FR2687232B1 - Procede de developpement et attaque simultanes de couches stratifiees a base de resine photosensible et de polyimide. - Google Patents

Procede de developpement et attaque simultanes de couches stratifiees a base de resine photosensible et de polyimide.

Info

Publication number
FR2687232B1
FR2687232B1 FR9301397A FR9301397A FR2687232B1 FR 2687232 B1 FR2687232 B1 FR 2687232B1 FR 9301397 A FR9301397 A FR 9301397A FR 9301397 A FR9301397 A FR 9301397A FR 2687232 B1 FR2687232 B1 FR 2687232B1
Authority
FR
France
Prior art keywords
attack
polyimide
photosensitive resin
laminated layers
layers based
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9301397A
Other languages
English (en)
French (fr)
Other versions
FR2687232A1 (fr
Inventor
Marion Weigand
Neville Eilbeck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of FR2687232A1 publication Critical patent/FR2687232A1/fr
Application granted granted Critical
Publication of FR2687232B1 publication Critical patent/FR2687232B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
FR9301397A 1992-02-10 1993-02-09 Procede de developpement et attaque simultanes de couches stratifiees a base de resine photosensible et de polyimide. Expired - Fee Related FR2687232B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19924203781 DE4203781C1 (enExample) 1992-02-10 1992-02-10

Publications (2)

Publication Number Publication Date
FR2687232A1 FR2687232A1 (fr) 1993-08-13
FR2687232B1 true FR2687232B1 (fr) 1994-09-16

Family

ID=6451305

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9301397A Expired - Fee Related FR2687232B1 (fr) 1992-02-10 1993-02-09 Procede de developpement et attaque simultanes de couches stratifiees a base de resine photosensible et de polyimide.

Country Status (3)

Country Link
DE (1) DE4203781C1 (enExample)
FR (1) FR2687232B1 (enExample)
GB (1) GB2263981A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2265021B (en) * 1992-03-10 1996-02-14 Nippon Steel Chemical Co Photosensitive materials and their use in forming protective layers for printed circuit and process for preparation of printed circuit
JPH09306901A (ja) * 1996-05-17 1997-11-28 Nec Corp 半導体装置の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120032A (en) * 1979-03-09 1980-09-16 Daicel Chem Ind Ltd Treating solution for photosensitive laminate having alcohol-soluble polyamide layer
JPS57124349A (en) * 1981-01-24 1982-08-03 Kimoto & Co Ltd Image formation method
US4426253A (en) * 1981-12-03 1984-01-17 E. I. Du Pont De Nemours & Co. High speed etching of polyimide film
DE3580827D1 (de) * 1984-10-09 1991-01-17 Hoechst Japan K K Verfahren zum entwickeln und zum entschichten von photoresistschichten mit quaternaeren ammomiumverbindungen.
DE3705896A1 (de) * 1986-02-24 1987-08-27 Tokyo Ohka Kogyo Co Ltd Verfahren zur herstellung eines fotoresistmusters auf einer substratflaeche und ein dafuer geeignetes schaumentfernungsmittel
JPS6362322A (ja) * 1986-09-03 1988-03-18 Matsushita Electronics Corp 半導体素子の製造方法
US4782009A (en) * 1987-04-03 1988-11-01 General Electric Company Method of coating and imaging photopatternable silicone polyamic acid
JPH01281730A (ja) * 1988-05-07 1989-11-13 Seiko Epson Corp パターン形成方法
GB8917191D0 (en) * 1989-07-27 1989-09-13 Gec Avery Technology Strain gauge encapsulation process
DE3941394A1 (de) * 1989-12-15 1991-06-20 Basf Ag Waessrige entwicklerloesung und verfahren zum entwickeln von photoresisten

Also Published As

Publication number Publication date
FR2687232A1 (fr) 1993-08-13
GB9302508D0 (en) 1993-03-24
GB2263981A (en) 1993-08-11
DE4203781C1 (enExample) 1993-09-09

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Legal Events

Date Code Title Description
ST Notification of lapse
RN Application for restoration