FR2792077B1 - Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteur - Google Patents
Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteurInfo
- Publication number
- FR2792077B1 FR2792077B1 FR9904479A FR9904479A FR2792077B1 FR 2792077 B1 FR2792077 B1 FR 2792077B1 FR 9904479 A FR9904479 A FR 9904479A FR 9904479 A FR9904479 A FR 9904479A FR 2792077 B1 FR2792077 B1 FR 2792077B1
- Authority
- FR
- France
- Prior art keywords
- installation
- electronic circuit
- microscopic observation
- semiconductor electronic
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000009434 installation Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
- G01R31/311—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
- H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
- H01J2237/2817—Pattern inspection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Biochemistry (AREA)
- Pathology (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Toxicology (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- General Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9904479A FR2792077B1 (fr) | 1999-04-09 | 1999-04-09 | Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteur |
US09/684,436 US6552341B1 (en) | 1999-04-09 | 2000-10-10 | Installation and method for microscopic observation of a semiconductor electronic circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9904479A FR2792077B1 (fr) | 1999-04-09 | 1999-04-09 | Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteur |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2792077A1 FR2792077A1 (fr) | 2000-10-13 |
FR2792077B1 true FR2792077B1 (fr) | 2001-06-29 |
Family
ID=9544239
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9904479A Expired - Fee Related FR2792077B1 (fr) | 1999-04-09 | 1999-04-09 | Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteur |
Country Status (2)
Country | Link |
---|---|
US (1) | US6552341B1 (fr) |
FR (1) | FR2792077B1 (fr) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7355709B1 (en) * | 2004-02-23 | 2008-04-08 | Kla-Tencor Technologies Corp. | Methods and systems for optical and non-optical measurements of a substrate |
US20070145267A1 (en) * | 2005-12-12 | 2007-06-28 | Adler David L | Portable scanning electron microscope |
WO2007070475A2 (fr) * | 2005-12-12 | 2007-06-21 | Kla-Tencor Technologies Corporation | Microscope electronique a balayage a optique electronique de type tube a rayons cathodiques (crt) |
FR2902525B1 (fr) * | 2006-06-19 | 2008-09-12 | Cnes Epic | Procede d'analyse d'un circuit integre, procede d'observation et leurs installations associees. |
EP1998206A3 (fr) * | 2007-05-31 | 2009-12-09 | FEI Company | Porte-échantillon pour un appareil à particules chargées, son procédé d'utilisation, et appareil équipé pour une telle utilisation |
JP2008300354A (ja) * | 2007-05-31 | 2008-12-11 | Fei Co | 荷電粒子装置内での試料キャリアの使用、当該試料キャリアの使用方法、及び当該試料キャリアを用いるように備えられた装置 |
JP2009250904A (ja) | 2008-04-10 | 2009-10-29 | Jeol Ltd | 検査装置及び検査方法 |
US8729470B2 (en) * | 2009-06-14 | 2014-05-20 | DLA Instruments | Electron microscope with an emitter operating in medium vacuum |
EP2896061B1 (fr) * | 2012-09-14 | 2023-06-28 | Delmic Ip B.V. | Appareil d'inspection de particules chargées et optique intégrée |
CN104865692B (zh) * | 2015-05-29 | 2017-07-11 | 上海理工大学 | 真空冷却用显微镜 |
US10176963B2 (en) | 2016-12-09 | 2019-01-08 | Waviks, Inc. | Method and apparatus for alignment of optical and charged-particle beams in an electron microscope |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2130433B (en) * | 1982-03-05 | 1986-02-05 | Jeol Ltd | Scanning electron microscope with as optical microscope |
JPS61168853A (ja) * | 1985-01-23 | 1986-07-30 | Hitachi Ltd | 検査装置 |
US5220403A (en) * | 1991-03-11 | 1993-06-15 | International Business Machines Corporation | Apparatus and a method for high numerical aperture microscopic examination of materials |
JPH06283127A (ja) * | 1993-03-26 | 1994-10-07 | Mitsubishi Electric Corp | 裏面解析観察装置 |
JP3231516B2 (ja) * | 1993-10-12 | 2001-11-26 | セイコーインスツルメンツ株式会社 | 電子線マイクロアナライザ |
JPH10214583A (ja) * | 1997-01-30 | 1998-08-11 | Hitachi Ltd | 走査形電子顕微鏡 |
-
1999
- 1999-04-09 FR FR9904479A patent/FR2792077B1/fr not_active Expired - Fee Related
-
2000
- 2000-10-10 US US09/684,436 patent/US6552341B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2792077A1 (fr) | 2000-10-13 |
US6552341B1 (en) | 2003-04-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20151231 |