FR2698884B1 - - Google Patents

Info

Publication number
FR2698884B1
FR2698884B1 FR9314524A FR9314524A FR2698884B1 FR 2698884 B1 FR2698884 B1 FR 2698884B1 FR 9314524 A FR9314524 A FR 9314524A FR 9314524 A FR9314524 A FR 9314524A FR 2698884 B1 FR2698884 B1 FR 2698884B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9314524A
Other languages
French (fr)
Other versions
FR2698884A1 (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of FR2698884A1 publication Critical patent/FR2698884A1/fr
Application granted granted Critical
Publication of FR2698884B1 publication Critical patent/FR2698884B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
    • C23C14/0052—Bombardment of substrates by reactive ion beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR9314524A 1992-12-03 1993-12-03 Dépôt de différents matériaux sur un substrat. Granted FR2698884A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB929225270A GB9225270D0 (en) 1992-12-03 1992-12-03 Depositing different materials on a substrate

Publications (2)

Publication Number Publication Date
FR2698884A1 FR2698884A1 (fr) 1994-06-10
FR2698884B1 true FR2698884B1 (US07943777-20110517-C00090.png) 1997-02-07

Family

ID=10726049

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9314524A Granted FR2698884A1 (fr) 1992-12-03 1993-12-03 Dépôt de différents matériaux sur un substrat.

Country Status (7)

Country Link
US (1) US5454919A (US07943777-20110517-C00090.png)
JP (1) JPH06220635A (US07943777-20110517-C00090.png)
CA (1) CA2110250C (US07943777-20110517-C00090.png)
CH (1) CH687464A5 (US07943777-20110517-C00090.png)
DE (1) DE4341173B4 (US07943777-20110517-C00090.png)
FR (1) FR2698884A1 (US07943777-20110517-C00090.png)
GB (1) GB9225270D0 (US07943777-20110517-C00090.png)

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DE19505258C2 (de) * 1995-02-16 1998-08-06 Samsung Electronics Co Ltd Beschichtungsvorrichtung
DE19630705A1 (de) 1995-08-30 1997-03-20 Deutsche Telekom Ag Verfahren zur Herstellung von 3-dimensional strukturierten Polymerschichten für die integrierte Optik
EP0847545B1 (de) 1995-08-30 2000-02-16 Deutsche Telekom AG Verfahren zur verbesserung des kontrastes bei der strukturierung von 3-dimensionalen oberflächen
DE19632563A1 (de) * 1996-01-04 1997-07-10 Deutsche Telekom Ag Verfahren und Vorrichtung zur Herstellung strukturierter lambda/4-Plättchen, Spiegel, Gitter und Prismen auf dreidimensionalen Flächen
US5735862A (en) * 1996-09-23 1998-04-07 Jennings; Erwin Reeves Semi-automatic suturing and sewing device
GB2321063A (en) * 1997-01-08 1998-07-15 Oxford Plasma Technology Ltd Reactive particle beam sputtering
US6190511B1 (en) * 1997-03-13 2001-02-20 David T. Wei Method and apparatus for ion beam sputter deposition of thin films
US6063244A (en) * 1998-05-21 2000-05-16 International Business Machines Corporation Dual chamber ion beam sputter deposition system
GB9901093D0 (en) * 1999-01-20 1999-03-10 Marconi Electronic Syst Ltd Method of making coatings
US6214183B1 (en) * 1999-01-30 2001-04-10 Advanced Ion Technology, Inc. Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials
US6503564B1 (en) * 1999-02-26 2003-01-07 3M Innovative Properties Company Method of coating microstructured substrates with polymeric layer(s), allowing preservation of surface feature profile
US6172810B1 (en) 1999-02-26 2001-01-09 3M Innovative Properties Company Retroreflective articles having polymer multilayer reflective coatings
US6296741B1 (en) * 1999-06-25 2001-10-02 International Business Machines Corporation Method of making oxide barrier layer for a spin tunnel junction
US6224718B1 (en) 1999-07-14 2001-05-01 Veeco Instruments, Inc. Target assembly for ion beam sputter deposition with multiple paddles each having targets on both sides
KR100897771B1 (ko) * 2001-03-13 2009-05-15 도쿄엘렉트론가부시키가이샤 막형성방법 및 막형성장치
US6679976B2 (en) 2001-03-16 2004-01-20 4Wave, Inc. System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals
US6402900B1 (en) * 2001-03-16 2002-06-11 4 Wave, Inc. System and method for performing sputter deposition using ion sources, targets and a substrate arranged about the faces of a cube
US6750156B2 (en) 2001-10-24 2004-06-15 Applied Materials, Inc. Method and apparatus for forming an anti-reflective coating on a substrate
TW531773B (en) * 2002-02-08 2003-05-11 Au Optronics Corp Equipment for alignment film manufacturing
GB0222331D0 (en) * 2002-09-26 2002-10-30 Teer Coatings Ltd A method for depositing multilayer coatings with controlled thickness
US6783637B2 (en) * 2002-10-31 2004-08-31 Freescale Semiconductor, Inc. High throughput dual ion beam deposition apparatus
US7172681B2 (en) * 2003-02-05 2007-02-06 Bridgestone Corporation Process for producing rubber-based composite material
FR2856677B1 (fr) * 2003-06-27 2006-12-01 Saint Gobain Substrat revetu d'une couche dielectrique et procede pour sa fabrication
FR2857467B1 (fr) * 2003-07-09 2005-08-19 Saint Gobain Dispositif electrocommandable a proprietes optiques et/ou energetiques variables
JP4775968B2 (ja) * 2007-08-22 2011-09-21 インターナショナル・ビジネス・マシーンズ・コーポレーション 配向膜形成装置及び方法
FR2971261B1 (fr) * 2011-02-08 2013-09-20 Centre Nat Rech Scient Dispositif et procede de pulverisation ionique
EP4219788A1 (en) 2014-06-30 2023-08-02 Halliburton Energy Services, Inc. Deposition of integrated computational elements (ice) using a translation stage
MX2016014265A (es) 2014-06-30 2017-02-06 Halliburton Energy Services Inc Sistema y metodo para depositar de elementos informaticos integrados (ice, por su sigla en ingles) utilizando una etapa de traslado.
WO2017095731A2 (en) * 2015-12-02 2017-06-08 Sabic Global Technologies B.V. Application of multiple plasma coating layers in a continuous vacuum
CN105861994A (zh) * 2016-04-13 2016-08-17 广东鸿鹄高飞科技发展有限公司 一种现代发动机智能瞬间离子镀复新技术

