0 GB0416600 D0 GB 0416600D0 GB 0416600 A GB0416600 A GB 0416600A GB 0416600 D0 GB0416600 D0 GB 0416600D0
Authority
GB
United Kingdom
Prior art keywords
nano
devices
manufacturing micro
micro
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB0416600.5A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Newcastle, The
Newcastle University of Upon Tyne
Original Assignee
University of Newcastle, The
Newcastle University of Upon Tyne
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Newcastle, The, Newcastle University of Upon Tyne filed Critical University of Newcastle, The
Priority to GBGB0416600.5A priority Critical patent/GB0416600D0/en
Publication of GB0416600D0 publication Critical patent/GB0416600D0/en
Priority to US11/658,272 priority patent/US7776227B2/en
Priority to JP2007523140A priority patent/JP5214243B2/ja
Priority to PCT/GB2005/002795 priority patent/WO2006010888A1/fr
Priority to EP05766123A priority patent/EP1778895A1/fr
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/14—Etching locally

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Electroplating Methods And Accessories (AREA)
GBGB0416600.5A 2004-07-24 2004-07-24 A process for manufacturing micro- and nano-devices Ceased GB0416600D0 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GBGB0416600.5A GB0416600D0 (en) 2004-07-24 2004-07-24 A process for manufacturing micro- and nano-devices
US11/658,272 US7776227B2 (en) 2004-07-24 2005-07-19 Process for manufacturing micro- and nano- devices
JP2007523140A JP5214243B2 (ja) 2004-07-24 2005-07-19 マイクロ及びナノデバイスの製造工程
PCT/GB2005/002795 WO2006010888A1 (fr) 2004-07-24 2005-07-19 Procede de fabrication de micro- et nano-dispositifs
EP05766123A EP1778895A1 (fr) 2004-07-24 2005-07-19 Procede de fabrication de micro- et nano-dispositifs

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0416600.5A GB0416600D0 (en) 2004-07-24 2004-07-24 A process for manufacturing micro- and nano-devices

Publications (1)

Publication Number Publication Date
GB0416600D0 true GB0416600D0 (en) 2004-08-25

Family

ID=32922787

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB0416600.5A Ceased GB0416600D0 (en) 2004-07-24 2004-07-24 A process for manufacturing micro- and nano-devices

Country Status (5)

Country Link
US (1) US7776227B2 (fr)
EP (1) EP1778895A1 (fr)
JP (1) JP5214243B2 (fr)
GB (1) GB0416600D0 (fr)
WO (1) WO2006010888A1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7626179B2 (en) * 2005-09-30 2009-12-01 Virgin Island Microsystems, Inc. Electron beam induced resonance
US7586097B2 (en) 2006-01-05 2009-09-08 Virgin Islands Microsystems, Inc. Switching micro-resonant structures using at least one director
US7791290B2 (en) 2005-09-30 2010-09-07 Virgin Islands Microsystems, Inc. Ultra-small resonating charged particle beam modulator
FR2898138B1 (fr) * 2006-03-03 2008-05-16 Commissariat Energie Atomique Procede de structuration electrochimique d'un materiau conducteur ou semi-conducteur, et dispositif de mise en oeuvre.
US7876793B2 (en) 2006-04-26 2011-01-25 Virgin Islands Microsystems, Inc. Micro free electron laser (FEL)
US8188431B2 (en) 2006-05-05 2012-05-29 Jonathan Gorrell Integration of vacuum microelectronic device with integrated circuit
US7728702B2 (en) 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Shielding of integrated circuit package with high-permeability magnetic material
US7728397B2 (en) 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Coupled nano-resonating energy emitting structures
US7732786B2 (en) 2006-05-05 2010-06-08 Virgin Islands Microsystems, Inc. Coupling energy in a plasmon wave to an electron beam
US7986113B2 (en) 2006-05-05 2011-07-26 Virgin Islands Microsystems, Inc. Selectable frequency light emitter
US7659200B2 (en) * 2007-01-05 2010-02-09 International Business Machines Corporation Self-constrained anisotropic germanium nanostructure from electroplating
US7990336B2 (en) 2007-06-19 2011-08-02 Virgin Islands Microsystems, Inc. Microwave coupled excitation of solid state resonant arrays
FR2958560B1 (fr) * 2010-04-07 2014-05-02 Snecma Installation a circuit ferme pour traiter la surface de pieces a partir d'un bain liquide
CN104724663A (zh) * 2013-12-20 2015-06-24 中国科学院兰州化学物理研究所 一种硅基仿生微纳结构表面的制备方法
CN104733302B (zh) * 2013-12-20 2018-06-08 中国科学院兰州化学物理研究所 一种非光刻技术制备倒金字塔结构硅表面的方法
DE102014102550A1 (de) 2014-02-27 2015-08-27 Cord Winkelmann Elektroden geeignet für die Herstellung von Mikro- und/oder Nanostrukturen auf Werkstoffen

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0563744B1 (fr) * 1992-03-30 1998-09-09 Seiko Instruments Inc. Procédé d'usinage électrochimique fin
JPH05271998A (ja) * 1992-03-30 1993-10-19 Seiko Instr Inc 微細加工装置
JP3269827B2 (ja) * 1997-04-04 2002-04-02 ユニバーシティ・オブ・サザン・カリフォルニア 電気化学製造のための物品、方法、および装置
US6491808B2 (en) * 1997-09-11 2002-12-10 Canon Kabushiki Kaisha Electrolytic etching method, method for producing photovoltaic element, and method for treating defect of photovoltaic element
SE523309E (sv) * 2001-06-15 2009-10-26 Replisaurus Technologies Ab Metod, elektrod och apparat för att skapa mikro- och nanostrukturer i ledande material genom mönstring med masterelektrod och elektrolyt
US7052616B2 (en) * 2001-08-14 2006-05-30 The Penn State Research Foundation Fabrication of molecular scale devices using fluidic assembly
JP3861011B2 (ja) * 2002-01-21 2006-12-20 株式会社ジェイテクト 電解加工用電極およびそれを用いた電解加工方法と電解加工用電極の製造方法
WO2003095715A1 (fr) * 2002-05-07 2003-11-20 University Of Southern California Procedes et appareil de surveillance de la qualite de depot au cours d'operations de galvanoplastie effectuees a l'aide d'un masque de contact adaptable
US20060249391A1 (en) * 2003-04-09 2006-11-09 Sungho Jin High resolution electrolytic lithography, apparatus therefor and resulting products
KR100565174B1 (ko) * 2003-11-20 2006-03-30 한국전자통신연구원 나노갭 전극소자의 제작 방법
US7122406B1 (en) * 2004-01-02 2006-10-17 Gem Services, Inc. Semiconductor device package diepad having features formed by electroplating
US7385295B2 (en) * 2004-06-24 2008-06-10 California Institute Of Technology Fabrication of nano-gap electrode arrays by the construction and selective chemical etching of nano-crosswire stacks
US7960217B2 (en) * 2004-09-08 2011-06-14 Thomas Schimmel Gate controlled atomic switch
US7998330B2 (en) * 2006-03-16 2011-08-16 The Board Of Trustees Of The University Of Illinois Direct nanoscale patterning of metals using polymer electrolytes

Also Published As

Publication number Publication date
JP5214243B2 (ja) 2013-06-19
US20080283501A1 (en) 2008-11-20
WO2006010888A1 (fr) 2006-02-02
EP1778895A1 (fr) 2007-05-02
JP2008507630A (ja) 2008-03-13
US7776227B2 (en) 2010-08-17

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)