FR3057390B1 - Four vertical avec dispositif de piegeage de contaminants - Google Patents

Four vertical avec dispositif de piegeage de contaminants Download PDF

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Publication number
FR3057390B1
FR3057390B1 FR1659813A FR1659813A FR3057390B1 FR 3057390 B1 FR3057390 B1 FR 3057390B1 FR 1659813 A FR1659813 A FR 1659813A FR 1659813 A FR1659813 A FR 1659813A FR 3057390 B1 FR3057390 B1 FR 3057390B1
Authority
FR
France
Prior art keywords
trapping device
contaminant trapping
vertical oven
contaminant
oven
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1659813A
Other languages
English (en)
Other versions
FR3057390A1 (fr
Inventor
Didier Landru
Oleg Kononchuk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soitec SA
Original Assignee
Soitec SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1659813A priority Critical patent/FR3057390B1/fr
Application filed by Soitec SA filed Critical Soitec SA
Priority to US16/341,390 priority patent/US11219851B2/en
Priority to JP2019540706A priority patent/JP6980021B2/ja
Priority to PCT/FR2017/052528 priority patent/WO2018069595A1/fr
Priority to SG11201903262WA priority patent/SG11201903262WA/en
Priority to CN201780062463.2A priority patent/CN109844922B/zh
Priority to DE112017005147.9T priority patent/DE112017005147T5/de
Publication of FR3057390A1 publication Critical patent/FR3057390A1/fr
Application granted granted Critical
Publication of FR3057390B1 publication Critical patent/FR3057390B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D46/00Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/56Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition
    • B01D46/62Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition connected in series
    • B01D46/64Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition connected in series arranged concentrically or coaxially
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67109Apparatus for thermal treatment mainly by convection
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D46/00Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0039Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with flow guiding by feed or discharge devices
    • B01D46/0041Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with flow guiding by feed or discharge devices for feeding
    • B01D46/0045Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with flow guiding by feed or discharge devices for feeding by using vanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D39/00Filtering material for liquid or gaseous fluids
    • B01D39/02Loose filtering material, e.g. loose fibres
    • B01D39/06Inorganic material, e.g. asbestos fibres, glass beads or fibres
FR1659813A 2016-10-11 2016-10-11 Four vertical avec dispositif de piegeage de contaminants Active FR3057390B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR1659813A FR3057390B1 (fr) 2016-10-11 2016-10-11 Four vertical avec dispositif de piegeage de contaminants
JP2019540706A JP6980021B2 (ja) 2016-10-11 2017-09-21 汚染物質を捕捉するための装置を備えた縦型炉
PCT/FR2017/052528 WO2018069595A1 (fr) 2016-10-11 2017-09-21 Four vertical avec dispositif de piégeage de contaminants
SG11201903262WA SG11201903262WA (en) 2016-10-11 2017-09-21 Vertical furnace with device for trapping contaminants
US16/341,390 US11219851B2 (en) 2016-10-11 2017-09-21 Vertical furnace with device for trapping contaminants
CN201780062463.2A CN109844922B (zh) 2016-10-11 2017-09-21 具有用于俘获污染物的装置的竖炉
DE112017005147.9T DE112017005147T5 (de) 2016-10-11 2017-09-21 Vertikalofen mit einer vorrichtung zum auffangen von schadstoffen

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1659813A FR3057390B1 (fr) 2016-10-11 2016-10-11 Four vertical avec dispositif de piegeage de contaminants
FR1659813 2016-10-11

Publications (2)

Publication Number Publication Date
FR3057390A1 FR3057390A1 (fr) 2018-04-13
FR3057390B1 true FR3057390B1 (fr) 2018-12-07

Family

ID=57861005

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1659813A Active FR3057390B1 (fr) 2016-10-11 2016-10-11 Four vertical avec dispositif de piegeage de contaminants

Country Status (7)

