FR3061601B1 - Solution d'electrodeposition de cuivre et procede pour des motifs de facteur de forme eleve - Google Patents

Solution d'electrodeposition de cuivre et procede pour des motifs de facteur de forme eleve Download PDF

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Publication number
FR3061601B1
FR3061601B1 FR1663525A FR1663525A FR3061601B1 FR 3061601 B1 FR3061601 B1 FR 3061601B1 FR 1663525 A FR1663525 A FR 1663525A FR 1663525 A FR1663525 A FR 1663525A FR 3061601 B1 FR3061601 B1 FR 3061601B1
Authority
FR
France
Prior art keywords
form factor
electrodeposition solution
high form
copper electrodeposition
factor patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1663525A
Other languages
English (en)
French (fr)
Other versions
FR3061601A1 (fr
Inventor
Laurianne Religieux
Vincent Mevellec
Mikaïlou Thiam
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aveni SA
Original Assignee
Aveni SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1663525A priority Critical patent/FR3061601B1/fr
Application filed by Aveni SA filed Critical Aveni SA
Priority to CN201780082322.7A priority patent/CN110168146B/zh
Priority to PCT/EP2017/084580 priority patent/WO2018122216A1/en
Priority to JP2019535815A priority patent/JP7138108B2/ja
Priority to EP17818596.3A priority patent/EP3562975A1/en
Priority to US15/745,836 priority patent/US10883185B2/en
Priority to KR1020197020176A priority patent/KR102562158B1/ko
Priority to TW106146399A priority patent/TWI737880B/zh
Publication of FR3061601A1 publication Critical patent/FR3061601A1/fr
Priority to IL267531A priority patent/IL267531A/en
Application granted granted Critical
Publication of FR3061601B1 publication Critical patent/FR3061601B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors
    • C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/031—Manufacture or treatment of conductive parts of the interconnections
    • H10W20/056—Manufacture or treatment of conductive parts of the interconnections by filling conductive material into holes, grooves or trenches

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
FR1663525A 2016-12-29 2016-12-29 Solution d'electrodeposition de cuivre et procede pour des motifs de facteur de forme eleve Active FR3061601B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR1663525A FR3061601B1 (fr) 2016-12-29 2016-12-29 Solution d'electrodeposition de cuivre et procede pour des motifs de facteur de forme eleve
PCT/EP2017/084580 WO2018122216A1 (en) 2016-12-29 2017-12-26 Copper electrodeposition solution and process for high aspect ratio patterns
JP2019535815A JP7138108B2 (ja) 2016-12-29 2017-12-26 銅電着溶液及び高アスペクト比パターンのためのプロセス
EP17818596.3A EP3562975A1 (en) 2016-12-29 2017-12-26 Copper electrodeposition solution and process for high aspect ratio patterns
CN201780082322.7A CN110168146B (zh) 2016-12-29 2017-12-26 用于高纵横比图案的铜电沉积溶液和方法
US15/745,836 US10883185B2 (en) 2016-12-29 2017-12-26 Copper electrodeposition solution and process for high aspect ratio patterns
KR1020197020176A KR102562158B1 (ko) 2016-12-29 2017-12-26 높은 종횡비 패턴을 위한 구리 전착 용액 및 공정
TW106146399A TWI737880B (zh) 2016-12-29 2017-12-29 用於高縱橫比模式之銅電沉積溶液及方法
IL267531A IL267531A (en) 2016-12-29 2019-06-19 Copper electrodeposition solution and process for high aspect ratio patterns

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1663525 2016-12-29
FR1663525A FR3061601B1 (fr) 2016-12-29 2016-12-29 Solution d'electrodeposition de cuivre et procede pour des motifs de facteur de forme eleve

Publications (2)

Publication Number Publication Date
FR3061601A1 FR3061601A1 (fr) 2018-07-06
FR3061601B1 true FR3061601B1 (fr) 2022-12-30

Family

ID=59579658

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1663525A Active FR3061601B1 (fr) 2016-12-29 2016-12-29 Solution d'electrodeposition de cuivre et procede pour des motifs de facteur de forme eleve

