GB0202656D0 - Apparatus and method for image-forming charged particle beams and charged particle beam exposure apparatus - Google Patents

Apparatus and method for image-forming charged particle beams and charged particle beam exposure apparatus

Info

Publication number
GB0202656D0
GB0202656D0 GBGB0202656.5A GB0202656A GB0202656D0 GB 0202656 D0 GB0202656 D0 GB 0202656D0 GB 0202656 A GB0202656 A GB 0202656A GB 0202656 D0 GB0202656 D0 GB 0202656D0
Authority
GB
United Kingdom
Prior art keywords
charged particle
image
beam exposure
forming
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB0202656.5A
Other versions
GB2369241A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000148417A external-priority patent/JP2001052998A/en
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of GB0202656D0 publication Critical patent/GB0202656D0/en
Publication of GB2369241A publication Critical patent/GB2369241A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
GB0202656A 1999-06-03 2000-06-02 Charged particle beam exposure device with aberration correction Withdrawn GB2369241A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP15694099 1999-06-03
JP2000148417A JP2001052998A (en) 1999-06-03 2000-05-19 Method and device for imaging charged particle beam, and exposure device therefor
GB0013551A GB2352323B (en) 1999-06-03 2000-06-02 Apparatus and method for image-forming charged particle beams and charged particle beam exposure apparatus

Publications (2)

Publication Number Publication Date
GB0202656D0 true GB0202656D0 (en) 2002-03-20
GB2369241A GB2369241A (en) 2002-05-22

Family

ID=27255751

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0202656A Withdrawn GB2369241A (en) 1999-06-03 2000-06-02 Charged particle beam exposure device with aberration correction

Country Status (1)

Country Link
GB (1) GB2369241A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10096448B2 (en) 2015-04-27 2018-10-09 National University Corporation Nagoya University Spherical aberration corrector for electromagnetic lens for charged particle beam

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5423476A (en) * 1977-07-25 1979-02-22 Akashi Seisakusho Kk Composite electron lens
NL8200559A (en) * 1982-02-15 1983-09-01 Ir Jan Bart Le Poole Prof Dr IRRADIATION DEVICE WITH BUNDLE SPLIT.
DE3504705A1 (en) * 1985-02-12 1986-08-14 Siemens AG, 1000 Berlin und 8000 München APERTURE DISPLAY WITH CELL-SHAPED MULTIPLE HOLE STRUCTURE AND PUSHING ELECTRODES FOR THE GENERATION OF A MULTIPLE OF INDIVIDUALLY TESTABLE BODY BEAM PROBE FOR A LITHOGRAPH DEVICE
US5012105A (en) * 1989-02-02 1991-04-30 Nippon Seiko Kabushiki Kaisha Multiple-imaging charged particle-beam exposure system
JPH03119717A (en) * 1989-09-30 1991-05-22 Fujitsu Ltd Charged particle exposure device and exposure
US5369282A (en) * 1992-08-03 1994-11-29 Fujitsu Limited Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput
JP3827359B2 (en) * 1996-03-19 2006-09-27 富士通株式会社 Charged particle beam exposure method and apparatus
US6989546B2 (en) * 1998-08-19 2006-01-24 Ims-Innenmikrofabrikations Systeme Gmbh Particle multibeam lithography

Also Published As

Publication number Publication date
GB2369241A (en) 2002-05-22

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)