IL140714A0 - Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography - Google Patents
Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithographyInfo
- Publication number
- IL140714A0 IL140714A0 IL14071400A IL14071400A IL140714A0 IL 140714 A0 IL140714 A0 IL 140714A0 IL 14071400 A IL14071400 A IL 14071400A IL 14071400 A IL14071400 A IL 14071400A IL 140714 A0 IL140714 A0 IL 140714A0
- Authority
- IL
- Israel
- Prior art keywords
- charged particle
- particle beam
- shielded
- calibrations
- microfabricated
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/12—Lenses electrostatic
- H01J2237/1205—Microlenses
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US30450599A | 1999-05-03 | 1999-05-03 | |
PCT/US2000/040082 WO2000067291A2 (en) | 1999-05-03 | 2000-05-03 | Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography |
Publications (1)
Publication Number | Publication Date |
---|---|
IL140714A0 true IL140714A0 (en) | 2002-02-10 |
Family
ID=23176813
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL14071400A IL140714A0 (en) | 1999-05-03 | 2000-05-03 | Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1135789A2 (en) |
JP (1) | JP2002543607A (en) |
KR (1) | KR20010100758A (en) |
AU (1) | AU4715300A (en) |
CA (1) | CA2336557A1 (en) |
IL (1) | IL140714A0 (en) |
WO (1) | WO2000067291A2 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4677109B2 (en) * | 2001-03-06 | 2011-04-27 | 株式会社トプコン | Reference template manufacturing method and reference template manufactured by the method |
EP1300870B1 (en) | 2001-10-05 | 2007-04-04 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multiple electron beam device |
WO2007050022A2 (en) * | 2005-10-26 | 2007-05-03 | Micronic Laser Systems Ab | Writing apparatuses and methods |
US8122846B2 (en) | 2005-10-26 | 2012-02-28 | Micronic Mydata AB | Platforms, apparatuses, systems and methods for processing and analyzing substrates |
WO2008107955A1 (en) | 2007-03-02 | 2008-09-12 | Advantest Corporation | Mask for multicolumn electron beam exposure, electron beam exposure device and exposure method employing mask for multicolumn electron beam exposure |
JP6453780B2 (en) | 2013-03-12 | 2019-01-16 | マイクロニック アーベーMycronic Ab | Method and apparatus for mechanically formed alignment reference body |
WO2014140047A2 (en) | 2013-03-12 | 2014-09-18 | Micronic Mydata AB | Method and device for writing photomasks with reduced mura errors |
CN112397363B (en) * | 2020-09-28 | 2022-08-30 | 西安增材制造国家研究院有限公司 | Electron gun beam spot correction device and correction method |
DE102021120913B3 (en) * | 2021-08-11 | 2023-02-09 | Carl Zeiss Smt Gmbh | Device for analyzing and/or processing a sample with a particle beam and method |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1100237A (en) * | 1977-03-23 | 1981-04-28 | Roger F.W. Pease | Multiple electron beam exposure system |
DE3020809A1 (en) * | 1980-06-02 | 1981-12-10 | M.A.N. Maschinenfabrik Augsburg-Nürnberg AG, 8000 München | METHOD FOR PRODUCING AN ELECTRON BEAM LEFT WINDOW |
US4528452A (en) * | 1982-12-09 | 1985-07-09 | Electron Beam Corporation | Alignment and detection system for electron image projectors |
EP0289885A1 (en) * | 1987-05-08 | 1988-11-09 | Siemens Aktiengesellschaft | Aperture system for production of several partical probes with changeable cross-section |
US5012105A (en) * | 1989-02-02 | 1991-04-30 | Nippon Seiko Kabushiki Kaisha | Multiple-imaging charged particle-beam exposure system |
US4987311A (en) * | 1989-08-08 | 1991-01-22 | Etec Systems, Inc. | Electron-detector diode biassing scheme for improved writing by an electron beam lithography machine |
US5155412A (en) * | 1991-05-28 | 1992-10-13 | International Business Machines Corporation | Method for selectively scaling a field emission electron gun and device formed thereby |
US5122663A (en) * | 1991-07-24 | 1992-06-16 | International Business Machine Corporation | Compact, integrated electron beam imaging system |
JP3033484B2 (en) * | 1995-12-21 | 2000-04-17 | 日本電気株式会社 | Electron beam exposure equipment |
US5838006A (en) * | 1996-10-17 | 1998-11-17 | Etec Systems, Inc. | Conical baffle for reducing charging drift in a particle beam system |
US5831272A (en) * | 1997-10-21 | 1998-11-03 | Utsumi; Takao | Low energy electron beam lithography |
US6989546B2 (en) * | 1998-08-19 | 2006-01-24 | Ims-Innenmikrofabrikations Systeme Gmbh | Particle multibeam lithography |
-
2000
- 2000-05-03 JP JP2000616043A patent/JP2002543607A/en active Pending
- 2000-05-03 CA CA002336557A patent/CA2336557A1/en not_active Abandoned
- 2000-05-03 AU AU47153/00A patent/AU4715300A/en not_active Abandoned
- 2000-05-03 KR KR1020017000065A patent/KR20010100758A/en not_active Application Discontinuation
- 2000-05-03 WO PCT/US2000/040082 patent/WO2000067291A2/en not_active Application Discontinuation
- 2000-05-03 IL IL14071400A patent/IL140714A0/en unknown
- 2000-05-03 EP EP00929001A patent/EP1135789A2/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
WO2000067291A2 (en) | 2000-11-09 |
CA2336557A1 (en) | 2000-11-09 |
JP2002543607A (en) | 2002-12-17 |
KR20010100758A (en) | 2001-11-14 |
WO2000067291A3 (en) | 2001-07-05 |
EP1135789A2 (en) | 2001-09-26 |
AU4715300A (en) | 2000-11-17 |
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