FR3039317B1 - Procede de gravure de materiaux durs - Google Patents

Procede de gravure de materiaux durs

Info

Publication number
FR3039317B1
FR3039317B1 FR1557059A FR1557059A FR3039317B1 FR 3039317 B1 FR3039317 B1 FR 3039317B1 FR 1557059 A FR1557059 A FR 1557059A FR 1557059 A FR1557059 A FR 1557059A FR 3039317 B1 FR3039317 B1 FR 3039317B1
Authority
FR
France
Prior art keywords
hard materials
etching hard
etching
materials
hard
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1557059A
Other languages
English (en)
Other versions
FR3039317A1 (fr
Inventor
Thierry Salvetat
Jean-Jacques Aubert
Alain-Marcel Rey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arnano
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Arnano
Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arnano, Commissariat a lEnergie Atomique CEA, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Arnano
Priority to FR1557059A priority Critical patent/FR3039317B1/fr
Priority to PCT/EP2016/067492 priority patent/WO2017016997A1/fr
Publication of FR3039317A1 publication Critical patent/FR3039317A1/fr
Application granted granted Critical
Publication of FR3039317B1 publication Critical patent/FR3039317B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00388—Etch mask forming
    • B81C1/00428—Etch mask forming processes not provided for in groups B81C1/00396 - B81C1/0042
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/08—Shaping or machining of piezoelectric or electrostrictive bodies
    • H10N30/082—Shaping or machining of piezoelectric or electrostrictive bodies by etching, e.g. lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128—Processes for removing material
    • B81C2201/013—Etching
    • B81C2201/0133—Wet etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128—Processes for removing material
    • B81C2201/013—Etching
    • B81C2201/0135—Controlling etch progression

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Micromachines (AREA)
FR1557059A 2015-07-24 2015-07-24 Procede de gravure de materiaux durs Expired - Fee Related FR3039317B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR1557059A FR3039317B1 (fr) 2015-07-24 2015-07-24 Procede de gravure de materiaux durs
PCT/EP2016/067492 WO2017016997A1 (fr) 2015-07-24 2016-07-22 Procede de gravure de materiaux durs

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1557059A FR3039317B1 (fr) 2015-07-24 2015-07-24 Procede de gravure de materiaux durs

Publications (2)

Publication Number Publication Date
FR3039317A1 FR3039317A1 (fr) 2017-01-27
FR3039317B1 true FR3039317B1 (fr) 2018-09-21

Family

ID=54329760

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1557059A Expired - Fee Related FR3039317B1 (fr) 2015-07-24 2015-07-24 Procede de gravure de materiaux durs

Country Status (2)

Country Link
FR (1) FR3039317B1 (fr)
WO (1) WO2017016997A1 (fr)

Also Published As

Publication number Publication date
FR3039317A1 (fr) 2017-01-27
WO2017016997A1 (fr) 2017-02-02

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Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLSC Publication of the preliminary search report

Effective date: 20170127

PLFP Fee payment

Year of fee payment: 3

PLFP Fee payment

Year of fee payment: 4

PLFP Fee payment

Year of fee payment: 5

ST Notification of lapse

Effective date: 20210305