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GB953556A (en) * 1959-12-31 1964-03-25 Siemens Ag Improvements in or relating to the preparation of the surfaces of metals or semi-conductor bodies
FR2082217A5 (en) * 1970-03-06 1971-12-10 Cit Alcatel Substrate coating by cathodic sputtering andevaporation
FR2183603B1 (US07943777-20110517-C00090.png) * 1972-05-12 1974-08-30 Cit Alcatel
DE2307649B2 (de) * 1973-02-16 1980-07-31 Robert Bosch Gmbh, 7000 Stuttgart Anordnung zum Aufstäuben verschiedener Materialien auf einem Substrat
DE2642599A1 (de) * 1976-09-22 1978-03-23 Siemens Ag Verfahren zur herstellung von implantierten gebieten in einem substrat
JPS5385153A (en) * 1977-01-06 1978-07-27 Mitsubishi Electric Corp Forming method for light reflective metallic film and heat absorbent material film on face panel inside and its unit
US4142958A (en) * 1978-04-13 1979-03-06 Litton Systems, Inc. Method for fabricating multi-layer optical films
US4604181A (en) * 1984-09-14 1986-08-05 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Apparatus for producing oxidation protection coatings for polymers
JPS62158863A (ja) * 1985-12-30 1987-07-14 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 被膜形成装置
US4793908A (en) * 1986-12-29 1988-12-27 Rockwell International Corporation Multiple ion source method and apparatus for fabricating multilayer optical films
JPS63290271A (ja) * 1987-05-20 1988-11-28 Seiko Epson Corp スパッタ装置のタ−ゲット部シャッタ
JPH0774441B2 (ja) * 1987-06-05 1995-08-09 株式会社日立製作所 イオンビ−ムスパツタ装置
US5015353A (en) * 1987-09-30 1991-05-14 The United States Of America As Represented By The Secretary Of The Navy Method for producing substoichiometric silicon nitride of preselected proportions
DE8801079U1 (de) * 1988-01-29 1989-06-01 INTERATOM GmbH, 5060 Bergisch Gladbach Beschichtungskammer mit Einrichtung zur Regelung der Zusammensetzung einer Gasatmosphäre
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
JPH01268859A (ja) * 1988-04-20 1989-10-26 Casio Comput Co Ltd 透明導電膜の形成方法および形成装置
US5080455A (en) * 1988-05-17 1992-01-14 William James King Ion beam sputter processing
EP0390692A3 (en) * 1989-03-29 1991-10-02 Terumo Kabushiki Kaisha Method of forming thin film, apparatus for forming thin film and sensor
DE3920835C2 (de) * 1989-06-24 1997-12-18 Leybold Ag Einrichtung zum Beschichten von Substraten
EP0409451A1 (en) * 1989-07-18 1991-01-23 Optical Coating Laboratory, Inc. Process for depositing optical thin films on both planar and non-planar substrates
EP0410627A1 (en) * 1989-07-27 1991-01-30 Kabushiki Kaisha Toshiba Oxide film with preferred crystal orientation, method of manufacturing the same, and magneto-optical recording medium
EP0716160B1 (en) * 1989-11-13 2000-01-26 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
DE69021337T2 (de) * 1989-11-17 1996-01-25 Nissin Electric Co Ltd Verfahren zum Bilden einer Bornitrid enthaltenden Borschicht, Magnetkopf und Verfahren zu dessen Herstellung.
JP2713481B2 (ja) * 1989-12-04 1998-02-16 株式会社日立製作所 イオンビームスパッタによる多元系薄膜形成方法および多元系薄膜形成装置
US5229194A (en) * 1991-12-09 1993-07-20 Guardian Industries Corp. Heat treatable sputter-coated glass systems
US5240583A (en) * 1992-01-14 1993-08-31 Honeywell Inc. Apparatus to deposit multilayer films
US5308461A (en) * 1992-01-14 1994-05-03 Honeywell Inc. Method to deposit multilayer films

Also Published As

Publication number Publication date
GB9225270D0 (en) 1993-01-27
CA2110250A1 (en) 1994-06-04
FR2698884A1 (fr) 1994-06-10
CH687464A5 (fr) 1996-12-13
DE4341173A1 (de) 1994-06-09
DE4341173B4 (de) 2004-03-04
JPH06220635A (ja) 1994-08-09
CA2110250C (en) 2004-08-24
US5454919A (en) 1995-10-03

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Legal Events

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CD Change of name or company name
ST Notification of lapse

Effective date: 20060831