FR2935535B1 - Procede de detourage mixte. - Google Patents

Procede de detourage mixte.

Info

Publication number
FR2935535B1
FR2935535B1 FR0855872A FR0855872A FR2935535B1 FR 2935535 B1 FR2935535 B1 FR 2935535B1 FR 0855872 A FR0855872 A FR 0855872A FR 0855872 A FR0855872 A FR 0855872A FR 2935535 B1 FR2935535 B1 FR 2935535B1
Authority
FR
France
Prior art keywords
plate
detouring
joint
trimming step
trimming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0855872A
Other languages
English (en)
Other versions
FR2935535A1 (fr
Inventor
Marcel Broekaart
Marion Migette
Sebastien Molinari
Eric Neyret
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soitec SA
Original Assignee
Soitec SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0855872A priority Critical patent/FR2935535B1/fr
Application filed by Soitec SA filed Critical Soitec SA
Priority to CN2009801154790A priority patent/CN102017090A/zh
Priority to KR1020107023257A priority patent/KR101185426B1/ko
Priority to PCT/EP2009/059960 priority patent/WO2010026006A1/fr
Priority to JP2011510009A priority patent/JP2011523779A/ja
Priority to US12/933,966 priority patent/US20110117691A1/en
Priority to EP09811093A priority patent/EP2321842A1/fr
Priority to TW098128543A priority patent/TW201027608A/zh
Publication of FR2935535A1 publication Critical patent/FR2935535A1/fr
Application granted granted Critical
Publication of FR2935535B1 publication Critical patent/FR2935535B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
    • H01L21/76256—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques using silicon etch back techniques, e.g. BESOI, ELTRAN

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
  • Punching Or Piercing (AREA)

Abstract

L'invention concerne un procédé de détourage d'une structure (500) comprenant une première plaque (200) collée sur une deuxième plaque (300), la première plaque (200) présentant un bord chanfreiné. Le procédé comprend une première étape de détourage (S4) du bord de la première plaque (200) réalisée par usinage mécanique sur une profondeur (Pd1) déterminée dans la première plaque. Cette première étape de détourage est suivie d'une deuxième étape de détourage non mécanique (55) sur au moins l'épaisseur restante de la première plaque.
FR0855872A 2008-09-02 2008-09-02 Procede de detourage mixte. Expired - Fee Related FR2935535B1 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR0855872A FR2935535B1 (fr) 2008-09-02 2008-09-02 Procede de detourage mixte.
KR1020107023257A KR101185426B1 (ko) 2008-09-02 2009-07-31 복합 트리밍 방법
PCT/EP2009/059960 WO2010026006A1 (fr) 2008-09-02 2009-07-31 Procédé de finition mixte
JP2011510009A JP2011523779A (ja) 2008-09-02 2009-07-31 混合トリミング方法
CN2009801154790A CN102017090A (zh) 2008-09-02 2009-07-31 混合冲切方法
US12/933,966 US20110117691A1 (en) 2008-09-02 2009-07-31 Mixed trimming method
EP09811093A EP2321842A1 (fr) 2008-09-02 2009-07-31 Procédé de finition mixte
TW098128543A TW201027608A (en) 2008-09-02 2009-08-25 A mixed trimming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0855872A FR2935535B1 (fr) 2008-09-02 2008-09-02 Procede de detourage mixte.

Publications (2)

Publication Number Publication Date
FR2935535A1 FR2935535A1 (fr) 2010-03-05
FR2935535B1 true FR2935535B1 (fr) 2010-12-10

Family

ID=40521695

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0855872A Expired - Fee Related FR2935535B1 (fr) 2008-09-02 2008-09-02 Procede de detourage mixte.

Country Status (8)

