FR2705479B1 - Procédé et appareil de reconnaissance de formes. - Google Patents

Procédé et appareil de reconnaissance de formes.

Info

Publication number
FR2705479B1
FR2705479B1 FR9405907A FR9405907A FR2705479B1 FR 2705479 B1 FR2705479 B1 FR 2705479B1 FR 9405907 A FR9405907 A FR 9405907A FR 9405907 A FR9405907 A FR 9405907A FR 2705479 B1 FR2705479 B1 FR 2705479B1
Authority
FR
France
Prior art keywords
pattern recognition
recognition
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9405907A
Other languages
English (en)
Other versions
FR2705479A1 (fr
Inventor
Ken-Ichi Tanaka
Masako Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of FR2705479A1 publication Critical patent/FR2705479A1/fr
Application granted granted Critical
Publication of FR2705479B1 publication Critical patent/FR2705479B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • G06T7/001Industrial image inspection using an image reference approach
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/10Image acquisition modality
    • G06T2207/10056Microscopic image
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Analysis (AREA)
  • Image Processing (AREA)
FR9405907A 1993-05-17 1994-05-13 Procédé et appareil de reconnaissance de formes. Expired - Fee Related FR2705479B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5114807A JPH06325181A (ja) 1993-05-17 1993-05-17 パターン認識方法

Publications (2)

Publication Number Publication Date
FR2705479A1 FR2705479A1 (fr) 1994-11-25
FR2705479B1 true FR2705479B1 (fr) 1995-11-24

Family

ID=14647186

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9405907A Expired - Fee Related FR2705479B1 (fr) 1993-05-17 1994-05-13 Procédé et appareil de reconnaissance de formes.

Country Status (4)

Country Link
US (1) US5568563A (fr)
JP (1) JPH06325181A (fr)
DE (1) DE4416801C2 (fr)
FR (1) FR2705479B1 (fr)

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US6381375B1 (en) 1998-02-20 2002-04-30 Cognex Corporation Methods and apparatus for generating a projection of an image
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US6577757B1 (en) * 1999-07-28 2003-06-10 Intelligent Reasoning Systems, Inc. System and method for dynamic image recognition
US6614924B1 (en) * 1999-08-02 2003-09-02 Applied Materials, Inc. Adaptive mask technique for defect inspection
US6912304B1 (en) * 1999-08-02 2005-06-28 Applied Materials, Inc. Two-dimensional scatter plot technique for defect inspection
US6522776B1 (en) * 1999-08-17 2003-02-18 Advanced Micro Devices, Inc. Method for automated determination of reticle tilt in a lithographic system
JP3813772B2 (ja) 1999-09-27 2006-08-23 株式会社ルネサステクノロジ 半導体装置の製造方法
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US6684402B1 (en) 1999-12-01 2004-01-27 Cognex Technology And Investment Corporation Control methods and apparatus for coupling multiple image acquisition devices to a digital data processor
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WO2005010561A2 (fr) * 2003-07-22 2005-02-03 L-3 Communications Security and Detection Systems Corporation Procedes et appareil pour detecter des objets dans des bagages
US7190834B2 (en) 2003-07-22 2007-03-13 Cognex Technology And Investment Corporation Methods for finding and characterizing a deformed pattern in an image
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US6865435B1 (en) * 2003-09-08 2005-03-08 Lsi Logic Corporation Method of translating a net description of an integrated circuit die
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JP4791141B2 (ja) * 2005-10-25 2011-10-12 株式会社日立ハイテクノロジーズ 電子線式寸法計測装置及びそれを用いた寸法計測方法
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CN101432864B (zh) * 2006-04-27 2012-05-30 夏普株式会社 缺陷分布分类方法及系统、故障源设备确定方法及系统
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CN101923123B (zh) * 2009-06-16 2012-08-22 中芯国际集成电路制造(上海)有限公司 相似性检测方法和装置
US9177370B2 (en) * 2012-03-12 2015-11-03 Kla-Tencor Corporation Systems and methods of advanced site-based nanotopography for wafer surface metrology
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Also Published As

Publication number Publication date
DE4416801A1 (de) 1994-12-01
US5568563A (en) 1996-10-22
FR2705479A1 (fr) 1994-11-25
JPH06325181A (ja) 1994-11-25
DE4416801C2 (de) 1996-10-24

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D6 Patent endorsed licences of rights
ST Notification of lapse