FR2972195B1 - Composition de polissage chimico-mecanique, exempte de cellulose hydrosoluble, concentrable, stable - Google Patents

Composition de polissage chimico-mecanique, exempte de cellulose hydrosoluble, concentrable, stable

Info

Publication number
FR2972195B1
FR2972195B1 FR1251977A FR1251977A FR2972195B1 FR 2972195 B1 FR2972195 B1 FR 2972195B1 FR 1251977 A FR1251977 A FR 1251977A FR 1251977 A FR1251977 A FR 1251977A FR 2972195 B1 FR2972195 B1 FR 2972195B1
Authority
FR
France
Prior art keywords
mechanical polishing
substrate
water
optionally
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1251977A
Other languages
English (en)
French (fr)
Other versions
FR2972195A1 (fr
Inventor
Hamed Lakrout
Jinjie Shi
Joseph Letizia
Xu Li
Thomas H Kalantar
Francis Kelley
Keith J Harris
Christopher J Tucker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Global Technologies LLC
DuPont Electronic Materials Holding Inc
Original Assignee
Rohm and Haas Electronic Materials CMP Holdings Inc
Dow Global Technologies LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Electronic Materials CMP Holdings Inc, Dow Global Technologies LLC filed Critical Rohm and Haas Electronic Materials CMP Holdings Inc
Publication of FR2972195A1 publication Critical patent/FR2972195A1/fr
Application granted granted Critical
Publication of FR2972195B1 publication Critical patent/FR2972195B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/403—Chemomechanical polishing [CMP] of conductive or resistive materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/06—Other polishing compositions
    • C09G1/14—Other polishing compositions based on non-waxy substances
    • C09G1/16—Other polishing compositions based on non-waxy substances on natural or synthetic resins
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
FR1251977A 2011-03-03 2012-03-05 Composition de polissage chimico-mecanique, exempte de cellulose hydrosoluble, concentrable, stable Expired - Fee Related FR2972195B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/039,705 US8440097B2 (en) 2011-03-03 2011-03-03 Stable, concentratable, water soluble cellulose free chemical mechanical polishing composition

Publications (2)

Publication Number Publication Date
FR2972195A1 FR2972195A1 (fr) 2012-09-07
FR2972195B1 true FR2972195B1 (fr) 2015-08-28

Family

ID=46671507

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1251977A Expired - Fee Related FR2972195B1 (fr) 2011-03-03 2012-03-05 Composition de polissage chimico-mecanique, exempte de cellulose hydrosoluble, concentrable, stable

Country Status (7)

Country Link
US (1) US8440097B2 (https=)
JP (1) JP6118501B2 (https=)
KR (1) KR101829639B1 (https=)
CN (1) CN102690609B (https=)
DE (1) DE102012004219A1 (https=)
FR (1) FR2972195B1 (https=)
TW (1) TWI602909B (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8435896B2 (en) * 2011-03-03 2013-05-07 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Stable, concentratable chemical mechanical polishing composition and methods relating thereto
US8545715B1 (en) * 2012-10-09 2013-10-01 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing composition and method
US20140308814A1 (en) * 2013-04-15 2014-10-16 Applied Materials, Inc Chemical mechanical polishing methods and systems including pre-treatment phase and pre-treatment compositions
US9984895B1 (en) * 2017-01-31 2018-05-29 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing method for tungsten
CN110431209B (zh) * 2017-03-14 2022-06-28 福吉米株式会社 研磨用组合物、其制造方法以及使用其的研磨方法及基板的制造方法
WO2018217628A1 (en) 2017-05-25 2018-11-29 Fujifilm Planar Solutions, LLC Chemical mechanical polishing slurry for cobalt applications
KR102570805B1 (ko) * 2019-11-01 2023-08-24 삼성에스디아이 주식회사 텅스텐 패턴 웨이퍼 연마용 cmp 슬러리 조성물 및 이를 이용한 텅스텐 패턴 웨이퍼 연마 방법
TWI896724B (zh) * 2020-09-29 2025-09-11 日商福吉米股份有限公司 研磨用組成物及其製造方法、研磨方法以及基板的製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG99289A1 (en) 1998-10-23 2003-10-27 Ibm Chemical-mechanical planarization of metallurgy
US6375693B1 (en) 1999-05-07 2002-04-23 International Business Machines Corporation Chemical-mechanical planarization of barriers or liners for copper metallurgy
JP3551238B2 (ja) * 1999-09-07 2004-08-04 三菱住友シリコン株式会社 シリコンウェーハの研磨液及びこれを用いた研磨方法
TW584658B (en) 2001-04-12 2004-04-21 Rodel Inc Polishing composition having a surfactant
US6632259B2 (en) 2001-05-18 2003-10-14 Rodel Holdings, Inc. Chemical mechanical polishing compositions and methods relating thereto
JP4641155B2 (ja) * 2004-06-03 2011-03-02 株式会社日本触媒 化学機械研磨用の研磨剤
US20060000808A1 (en) * 2004-07-01 2006-01-05 Fuji Photo Film Co., Ltd. Polishing solution of metal and chemical mechanical polishing method
US7384871B2 (en) 2004-07-01 2008-06-10 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing compositions and methods relating thereto
US7303993B2 (en) 2004-07-01 2007-12-04 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing compositions and methods relating thereto
US7086935B2 (en) 2004-11-24 2006-08-08 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Cellulose-containing polishing compositions and methods relating thereto
US7824568B2 (en) 2006-08-17 2010-11-02 International Business Machines Corporation Solution for forming polishing slurry, polishing slurry and related methods
JP2008091411A (ja) * 2006-09-29 2008-04-17 Fujifilm Corp 金属用研磨液
US20090032765A1 (en) * 2007-08-03 2009-02-05 Jinru Bian Selective barrier polishing slurry
TW200920828A (en) * 2007-09-20 2009-05-16 Fujifilm Corp Polishing slurry for metal and chemical mechanical polishing method
US20090215266A1 (en) 2008-02-22 2009-08-27 Thomas Terence M Polishing Copper-Containing patterned wafers
US9633865B2 (en) * 2008-02-22 2017-04-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Low-stain polishing composition
JP4521058B2 (ja) * 2008-03-24 2010-08-11 株式会社Adeka 表面改質コロイダルシリカおよびこれを含有するｃｍｐ用研磨組成物
US8540893B2 (en) 2008-08-04 2013-09-24 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing composition and methods relating thereto

Also Published As

Publication number Publication date
KR20120100820A (ko) 2012-09-12
CN102690609B (zh) 2014-11-26
DE102012004219A1 (de) 2012-09-06
CN102690609A (zh) 2012-09-26
TW201302997A (zh) 2013-01-16
JP2012199531A (ja) 2012-10-18
US8440097B2 (en) 2013-05-14
FR2972195A1 (fr) 2012-09-07
US20120225556A1 (en) 2012-09-06
KR101829639B1 (ko) 2018-03-29
TWI602909B (zh) 2017-10-21
JP6118501B2 (ja) 2017-04-19

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