Country Link
US (1) US20110117691A1 (fr)
EP (1) EP2321842A1 (fr)
JP (1) JP2011523779A (fr)
KR (1) KR101185426B1 (fr)
CN (1) CN102017090A (fr)
FR (1) FR2935535B1 (fr)
TW (1) TW201027608A (fr)
WO (1) WO2010026006A1 (fr)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2899594A1 (fr) 2006-04-10 2007-10-12 Commissariat Energie Atomique Procede d'assemblage de substrats avec traitements thermiques a basses temperatures
FR2935536B1 (fr) 2008-09-02 2010-09-24 Soitec Silicon On Insulator Procede de detourage progressif
FR2950734B1 (fr) * 2009-09-28 2011-12-09 Soitec Silicon On Insulator Procede de collage et de transfert d'une couche
FR2954585B1 (fr) * 2009-12-23 2012-03-02 Soitec Silicon Insulator Technologies Procede de realisation d'une heterostructure avec minimisation de contrainte
FR2957189B1 (fr) 2010-03-02 2012-04-27 Soitec Silicon On Insulator Procede de realisation d'une structure multicouche avec detourage post meulage.
FR2957716B1 (fr) 2010-03-18 2012-10-05 Soitec Silicon On Insulator Procede de finition d'un substrat de type semi-conducteur sur isolant
FR2961630B1 (fr) 2010-06-22 2013-03-29 Soitec Silicon On Insulator Technologies Appareil de fabrication de dispositifs semi-conducteurs
US8338266B2 (en) 2010-08-11 2012-12-25 Soitec Method for molecular adhesion bonding at low pressure
FR2964193A1 (fr) 2010-08-24 2012-03-02 Soitec Silicon On Insulator Procede de mesure d'une energie d'adhesion, et substrats associes
FR2967295B1 (fr) * 2010-11-05 2013-01-11 Soitec Silicon On Insulator Procédé de traitement d'une structure multicouche
US8765578B2 (en) * 2012-06-06 2014-07-01 International Business Machines Corporation Edge protection of bonded wafers during wafer thinning
US9064770B2 (en) * 2012-07-17 2015-06-23 Taiwan Semiconductor Manufacturing Company, Ltd. Methods for minimizing edge peeling in the manufacturing of BSI chips
JP2014107448A (ja) * 2012-11-28 2014-06-09 Nikon Corp 積層半導体装置の製造方法および積層半導体製造装置
US9721832B2 (en) * 2013-03-15 2017-08-01 Kulite Semiconductor Products, Inc. Methods of fabricating silicon-on-insulator (SOI) semiconductor devices using blanket fusion bonding
FR3007576B1 (fr) * 2013-06-19 2015-07-10 Soitec Silicon On Insulator Procede de transfert d'une couche de circuits.
US10510560B2 (en) * 2015-09-04 2019-12-17 Nanyang Technological University Method of encapsulating a substrate
CN105271108B (zh) * 2015-09-10 2017-08-04 武汉新芯集成电路制造有限公司 一种晶圆的键合方法
US10580823B2 (en) * 2017-05-03 2020-03-03 United Microelectronics Corp. Wafer level packaging method
US10818488B2 (en) * 2017-11-13 2020-10-27 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer structure and trimming method thereof
CN110323178A (zh) * 2019-07-04 2019-10-11 长春长光圆辰微电子技术有限公司 一种soi晶圆边缘零空洞的工艺制程方法
US11482506B2 (en) * 2020-03-31 2022-10-25 Taiwan Semiconductor Manufacturing Company Limited Edge-trimming methods for wafer bonding and dicing
CN112289694A (zh) * 2020-10-30 2021-01-29 长江存储科技有限责任公司 晶圆键合方法
FR3120985B1 (fr) * 2021-03-19 2023-03-31 Soitec Silicon On Insulator Procédé de fabrication d’une hétérostructure
CN115579282B (zh) * 2022-11-04 2024-03-22 湖北三维半导体集成创新中心有限责任公司 晶圆的处理方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04263425A (ja) * 1991-02-18 1992-09-18 Toshiba Corp 半導体基板の研削装置及び研削方法
US5266511A (en) * 1991-10-02 1993-11-30 Fujitsu Limited Process for manufacturing three dimensional IC's
JP3352129B2 (ja) * 1992-12-04 2002-12-03 株式会社東芝 半導体基板の製造方法
JPH0917984A (ja) * 1995-06-29 1997-01-17 Sumitomo Sitix Corp 貼り合わせｓｏｉ基板の製造方法
FR2748851B1 (fr) * 1996-05-15 1998-08-07 Commissariat Energie Atomique Procede de realisation d'une couche mince de materiau semiconducteur
JP3352896B2 (ja) * 1997-01-17 2002-12-03 信越半導体株式会社 貼り合わせ基板の作製方法
JPH10223497A (ja) * 1997-01-31 1998-08-21 Shin Etsu Handotai Co Ltd 貼り合わせ基板の作製方法
EP0935280B1 (fr) * 1998-02-04 2004-06-09 Canon Kabushiki Kaisha Substrat SOI
JP3635200B2 (ja) * 1998-06-04 2005-04-06 信越半導体株式会社 Ｓｏｉウェーハの製造方法
US6984571B1 (en) * 1999-10-01 2006-01-10 Ziptronix, Inc. Three dimensional device integration method and integrated device
US6863774B2 (en) * 2001-03-08 2005-03-08 Raytech Innovative Solutions, Inc. Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same
US6717212B2 (en) * 2001-06-12 2004-04-06 Advanced Micro Devices, Inc. Leaky, thermally conductive insulator material (LTCIM) in semiconductor-on-insulator (SOI) structure
US6790748B2 (en) * 2002-12-19 2004-09-14 Intel Corporation Thinning techniques for wafer-to-wafer vertical stacks
FR2860842B1 (fr) * 2003-10-14 2007-11-02 Tracit Technologies Procede de preparation et d'assemblage de substrats
CN2673568Y (zh) * 2004-01-09 2005-01-26 洛阳轴承集团有限公司 杯形泵水砂轮
JP4175650B2 (ja) * 2004-08-26 2008-11-05 シャープ株式会社 半導体装置の製造方法
JP4918229B2 (ja) * 2005-05-31 2012-04-18 信越半導体株式会社 貼り合わせウエーハの製造方法
JP5122731B2 (ja) * 2005-06-01 2013-01-16 信越半導体株式会社 貼り合わせウェーハの製造方法
JP2008073832A (ja) * 2006-09-19 2008-04-03 Add:Kk 薄型ウェハ製作用研削砥石及び研削方法

Also Published As

Publication number Publication date
FR2935535A1 (fr) 2010-03-05
JP2011523779A (ja) 2011-08-18
KR20110007138A (ko) 2011-01-21
WO2010026006A1 (fr) 2010-03-11
CN102017090A (zh) 2011-04-13
KR101185426B1 (ko) 2012-10-02
TW201027608A (en) 2010-07-16
US20110117691A1 (en) 2011-05-19
EP2321842A1 (fr) 2011-05-18

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Legal Events

Date Code Title Description
CD Change of name or company name

Owner name: SOITEC, FR

Effective date: 20120907

ST Notification of lapse

Effective date: 20140530