FR2981190B1 - Circuit d'ecoulement de charges electriques pour une mesure temporelle - Google Patents
Circuit d'ecoulement de charges electriques pour une mesure temporelleInfo
- Publication number
- FR2981190B1 FR2981190B1 FR1159025A FR1159025A FR2981190B1 FR 2981190 B1 FR2981190 B1 FR 2981190B1 FR 1159025 A FR1159025 A FR 1159025A FR 1159025 A FR1159025 A FR 1159025A FR 2981190 B1 FR2981190 B1 FR 2981190B1
- Authority
- FR
- France
- Prior art keywords
- circuit
- time measurement
- electrical loads
- flowing electrical
- flowing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005259 measurement Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
- G01R27/26—Measuring inductance or capacitance; Measuring quality factor, e.g. by using the resonance method; Measuring loss factor; Measuring dielectric constants ; Measuring impedance or related variables
- G01R27/2605—Measuring capacitance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R17/00—Measuring arrangements involving comparison with a reference value, e.g. bridge
- G01R17/02—Arrangements in which the value to be measured is automatically compared with a reference value
-
- G—PHYSICS
- G04—HOROLOGY
- G04F—TIME-INTERVAL MEASURING
- G04F10/00—Apparatus for measuring unknown time intervals by electric means
- G04F10/10—Apparatus for measuring unknown time intervals by electric means by measuring electric or magnetic quantities changing in proportion to time
-
- G—PHYSICS
- G04—HOROLOGY
- G04F—TIME-INTERVAL MEASURING
- G04F13/00—Apparatus for measuring unknown time intervals by means not provided for in groups G04F5/00 - G04F10/00
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/24—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using capacitors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C27/00—Electric analogue stores, e.g. for storing instantaneous values
- G11C27/02—Sample-and-hold arrangements
- G11C27/024—Sample-and-hold arrangements using a capacitive memory element
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/38—Multiple capacitors, i.e. structural combinations of fixed capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5223—Capacitor integral with wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/0805—Capacitors only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/92—Capacitors having potential barriers
- H01L29/94—Metal-insulator-semiconductors, e.g. MOS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1159025A FR2981190B1 (fr) | 2011-10-06 | 2011-10-06 | Circuit d'ecoulement de charges electriques pour une mesure temporelle |
US13/615,309 US8872177B2 (en) | 2011-10-06 | 2012-09-13 | Electric charge flow circuit for a time measurement |
CN201710618804.1A CN107272396B (zh) | 2011-10-06 | 2012-09-21 | 用于时间测量的电荷流电路 |
CN2012204912205U CN202796080U (zh) | 2011-10-06 | 2012-09-21 | 用于时间测量的电荷流电路、电荷留置电路以及集成电路芯片 |
CN201210359644.0A CN103035299B (zh) | 2011-10-06 | 2012-09-21 | 用于时间测量的电荷流电路 |
US14/494,095 US9110116B2 (en) | 2011-10-06 | 2014-09-23 | Electric charge flow circuit for a time measurement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1159025A FR2981190B1 (fr) | 2011-10-06 | 2011-10-06 | Circuit d'ecoulement de charges electriques pour une mesure temporelle |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2981190A1 FR2981190A1 (fr) | 2013-04-12 |
FR2981190B1 true FR2981190B1 (fr) | 2014-03-21 |
Family
ID=47823293
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1159025A Expired - Fee Related FR2981190B1 (fr) | 2011-10-06 | 2011-10-06 | Circuit d'ecoulement de charges electriques pour une mesure temporelle |
