FR2853313B1 - Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede - Google Patents

Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede

Info

Publication number
FR2853313B1
FR2853313B1 FR0304192A FR0304192A FR2853313B1 FR 2853313 B1 FR2853313 B1 FR 2853313B1 FR 0304192 A FR0304192 A FR 0304192A FR 0304192 A FR0304192 A FR 0304192A FR 2853313 B1 FR2853313 B1 FR 2853313B1
Authority
FR
France
Prior art keywords
acetylene
installation
carrying
solvent contained
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0304192A
Other languages
English (en)
French (fr)
Other versions
FR2853313A1 (fr
Inventor
Fabrice Delcorso
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Priority to FR0304192A priority Critical patent/FR2853313B1/fr
Priority to EP04721218A priority patent/EP1613575A2/fr
Priority to JP2006505854A priority patent/JP2006522079A/ja
Priority to PCT/FR2004/050112 priority patent/WO2004089859A2/fr
Publication of FR2853313A1 publication Critical patent/FR2853313A1/fr
Application granted granted Critical
Publication of FR2853313B1 publication Critical patent/FR2853313B1/fr
Priority to JP2010186242A priority patent/JP2011021017A/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C7/00—Purification; Separation; Use of additives
    • C07C7/12—Purification; Separation; Use of additives by adsorption, i.e. purification or separation of hydrocarbons with the aid of solids, e.g. with ion-exchangers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Separation Of Gases By Adsorption (AREA)
  • Treatment Of Liquids With Adsorbents In General (AREA)
FR0304192A 2003-04-04 2003-04-04 Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede Expired - Fee Related FR2853313B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0304192A FR2853313B1 (fr) 2003-04-04 2003-04-04 Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede
EP04721218A EP1613575A2 (fr) 2003-04-04 2004-03-17 Procede d elimination d un solvant contenu dans l' acetylene. installation pour la mise en oeuvre du procede
JP2006505854A JP2006522079A (ja) 2003-04-04 2004-03-17 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置
PCT/FR2004/050112 WO2004089859A2 (fr) 2003-04-04 2004-03-17 Procede d'elimination d'un solvant contenu dans l'acetylene. installation pour la mise en oeuvre du procede
JP2010186242A JP2011021017A (ja) 2003-04-04 2010-08-23 アセチレンに含まれる溶媒の除去方法及び前記方法を実施するための装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0304192A FR2853313B1 (fr) 2003-04-04 2003-04-04 Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede

Publications (2)

Publication Number Publication Date
FR2853313A1 FR2853313A1 (fr) 2004-10-08
FR2853313B1 true FR2853313B1 (fr) 2005-05-06

Family

ID=32982233

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0304192A Expired - Fee Related FR2853313B1 (fr) 2003-04-04 2003-04-04 Procede d'elimination d'un solvant contenu dans l'acetylene, installation pour la mise en oeuvre du procede

Country Status (4)

Country Link
EP (1) EP1613575A2 (https=)
JP (2) JP2006522079A (https=)
FR (1) FR2853313B1 (https=)
WO (1) WO2004089859A2 (https=)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8669181B1 (en) 2007-02-22 2014-03-11 Novellus Systems, Inc. Diffusion barrier and etch stop films
US8962101B2 (en) 2007-08-31 2015-02-24 Novellus Systems, Inc. Methods and apparatus for plasma-based deposition
US9023731B2 (en) 2012-05-18 2015-05-05 Novellus Systems, Inc. Carbon deposition-etch-ash gap fill process
US9240320B1 (en) 2008-06-27 2016-01-19 Novellus Systems, Inc. Methods of depositing smooth and conformal ashable hard mask films
US9304396B2 (en) 2013-02-25 2016-04-05 Lam Research Corporation PECVD films for EUV lithography
US9320387B2 (en) 2013-09-30 2016-04-26 Lam Research Corporation Sulfur doped carbon hard masks
US9362133B2 (en) 2012-12-14 2016-06-07 Lam Research Corporation Method for forming a mask by etching conformal film on patterned ashable hardmask
US9589799B2 (en) 2013-09-30 2017-03-07 Lam Research Corporation High selectivity and low stress carbon hardmask by pulsed low frequency RF power