Country Status (9)

Country Link
US (1) US10883185B2 (https=)
EP (1) EP3562975A1 (https=)
JP (1) JP7138108B2 (https=)
KR (1) KR102562158B1 (https=)
CN (1) CN110168146B (https=)
FR (1) FR3061601B1 (https=)
IL (1) IL267531A (https=)
TW (1) TWI737880B (https=)
WO (1) WO2018122216A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110724983B (zh) * 2019-10-12 2022-02-08 天津大学 一种利用脉冲电沉积法制备纳米铜包覆碳化钨核壳结构粉体的方法
CN111041533B (zh) * 2019-12-31 2021-06-29 苏州清飙科技有限公司 电镀纯钴用电镀液及其应用
CN111244547B (zh) * 2020-01-21 2021-09-17 四川虹微技术有限公司 一种含芳香肟类添加剂的电解液及其制备方法和用途
US12070609B2 (en) * 2020-07-30 2024-08-27 Medtronic, Inc. Electrical component and method of forming same
CN119156468A (zh) * 2022-04-05 2024-12-17 麦克德米德乐思公司 用于自底向上电镀铜的包含促进剂的电解质
JP2025137155A (ja) * 2024-03-08 2025-09-19 三菱マテリアル株式会社 酸性電解銅めっき液

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6897151B2 (en) * 2002-11-08 2005-05-24 Wayne State University Methods of filling a feature on a substrate with copper nanocrystals
US6897152B2 (en) 2003-02-05 2005-05-24 Enthone Inc. Copper bath composition for electroless and/or electrolytic filling of vias and trenches for integrated circuit fabrication
JP4650275B2 (ja) * 2004-08-10 2011-03-16 日立金属株式会社 銅めっき被膜を表面に有する希土類系永久磁石
FR2890983B1 (fr) 2005-09-20 2007-12-14 Alchimer Sa Composition d'electrodeposition destinee au revetement d'une surface d'un substrat par un metal.
FR2890984B1 (fr) * 2005-09-20 2009-03-27 Alchimer Sa Procede d'electrodeposition destine au revetement d'une surface d'un substrat par un metal.
US7579274B2 (en) 2006-02-21 2009-08-25 Alchimer Method and compositions for direct copper plating and filing to form interconnects in the fabrication of semiconductor devices
CN101275255A (zh) * 2007-12-20 2008-10-01 广州市二轻工业科学技术研究所 一种碱性无氰镀铜的维护方法
EP2305856A1 (en) * 2009-09-28 2011-04-06 ATOTECH Deutschland GmbH Process for applying a metal coating to a non-conductive substrate
JP2013091820A (ja) * 2011-10-24 2013-05-16 Kanto Chem Co Inc 銅層および／または銅合金層を含む金属膜用エッチング液組成物およびそれを用いたエッチング方法
FR2995912B1 (fr) * 2012-09-24 2014-10-10 Alchimer Electrolyte et procede d'electrodeposition de cuivre sur une couche barriere
KR101493358B1 (ko) * 2013-07-16 2015-02-13 한국생산기술연구원 무전해 구리도금액을 이용한 구리 도금층 형성방법
JP6474410B2 (ja) * 2013-12-09 2019-02-27 アヴニ 電気化学的に不活性なカチオンを含む銅電着浴
US9869026B2 (en) * 2014-07-15 2018-01-16 Rohm And Haas Electronic Materials Llc Electroless copper plating compositions

Also Published As

Publication number Publication date
US20180363158A1 (en) 2018-12-20
WO2018122216A1 (en) 2018-07-05
FR3061601A1 (fr) 2018-07-06
EP3562975A1 (en) 2019-11-06
KR102562158B1 (ko) 2023-08-01
KR20190097129A (ko) 2019-08-20
TW201833390A (zh) 2018-09-16
IL267531A (en) 2019-08-29
CN110168146B (zh) 2024-01-09
CN110168146A (zh) 2019-08-23
JP2020503459A (ja) 2020-01-30
US10883185B2 (en) 2021-01-05
JP7138108B2 (ja) 2022-09-15
TWI737880B (zh) 2021-09-01

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