Country Status (3)
Country | Link |
---|---|
US (2) | US8872177B2 (fr) |
CN (3) | CN103035299B (fr) |
FR (1) | FR2981190B1 (fr) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2981190B1 (fr) * | 2011-10-06 | 2014-03-21 | St Microelectronics Rousset | Circuit d'ecoulement de charges electriques pour une mesure temporelle |
FR2994020B1 (fr) * | 2012-07-30 | 2015-04-10 | St Microelectronics Rousset | Element d'ecoulement de charges electriques |
US20150278681A1 (en) * | 2014-04-01 | 2015-10-01 | Boise State University | Memory controlled circuit system and apparatus |
FR3038411B1 (fr) * | 2015-06-30 | 2018-08-17 | Stmicroelectronics (Rousset) Sas | Detection d'authenticite d'un circuit electronique ou d'un produit contenant un tel circuit |
FR3052291B1 (fr) * | 2016-06-03 | 2018-11-23 | Stmicroelectronics (Rousset) Sas | Procede de fabrication d'un reseau de diodes, en particulier pour une memoire non volatile, et dispositif correspondant. |
ITUA20164739A1 (it) * | 2016-06-29 | 2017-12-29 | St Microelectronics Srl | Circuito di test di uno stadio circuitale a lunga costante di tempo e relativo metodo di test |
ITUA20164741A1 (it) | 2016-06-29 | 2017-12-29 | St Microelectronics Srl | Circuito di lettura di uno stadio circuitale a lunga costante di tempo e relativo metodo di lettura |
FR3085540B1 (fr) | 2018-08-31 | 2020-09-25 | St Microelectronics Rousset | Dispositif integre de mesure temporelle a constante de temps ultra longue et procede de fabrication |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4266144A (en) * | 1979-05-14 | 1981-05-05 | Emhart Industries, Inc. | Detection means for multiple capacitive sensing devices |
US7235838B2 (en) * | 2004-06-30 | 2007-06-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor device substrate with embedded capacitor |
JP5065594B2 (ja) * | 2005-12-23 | 2012-11-07 | 株式会社東芝 | 半導体記憶装置 |
FR2904463A1 (fr) * | 2006-07-27 | 2008-02-01 | St Microelectronics Sa | Programmation d'un circuit de retention de charges pour mesure temporelle |
CN101601097B (zh) | 2006-07-27 | 2012-10-17 | 意法半导体有限公司 | 用于进行时间测量的电荷保持电路 |
US7518921B2 (en) * | 2007-03-20 | 2009-04-14 | Kabushiki Kaish Toshiba | Semiconductor memory device which includes memory cell having charge accumulation layer and control gate |
FR2926400A1 (fr) * | 2008-01-11 | 2009-07-17 | St Microelectronics Rousset | Cellule eeprom a perte de charges |
FR2981190B1 (fr) * | 2011-10-06 | 2014-03-21 | St Microelectronics Rousset | Circuit d'ecoulement de charges electriques pour une mesure temporelle |
-
2011
- 2011-10-06 FR FR1159025A patent/FR2981190B1/fr not_active Expired - Fee Related
-
2012
- 2012-09-13 US US13/615,309 patent/US8872177B2/en active Active
- 2012-09-21 CN CN201210359644.0A patent/CN103035299B/zh active Active
- 2012-09-21 CN CN2012204912205U patent/CN202796080U/zh not_active Expired - Lifetime
- 2012-09-21 CN CN201710618804.1A patent/CN107272396B/zh active Active
-
2014
- 2014-09-23 US US14/494,095 patent/US9110116B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN107272396A (zh) | 2017-10-20 |
CN107272396B (zh) | 2019-07-12 |
FR2981190A1 (fr) | 2013-04-12 |
CN103035299B (zh) | 2017-08-15 |
US8872177B2 (en) | 2014-10-28 |
US9110116B2 (en) | 2015-08-18 |
US20150043269A1 (en) | 2015-02-12 |
CN202796080U (zh) | 2013-03-13 |
CN103035299A (zh) | 2013-04-10 |
US20130088263A1 (en) | 2013-04-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 6 |
|
PLFP | Fee payment |
Year of fee payment: 7 |
|
PLFP | Fee payment |
Year of fee payment: 8 |
|
PLFP | Fee payment |
Year of fee payment: 9 |
|
ST | Notification of lapse |
Effective date: 20210605 |