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080242912A1 (en) * 2007-03-29 2008-10-02 Olivier Letessier Methods and Apparatus for Providing a High Purity Acetylene Product
FR2912401A1 (fr) * 2007-07-17 2008-08-15 Air Liquide Nouveau procede d'elimination d'un solvant contenu dans de l'acetylene sous pression. installation pour la mise en oeuvre du procede
FR2915991A1 (fr) * 2007-07-17 2008-11-14 Air Liquide Nouveau procede d'elimination d'un solvant contenu dans de l'acetylene detendu. installation pour la mise en oeuvre du procede
US7820556B2 (en) * 2008-06-04 2010-10-26 Novellus Systems, Inc. Method for purifying acetylene gas for use in semiconductor processes
US8129577B2 (en) 2008-09-16 2012-03-06 Air Products And Chemicals, Inc. Process and system for providing acetylene
KR101493756B1 (ko) * 2008-09-16 2015-02-17 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 아세틸렌을 제공하기 위한 방법 및 시스템
US8398747B2 (en) 2009-06-23 2013-03-19 Praxair Technology, Inc. Processes for purification of acetylene
US8563414B1 (en) 2010-04-23 2013-10-22 Novellus Systems, Inc. Methods for forming conductive carbon films by PECVD
JP6975625B2 (ja) * 2017-11-29 2021-12-01 大陽日酸株式会社 真空浸炭炉用アセチレンガス供給装置及びその供給方法
US11837441B2 (en) 2019-05-29 2023-12-05 Lam Research Corporation Depositing a carbon hardmask by high power pulsed low frequency RF
CN114342043A (zh) 2019-08-30 2022-04-12 朗姆研究公司 低压下的高密度、模量和硬度的非晶碳膜

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES344914A1 (es) * 1967-09-09 1969-02-01 Flix Electro Quimica Procedimiento e instalacion para secado de gases de poca solubilidad inertes frente a salmueras inorganicas y a baja presion.
JPH062682B2 (ja) * 1985-07-18 1994-01-12 日合アセチレン株式会社 アセチレンの精製法およびそれに用いる装置
JPS62285988A (ja) * 1986-06-04 1987-12-11 Nichigou Asechiren Kk 高純度アセチレンガスの提供方法およびそれに用いる精製装置
JPS6446098A (en) * 1987-08-07 1989-02-20 Nichigo Acetylen Method for cleaning inside of container of dissolved acetylene
JP4314015B2 (ja) * 2002-10-31 2009-08-12 ニチゴー日興株式会社 可搬式超高純度アセチレン供給装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8669181B1 (en) 2007-02-22 2014-03-11 Novellus Systems, Inc. Diffusion barrier and etch stop films
US8962101B2 (en) 2007-08-31 2015-02-24 Novellus Systems, Inc. Methods and apparatus for plasma-based deposition
US9240320B1 (en) 2008-06-27 2016-01-19 Novellus Systems, Inc. Methods of depositing smooth and conformal ashable hard mask films
US9023731B2 (en) 2012-05-18 2015-05-05 Novellus Systems, Inc. Carbon deposition-etch-ash gap fill process
US9362133B2 (en) 2012-12-14 2016-06-07 Lam Research Corporation Method for forming a mask by etching conformal film on patterned ashable hardmask
US9304396B2 (en) 2013-02-25 2016-04-05 Lam Research Corporation PECVD films for EUV lithography
US9320387B2 (en) 2013-09-30 2016-04-26 Lam Research Corporation Sulfur doped carbon hard masks
US9589799B2 (en) 2013-09-30 2017-03-07 Lam Research Corporation High selectivity and low stress carbon hardmask by pulsed low frequency RF power

Also Published As

Publication number Publication date
WO2004089859A2 (fr) 2004-10-21
WO2004089859A3 (fr) 2004-11-25
FR2853313A1 (fr) 2004-10-08
JP2011021017A (ja) 2011-02-03
JP2006522079A (ja) 2006-09-28
EP1613575A2 (fr) 2006-01-11

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20131231