FR2791472B1 - Procede de creation de lignes de connexion et de points de contact sous-jacents dans un substrat dielectrique - Google Patents

Procede de creation de lignes de connexion et de points de contact sous-jacents dans un substrat dielectrique

Info

Publication number
FR2791472B1
FR2791472B1 FR9903819A FR9903819A FR2791472B1 FR 2791472 B1 FR2791472 B1 FR 2791472B1 FR 9903819 A FR9903819 A FR 9903819A FR 9903819 A FR9903819 A FR 9903819A FR 2791472 B1 FR2791472 B1 FR 2791472B1
Authority
FR
France
Prior art keywords
dielectric substrate
contact points
connection lines
underlying contact
creating connection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9903819A
Other languages
English (en)
Other versions
FR2791472A1 (fr
Inventor
Yorick Trouiller
Olivier Demolliens
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR9903819A priority Critical patent/FR2791472B1/fr
Priority to PCT/FR2000/000717 priority patent/WO2000059030A1/fr
Priority to EP00912726A priority patent/EP1177577A1/fr
Publication of FR2791472A1 publication Critical patent/FR2791472A1/fr
Application granted granted Critical
Publication of FR2791472B1 publication Critical patent/FR2791472B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
    • H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
    • H01L21/76811—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures involving multiple stacked pre-patterned masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0332—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their composition, e.g. multilayer masks, materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31144—Etching the insulating layers by chemical or physical means using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
    • H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
    • H01L21/76813—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures involving a partial via etch

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
FR9903819A 1999-03-26 1999-03-26 Procede de creation de lignes de connexion et de points de contact sous-jacents dans un substrat dielectrique Expired - Fee Related FR2791472B1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR9903819A FR2791472B1 (fr) 1999-03-26 1999-03-26 Procede de creation de lignes de connexion et de points de contact sous-jacents dans un substrat dielectrique
PCT/FR2000/000717 WO2000059030A1 (fr) 1999-03-26 2000-03-22 Procede de creation de lignes de connexion et de points de contact sous-jacents dans un substrat dielectrique
EP00912726A EP1177577A1 (fr) 1999-03-26 2000-03-22 Procede de creation de lignes de connexion et de points de contact sous-jacents dans un substrat dielectrique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9903819A FR2791472B1 (fr) 1999-03-26 1999-03-26 Procede de creation de lignes de connexion et de points de contact sous-jacents dans un substrat dielectrique

Publications (2)

Publication Number Publication Date
FR2791472A1 FR2791472A1 (fr) 2000-09-29
FR2791472B1 true FR2791472B1 (fr) 2002-07-05

Family

ID=9543692

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9903819A Expired - Fee Related FR2791472B1 (fr) 1999-03-26 1999-03-26 Procede de creation de lignes de connexion et de points de contact sous-jacents dans un substrat dielectrique

Country Status (3)

Country Link
EP (1) EP1177577A1 (fr)
FR (1) FR2791472B1 (fr)
WO (1) WO2000059030A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1212794A2 (fr) * 1999-08-25 2002-06-12 Infineon Technologies AG Procede de production d'un circuit integre comportant au moins un plan de metallisation
US20070018286A1 (en) * 2005-07-14 2007-01-25 Asml Netherlands B.V. Substrate, lithographic multiple exposure method, machine readable medium

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0184158B1 (ko) * 1996-07-13 1999-04-15 문정환 반도체장치의 자기 정합정 금속 배선 형성 방법
US5821169A (en) * 1996-08-05 1998-10-13 Sharp Microelectronics Technology,Inc. Hard mask method for transferring a multi-level photoresist pattern
US5935762A (en) * 1997-10-14 1999-08-10 Industrial Technology Research Institute Two-layered TSI process for dual damascene patterning
US5877076A (en) * 1997-10-14 1999-03-02 Industrial Technology Research Institute Opposed two-layered photoresist process for dual damascene patterning

Also Published As

Publication number Publication date
WO2000059030A1 (fr) 2000-10-05
EP1177577A1 (fr) 2002-02-06
FR2791472A1 (fr) 2000-09-29

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20141128