FR2792077B1 - Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteur - Google Patents

Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteur

Info

Publication number
FR2792077B1
FR2792077B1 FR9904479A FR9904479A FR2792077B1 FR 2792077 B1 FR2792077 B1 FR 2792077B1 FR 9904479 A FR9904479 A FR 9904479A FR 9904479 A FR9904479 A FR 9904479A FR 2792077 B1 FR2792077 B1 FR 2792077B1
Authority
FR
France
Prior art keywords
installation
electronic circuit
microscopic observation
semiconductor electronic
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9904479A
Other languages
English (en)
Other versions
FR2792077A1 (fr
Inventor
Romain Deplats
Bruno Benteo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National dEtudes Spatiales CNES
Original Assignee
Centre National dEtudes Spatiales CNES
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National dEtudes Spatiales CNES filed Critical Centre National dEtudes Spatiales CNES
Priority to FR9904479A priority Critical patent/FR2792077B1/fr
Priority to US09/684,436 priority patent/US6552341B1/en
Publication of FR2792077A1 publication Critical patent/FR2792077A1/fr
Application granted granted Critical
Publication of FR2792077B1 publication Critical patent/FR2792077B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • G01N21/95684Patterns showing highly reflecting parts, e.g. metallic elements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302Contactless testing
    • G01R31/308Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • G01R31/311Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications
    • G02B21/0016Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H01J37/228Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/28Scanning microscopes
    • H01J2237/2813Scanning microscopes characterised by the application
    • H01J2237/2817Pattern inspection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Toxicology (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • General Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
FR9904479A 1999-04-09 1999-04-09 Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteur Expired - Fee Related FR2792077B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR9904479A FR2792077B1 (fr) 1999-04-09 1999-04-09 Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteur
US09/684,436 US6552341B1 (en) 1999-04-09 2000-10-10 Installation and method for microscopic observation of a semiconductor electronic circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9904479A FR2792077B1 (fr) 1999-04-09 1999-04-09 Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteur

Publications (2)

Publication Number Publication Date
FR2792077A1 FR2792077A1 (fr) 2000-10-13
FR2792077B1 true FR2792077B1 (fr) 2001-06-29

Family

ID=9544239

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9904479A Expired - Fee Related FR2792077B1 (fr) 1999-04-09 1999-04-09 Installation et procede d'observation microscopique d'un circuit electronique a semi-conducteur

Country Status (2)

Country Link
US (1) US6552341B1 (fr)
FR (1) FR2792077B1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7355709B1 (en) * 2004-02-23 2008-04-08 Kla-Tencor Technologies Corp. Methods and systems for optical and non-optical measurements of a substrate
US20070145267A1 (en) * 2005-12-12 2007-06-28 Adler David L Portable scanning electron microscope
WO2007070475A2 (fr) * 2005-12-12 2007-06-21 Kla-Tencor Technologies Corporation Microscope electronique a balayage a optique electronique de type tube a rayons cathodiques (crt)
FR2902525B1 (fr) * 2006-06-19 2008-09-12 Cnes Epic Procede d'analyse d'un circuit integre, procede d'observation et leurs installations associees.
EP1998206A3 (fr) * 2007-05-31 2009-12-09 FEI Company Porte-échantillon pour un appareil à particules chargées, son procédé d'utilisation, et appareil équipé pour une telle utilisation
JP2008300354A (ja) * 2007-05-31 2008-12-11 Fei Co 荷電粒子装置内での試料キャリアの使用、当該試料キャリアの使用方法、及び当該試料キャリアを用いるように備えられた装置
JP2009250904A (ja) 2008-04-10 2009-10-29 Jeol Ltd 検査装置及び検査方法
US8729470B2 (en) * 2009-06-14 2014-05-20 DLA Instruments Electron microscope with an emitter operating in medium vacuum
EP2896061B1 (fr) * 2012-09-14 2023-06-28 Delmic Ip B.V. Appareil d'inspection de particules chargées et optique intégrée
CN104865692B (zh) * 2015-05-29 2017-07-11 上海理工大学 真空冷却用显微镜
US10176963B2 (en) 2016-12-09 2019-01-08 Waviks, Inc. Method and apparatus for alignment of optical and charged-particle beams in an electron microscope

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2130433B (en) * 1982-03-05 1986-02-05 Jeol Ltd Scanning electron microscope with as optical microscope
JPS61168853A (ja) * 1985-01-23 1986-07-30 Hitachi Ltd 検査装置
US5220403A (en) * 1991-03-11 1993-06-15 International Business Machines Corporation Apparatus and a method for high numerical aperture microscopic examination of materials
JPH06283127A (ja) * 1993-03-26 1994-10-07 Mitsubishi Electric Corp 裏面解析観察装置
JP3231516B2 (ja) * 1993-10-12 2001-11-26 セイコーインスツルメンツ株式会社 電子線マイクロアナライザ
JPH10214583A (ja) * 1997-01-30 1998-08-11 Hitachi Ltd 走査形電子顕微鏡

Also Published As

Publication number Publication date
FR2792077A1 (fr) 2000-10-13
US6552341B1 (en) 2003-04-22

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20151231