Country Link
US (1) US11219851B2 (fr)
JP (1) JP6980021B2 (fr)
CN (1) CN109844922B (fr)
DE (1) DE112017005147T5 (fr)
FR (1) FR3057390B1 (fr)
SG (1) SG11201903262WA (fr)
WO (1) WO2018069595A1 (fr)

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4050913A (en) * 1974-06-28 1977-09-27 Pall Corporation Vortex air cleaner assembly with acoustic attenuator
US4420314A (en) * 1977-06-02 1983-12-13 Barron Industries, Inc. Gas-solids separator
ZA931264B (en) * 1992-02-27 1993-09-17 Atomic Energy South Africa Filtration.
JPH08227862A (ja) * 1995-02-21 1996-09-03 Toshiba Ceramics Co Ltd 半導体熱処理炉
JPH08288232A (ja) 1995-04-10 1996-11-01 Toshiba Ceramics Co Ltd 半導体熱処理炉ガス制御治具
JPH0922878A (ja) * 1995-07-03 1997-01-21 Dainippon Screen Mfg Co Ltd 基板の熱処理炉
TW489827U (en) * 1998-04-09 2002-06-01 Kobe Steel Ltd Apparatus for high-temperature and high-pressure treatment of semiconductor substrates
JP2000277526A (ja) * 1999-03-24 2000-10-06 Canon Inc 半導体製造装置及びそれを用いた半導体部材の製造方法
US6302963B1 (en) 1999-12-21 2001-10-16 Axcelis Technologies, Inc. Bell jar having integral gas distribution channeling
US6620630B2 (en) * 2001-09-24 2003-09-16 Extraction Systems, Inc. System and method for determining and controlling contamination
NO315188B1 (no) * 2001-11-07 2003-07-28 Consept As Dråpefangersyklon
US20050053535A1 (en) 2003-09-08 2005-03-10 Seh America, Inc. Gettering filter and associated method for removing oxygen from a gas
JP2007059606A (ja) 2005-08-24 2007-03-08 Toshiba Ceramics Co Ltd 縦型ウエハボート及び縦型熱処理炉
JP4553263B2 (ja) 2007-01-26 2010-09-29 東京エレクトロン株式会社 熱処理装置及び熱処理方法
JP2010239115A (ja) * 2009-03-10 2010-10-21 Hitachi Kokusai Electric Inc 基板処理装置
TW201247589A (en) * 2009-05-22 2012-12-01 Advanced Tech Materials Low temperature GST process
US20110061810A1 (en) * 2009-09-11 2011-03-17 Applied Materials, Inc. Apparatus and Methods for Cyclical Oxidation and Etching
KR101165326B1 (ko) * 2010-10-06 2012-07-18 주식회사 유진테크 대칭형 유입구 및 유출구를 통해 반응가스를 공급하는 기판 처리 장치
GB201111735D0 (en) * 2011-07-08 2011-08-24 Rec Wafer Norway As Furnace for semiconductor material and method
US9192886B2 (en) * 2013-01-02 2015-11-24 Koch-Glitsch, Lp Cyclone, cyclone mist eliminator and method of use
US20140271097A1 (en) * 2013-03-15 2014-09-18 Applied Materials, Inc. Processing systems and methods for halide scavenging
GB2524743A (en) * 2014-03-31 2015-10-07 Nano Porous Solutions Ltd Apparatus for contaminant reduction in a stream of compressed gas
JP6441244B2 (ja) * 2016-02-02 2018-12-19 株式会社Kokusai Electric 基板処理装置

Also Published As

Publication number Publication date
CN109844922B (zh) 2022-10-14
DE112017005147T5 (de) 2019-06-27
CN109844922A (zh) 2019-06-04
WO2018069595A1 (fr) 2018-04-19
FR3057390A1 (fr) 2018-04-13
JP2019534581A (ja) 2019-11-28
SG11201903262WA (en) 2019-05-30
JP6980021B2 (ja) 2021-12-15
US11219851B2 (en) 2022-01-11
US20200054978A1 (en) 2020-02-20

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