FR2933532B1 - Dispositif generateur d'ions a resonance cyclotronique electronique - Google Patents

Dispositif generateur d'ions a resonance cyclotronique electronique

Info

Publication number
FR2933532B1
FR2933532B1 FR0854502A FR0854502A FR2933532B1 FR 2933532 B1 FR2933532 B1 FR 2933532B1 FR 0854502 A FR0854502 A FR 0854502A FR 0854502 A FR0854502 A FR 0854502A FR 2933532 B1 FR2933532 B1 FR 2933532B1
Authority
FR
France
Prior art keywords
generating device
ion generating
cyclotron resonance
electronic cyclotron
resonance ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR0854502A
Other languages
English (en)
Other versions
FR2933532A1 (fr
Inventor
Jean Yves Pacquet
Gabriel Gaubert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR0854502A priority Critical patent/FR2933532B1/fr
Priority to JP2011515536A priority patent/JP5715562B2/ja
Priority to US13/002,105 priority patent/US8760055B2/en
Priority to PCT/FR2009/051104 priority patent/WO2010001036A2/fr
Priority to EP09772718.4A priority patent/EP2311061B1/fr
Publication of FR2933532A1 publication Critical patent/FR2933532A1/fr
Application granted granted Critical
Publication of FR2933532B1 publication Critical patent/FR2933532B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
    • H05H3/02—Molecular or atomic beam generation

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
FR0854502A 2008-07-02 2008-07-02 Dispositif generateur d'ions a resonance cyclotronique electronique Active FR2933532B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0854502A FR2933532B1 (fr) 2008-07-02 2008-07-02 Dispositif generateur d'ions a resonance cyclotronique electronique
JP2011515536A JP5715562B2 (ja) 2008-07-02 2009-06-11 電子サイクロトロン共鳴イオン・ゼネレータ
US13/002,105 US8760055B2 (en) 2008-07-02 2009-06-11 Electron cyclotron resonance ion generator
PCT/FR2009/051104 WO2010001036A2 (fr) 2008-07-02 2009-06-11 Dispositif générateur d'ions à résonance cyclotronique électronique
EP09772718.4A EP2311061B1 (fr) 2008-07-02 2009-06-11 Dispositif générateur d'ions à résonance cyclotronique électronique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0854502A FR2933532B1 (fr) 2008-07-02 2008-07-02 Dispositif generateur d'ions a resonance cyclotronique electronique

Publications (2)

Publication Number Publication Date
FR2933532A1 FR2933532A1 (fr) 2010-01-08
FR2933532B1 true FR2933532B1 (fr) 2010-09-03

Family

ID=40342671

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0854502A Active FR2933532B1 (fr) 2008-07-02 2008-07-02 Dispositif generateur d'ions a resonance cyclotronique electronique

Country Status (5)

Country Link
US (1) US8760055B2 (fr)
EP (1) EP2311061B1 (fr)
JP (1) JP5715562B2 (fr)
FR (1) FR2933532B1 (fr)
WO (1) WO2010001036A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2969372B1 (fr) * 2010-12-21 2015-04-17 Commissariat Energie Atomique Dispositif d’ionisation a la resonance cyclotron electronique
FR2985292B1 (fr) * 2011-12-29 2014-01-24 Onera (Off Nat Aerospatiale) Propulseur plasmique et procede de generation d'une poussee propulsive plasmique

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59194407A (ja) * 1983-04-19 1984-11-05 Ulvac Corp 電子サイクロトロン共鳴形イオン源用磁石装置
FR2595868B1 (fr) * 1986-03-13 1988-05-13 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique a injection coaxiale d'ondes electromagnetiques
DE3905303C2 (de) * 1988-02-24 1996-07-04 Hitachi Ltd Vorrichtung zur Erzeugung eines Plasmas durch Mikrowellen
US4883968A (en) * 1988-06-03 1989-11-28 Eaton Corporation Electron cyclotron resonance ion source
JP3010059B2 (ja) * 1990-09-20 2000-02-14 日本真空技術株式会社 イオン源
FR2668642B1 (fr) * 1990-10-25 1993-11-05 Commissariat A Energie Atomique Source d'ions fortement charges a sonde polarisable et a resonance cyclotronique electronique.
JPH04262349A (ja) * 1991-02-15 1992-09-17 Kobe Steel Ltd 多価重イオン源および１価重イオン源
FR2676593B1 (fr) * 1991-05-14 1997-01-03 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique.
JPH069041U (ja) * 1992-07-07 1994-02-04 日新電機株式会社 イオン源
JP2644958B2 (ja) * 1993-04-02 1997-08-25 株式会社日立製作所 イオン源装置およびそのイオン源装置を備えたイオン打ち込み装置
FR2718568B1 (fr) * 1994-04-06 1996-07-05 France Telecom Procédé d'implantation haute énergie à partir d'un implanteur de type faible ou moyen courant et dispositifs correspondants.
FR2757310B1 (fr) 1996-12-18 2006-06-02 Commissariat Energie Atomique Systeme magnetique, en particulier pour les sources ecr, permettant la creation de surfaces fermees d'equimodule b de forme et de dimensions quelconques
JP4249826B2 (ja) * 1998-12-02 2009-04-08 株式会社 Ｓｅｎ−Ｓｈｉ・アクセリス カンパニー Ｅｃｒ用多極永久磁石装置
FR2815954B1 (fr) * 2000-10-27 2003-02-21 Commissariat Energie Atomique Procede et dispositif de depot par plasma a la resonance cyclotron electronique de nanotubes de carbone monoparois et nanotubes ainsi obtenus

Also Published As

Publication number Publication date
US8760055B2 (en) 2014-06-24
EP2311061A2 (fr) 2011-04-20
WO2010001036A3 (fr) 2010-02-25
JP2011526724A (ja) 2011-10-13
JP5715562B2 (ja) 2015-05-07
EP2311061B1 (fr) 2016-11-16
FR2933532A1 (fr) 2010-01-08
US20110210668A1 (en) 2011-09-01
WO2010001036A2 (fr) 2010-01-07

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