FR2753576B1 - Procede de fabrication d'un laser semiconducteur a emission de surface - Google Patents
Procede de fabrication d'un laser semiconducteur a emission de surfaceInfo
- Publication number
- FR2753576B1 FR2753576B1 FR9611198A FR9611198A FR2753576B1 FR 2753576 B1 FR2753576 B1 FR 2753576B1 FR 9611198 A FR9611198 A FR 9611198A FR 9611198 A FR9611198 A FR 9611198A FR 2753576 B1 FR2753576 B1 FR 2753576B1
- Authority
- FR
- France
- Prior art keywords
- manufacturing
- semiconductor laser
- surface emitting
- emitting semiconductor
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18341—Intra-cavity contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2302/00—Amplification / lasing wavelength
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
- H01S5/0207—Substrates having a special shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9611198A FR2753576B1 (fr) | 1996-09-13 | 1996-09-13 | Procede de fabrication d'un laser semiconducteur a emission de surface |
FR9703413A FR2753577B1 (fr) | 1996-09-13 | 1997-03-20 | Procede de fabrication d'un composant optoelectronique a semiconducteur et composant et matrice de composants fabriques selon ce procede |
AT97402081T ATE233443T1 (de) | 1996-09-13 | 1997-09-08 | Herstellungsverfahren einer optoelektrischen halbleitervorrichtung, und vorrichtung oder matrix von vorrichtungen hergestellt unter verwendung dieses verfahrens |
EP97402081A EP0829934B1 (fr) | 1996-09-13 | 1997-09-08 | Procédé de fabrication d'un composant optoélectronique à semiconducteur et composant ou matrice de composants fabriqués selon ce procédé |
DE69719268T DE69719268T2 (de) | 1996-09-13 | 1997-09-08 | Herstellungsverfahren einer optoelektrischen Halbleitervorrichtung, und Vorrichtung oder Matrix von Vorrichtungen hergestellt unter Verwendung dieses Verfahrens |
AU37457/97A AU3745797A (en) | 1996-09-13 | 1997-09-10 | Process for fabricating a semiconductor opto-electronic component |
US08/928,647 US6046065A (en) | 1996-09-13 | 1997-09-12 | Process for fabricating a semiconductor opto-electronic component and component and matrix of components fabricated by this process |
JP9249069A JPH10107389A (ja) | 1996-09-13 | 1997-09-12 | 半導体光電子素子の製造方法およびこの方法によって製造される素子および素子マトリックス |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9611198A FR2753576B1 (fr) | 1996-09-13 | 1996-09-13 | Procede de fabrication d'un laser semiconducteur a emission de surface |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2753576A1 FR2753576A1 (fr) | 1998-03-20 |
FR2753576B1 true FR2753576B1 (fr) | 1998-11-13 |
Family
ID=9495720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9611198A Expired - Fee Related FR2753576B1 (fr) | 1996-09-13 | 1996-09-13 | Procede de fabrication d'un laser semiconducteur a emission de surface |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2753576B1 (fr) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01179798A (ja) * | 1988-01-07 | 1989-07-17 | Nec Corp | 半導体結晶成長方法 |
JPH01179797A (ja) * | 1988-01-07 | 1989-07-17 | Nec Corp | 半導体結晶成長方法 |
JP2871288B2 (ja) * | 1992-04-10 | 1999-03-17 | 日本電気株式会社 | 面型光半導体素子およびその製造方法 |
-
1996
- 1996-09-13 FR FR9611198A patent/FR2753576B1/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2753576A1 (fr) | 1998-03-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2743196B1 (fr) | Procede de fabrication d'un laser semi-conducteur a emission par la surface | |
FR2743195B1 (fr) | Laser semi-conducteur a emission par la surface | |
FR2761822B1 (fr) | Laser semiconducteur a emission de surface | |
IT9021551A0 (it) | Metodo per la fabbricazione di un semiconduttore | |
DE69726322D1 (de) | Seitliche Strombegrenzung für einen oberflächenemittierenden Laser | |
DE69404701T2 (de) | Abstimmbarer oberflächenemittierender Halbleiterlaser | |
FR2740371B1 (fr) | Procede de fabrication d'une pale | |
FR2825834B1 (fr) | Procede de fabrication d'un disositif a semi-conducteur | |
DE69118066D1 (de) | Oberflächenemittierender Halbleiterlaser | |
FR2675312B1 (fr) | Procede de fabrication d'une diode laser en gaas emettant de la lumiere visible. | |
DE69828760D1 (de) | Herstellungsverfahren eines oberflächenemittierenden Halbleiterlasers mit vertikalem Resonator | |
ITGE940122A0 (it) | Macchina per la fabbricazione di granite. | |
DE69428578D1 (de) | Herstellungsverfahren für lichtemittierenden Halbleitervorrichtungen | |
DE69522778D1 (de) | Oberflächenemittierender Laser | |
FR2753117B1 (fr) | Procede de fabrication d'une structure stratifiee | |
FR2750804B1 (fr) | Procede de fabrication d'un laser a emission par la surface | |
FR2688637B1 (fr) | Laser de puissance a emission par la surface et procede de fabrication de ce laser. | |
DE69500371T2 (de) | Multi-Quantumwell-Halbleiterlaser | |
FR2574601B1 (fr) | Procede de fabrication d'un laser a semi-conducteur a ruban enterre | |
FR2786939B1 (fr) | Laser a semi-conducteur et son procede de fabrication | |
DE69610522T2 (de) | Oberflächenemittierender Laser mit verbessertem Wirkungsgrad | |
DE69902412T2 (de) | Oberflächenemittierender Laser | |
FR2767274B1 (fr) | Procede de fabrication d'un piston | |
GB9006850D0 (en) | A method for manufacturing a buried heterostructure laser diode | |
FR2748847B1 (fr) | Procede de fabrication d'une cathode froide a emission de champ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
CD | Change of name or company name | ||
ST | Notification of lapse |